TW200636230A - Apparatus and method for detection and/or categorization of defected spots - Google Patents

Apparatus and method for detection and/or categorization of defected spots

Info

Publication number
TW200636230A
TW200636230A TW095105686A TW95105686A TW200636230A TW 200636230 A TW200636230 A TW 200636230A TW 095105686 A TW095105686 A TW 095105686A TW 95105686 A TW95105686 A TW 95105686A TW 200636230 A TW200636230 A TW 200636230A
Authority
TW
Taiwan
Prior art keywords
spots
defected
categorization
detection
workpiece
Prior art date
Application number
TW095105686A
Other languages
Chinese (zh)
Inventor
Klaus Gerstner
Clemens Ottermann
Bernhard Hunzinger
Original Assignee
Schott Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE200510007715 external-priority patent/DE102005007715B4/en
Application filed by Schott Ag filed Critical Schott Ag
Publication of TW200636230A publication Critical patent/TW200636230A/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901—Optical details; Scanning details
    • G01N21/8903—Optical details; Scanning details using a multiple detector array
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

The present invention provides an apparatus for inspection, especially for the defect spots on the surface of a workpiece, which is to align the apparatus with a light beam on a workpiece, and at least part of the light beam would be affected by the workpiece, and especially by the defected spots.
TW095105686A 2005-02-18 2006-02-20 Apparatus and method for detection and/or categorization of defected spots TW200636230A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200510007715 DE102005007715B4 (en) 2005-02-18 2005-02-18 Device for detecting defects and use of the device
DE102005062146 2005-12-22

Publications (1)

Publication Number Publication Date
TW200636230A true TW200636230A (en) 2006-10-16

Family

ID=36384461

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095105686A TW200636230A (en) 2005-02-18 2006-02-20 Apparatus and method for detection and/or categorization of defected spots

Country Status (3)

Country Link
KR (1) KR101332786B1 (en)
TW (1) TW200636230A (en)
WO (1) WO2006087213A2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI416346B (en) * 2010-07-27 2013-11-21 Applied Materials Israel Ltd Defect classification with optimized purity
TWI503535B (en) * 2011-11-15 2015-10-11 Mirtec Co Ltd Noncontact inspection apparatus for light emitting diode
CN105492862A (en) * 2013-07-01 2016-04-13 萨科希瑞斯先进控制有限公司 Method and device for optical shape recognition and/or examination of an object
TWI658266B (en) * 2018-04-03 2019-05-01 中國鋼鐵股份有限公司 Method and system for evaluating quality of surface of work roll
US10705346B2 (en) 2016-10-11 2020-07-07 Industrial Technology Research Institute Laser uniformly machining apparatus and method
TWI786238B (en) * 2017-12-15 2022-12-11 南韓商三星顯示器有限公司 System and method of defect detection on display
TWI807567B (en) * 2021-12-30 2023-07-01 致茂電子股份有限公司 Multifunctional standard calibration piece and detecting method of optical detecting apparatus

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100890647B1 (en) * 2008-06-27 2009-03-27 와이즈플래닛(주) Particle inspection device using cylindrical lens array and rod lens
DE102009021136A1 (en) * 2009-05-13 2010-12-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. control device
NL1039263C2 (en) * 2011-12-23 2013-06-26 Zevenaar Elektronica & Sensoren B V DEVICE AND METHOD FOR COUNTING AND MEASURING PARTICLES.
JP6476580B2 (en) * 2014-04-21 2019-03-06 株式会社山梨技術工房 Flat plate surface condition inspection apparatus and flat plate surface condition inspection method using the same
KR101694379B1 (en) 2014-12-29 2017-01-09 강우성 Apparatus and Method for automatic sorting of optical lens
KR101678169B1 (en) * 2015-05-08 2016-11-21 주식회사 나노프로텍 Upper Surface Foreign Matter Detection Device of Ultra-Thin Transparent Substrate
KR20170133113A (en) * 2016-05-25 2017-12-05 코닝정밀소재 주식회사 Method and apparatus of detecting particles on upper surface of glass, and method of irradiating incident light
KR102575017B1 (en) 2016-11-17 2023-09-05 삼성디스플레이 주식회사 Detecting method for defect of glass substrate
CN110672618B (en) * 2019-09-25 2023-03-03 上海智觉光电科技有限公司 System and method for detecting bright surface of part appearance based on multi-angle light source
CN114088665A (en) * 2021-11-24 2022-02-25 广东医科大学 Optical measurement device for light transmittance detection
WO2023199265A1 (en) * 2022-04-15 2023-10-19 3M Innovative Properties Company Systems and methods for inspecting a worksurface

Family Cites Families (16)

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FR2078535A5 (en) * 1970-02-16 1971-11-05 British Aircraft Corp Ltd
US3814946A (en) * 1972-12-04 1974-06-04 Asahi Glass Co Ltd Method of detecting defects in transparent and semitransparent bodies
FR2500630A1 (en) * 1981-02-25 1982-08-27 Leser Jacques METHOD FOR SEARCHING FOR DEFECTS IN GLASS SHEETS AND DEVICE USING SAID METHOD
DE3534019A1 (en) * 1985-09-24 1987-04-02 Sick Optik Elektronik Erwin OPTICAL RAILWAY MONITORING DEVICE
WO1988009497A1 (en) * 1987-05-27 1988-12-01 Nippon Sheet Glass Co., Ltd. Discriminative flaw detector for light-transmissive sheet material
DE3800053A1 (en) * 1988-01-04 1989-07-13 Sick Optik Elektronik Erwin OPTICAL ERROR INSPECTION DEVICE
GB2219394B (en) * 1988-05-06 1992-09-16 Gersan Ets Sensing a narrow frequency band of radiation and examining objects or zones
DE3926349A1 (en) * 1989-08-09 1991-02-14 Sick Optik Elektronik Erwin Optical defect inspection arrangement for flat transparent material - passes light via mirror forming image of illumination pupil on camera lens of photoreceiver
FR2697086B1 (en) * 1992-10-20 1994-12-09 Thomson Csf Method and device for inspecting transparent material.
JPH10160683A (en) 1996-11-29 1998-06-19 Matsushita Electric Ind Co Ltd Foreign object inspection method and device
GB9812091D0 (en) * 1998-06-05 1998-08-05 Glaverbel Defect detecting unit
CA2252308C (en) * 1998-10-30 2005-01-04 Image Processing Systems, Inc. Glass inspection system
KR20010055184A (en) * 1999-12-09 2001-07-04 구자홍 Optics apparatus for pattern inspection of pdp glass
US6731384B2 (en) * 2000-10-10 2004-05-04 Hitachi, Ltd. Apparatus for detecting foreign particle and defect and the same method
US6833913B1 (en) * 2002-02-26 2004-12-21 Kla-Tencor Technologies Corporation Apparatus and methods for optically inspecting a sample for anomalies
US6809808B2 (en) * 2002-03-22 2004-10-26 Applied Materials, Inc. Wafer defect detection system with traveling lens multi-beam scanner

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI416346B (en) * 2010-07-27 2013-11-21 Applied Materials Israel Ltd Defect classification with optimized purity
TWI503535B (en) * 2011-11-15 2015-10-11 Mirtec Co Ltd Noncontact inspection apparatus for light emitting diode
CN105492862A (en) * 2013-07-01 2016-04-13 萨科希瑞斯先进控制有限公司 Method and device for optical shape recognition and/or examination of an object
CN110388885A (en) * 2013-07-01 2019-10-29 萨科希瑞斯先进控制有限公司 For optically SHAPE DETECTION and/or the method and apparatus for checking object
CN105492862B (en) * 2013-07-01 2021-08-10 萨科希瑞斯先进控制有限公司 Method and device for optically detecting the shape of and/or inspecting an object
US10705346B2 (en) 2016-10-11 2020-07-07 Industrial Technology Research Institute Laser uniformly machining apparatus and method
TWI786238B (en) * 2017-12-15 2022-12-11 南韓商三星顯示器有限公司 System and method of defect detection on display
TWI658266B (en) * 2018-04-03 2019-05-01 中國鋼鐵股份有限公司 Method and system for evaluating quality of surface of work roll
TWI807567B (en) * 2021-12-30 2023-07-01 致茂電子股份有限公司 Multifunctional standard calibration piece and detecting method of optical detecting apparatus

Also Published As

Publication number Publication date
WO2006087213A3 (en) 2007-03-29
WO2006087213A2 (en) 2006-08-24
KR20070107773A (en) 2007-11-07
KR101332786B1 (en) 2013-11-25

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