SG162667A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG162667A1
SG162667A1 SG200907991-4A SG2009079914A SG162667A1 SG 162667 A1 SG162667 A1 SG 162667A1 SG 2009079914 A SG2009079914 A SG 2009079914A SG 162667 A1 SG162667 A1 SG 162667A1
Authority
SG
Singapore
Prior art keywords
gap
reduced
substrate
edge member
edge
Prior art date
Application number
SG200907991-4A
Other languages
English (en)
Inventor
Martijn Houben
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG162667A1 publication Critical patent/SG162667A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
SG200907991-4A 2008-12-09 2009-12-01 Lithographic apparatus and device manufacturing method SG162667A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19359808P 2008-12-09 2008-12-09

Publications (1)

Publication Number Publication Date
SG162667A1 true SG162667A1 (en) 2010-07-29

Family

ID=41720524

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200907991-4A SG162667A1 (en) 2008-12-09 2009-12-01 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US8619258B2 (zh)
EP (1) EP2196857A3 (zh)
JP (2) JP4944182B2 (zh)
KR (1) KR101152834B1 (zh)
CN (1) CN101813891B (zh)
SG (1) SG162667A1 (zh)
TW (1) TWI431431B (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7352440B2 (en) 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
NL2006818A (en) * 2010-07-02 2012-01-03 Asml Netherlands Bv A method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus.
US20140031665A1 (en) * 2012-07-25 2014-01-30 Covidien Lp Telecentric Scale Projection System for Real-Time In-Situ Surgical Metrology
JP2014045090A (ja) * 2012-08-27 2014-03-13 Toshiba Corp 液浸露光装置
EP3210080B1 (en) * 2014-10-23 2020-12-09 ASML Netherlands B.V. Support table for a lithographic apparatus, method of loading a substrate, lithographic apparatus and device manufacturing method
WO2016078861A1 (en) 2014-11-17 2016-05-26 Asml Netherlands B.V. Process based metrology target design
CN107561867A (zh) * 2016-06-30 2018-01-09 上海微电子装备（集团）股份有限公司 一种浸没式光刻机和一种浸液流场中气泡去除方法
CN110908246A (zh) * 2018-09-18 2020-03-24 长鑫存储技术有限公司 浸润式曝光机装置及曝光方法
JP7202828B2 (ja) * 2018-09-26 2023-01-12 東京エレクトロン株式会社 基板検査方法、基板検査装置および記録媒体
US10948830B1 (en) 2019-12-23 2021-03-16 Waymo Llc Systems and methods for lithography
CN115615960B (zh) * 2022-12-14 2023-03-21 中节能(达州)新材料有限公司 一种玻璃微珠涂层反光性能测试平台
CN117075430B (zh) * 2023-05-31 2024-04-16 杭州华芯微科技有限公司 一种高压vdmos器件制备用自调节式原料曝光装置

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP2002158154A (ja) 2000-11-16 2002-05-31 Canon Inc 露光装置
TWI232357B (en) 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1429188B1 (en) 2002-11-12 2013-06-19 ASML Netherlands B.V. Lithographic projection apparatus
KR100588124B1 (ko) * 2002-11-12 2006-06-09 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스제조방법
DE60335595D1 (de) 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
KR101528089B1 (ko) 2003-06-13 2015-06-11 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
EP2843472B1 (en) 2003-07-08 2016-12-07 Nikon Corporation Wafer table for immersion lithography
WO2005006418A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
JP4289961B2 (ja) * 2003-09-26 2009-07-01 キヤノン株式会社 位置決め装置
US7162108B2 (en) 2003-12-17 2007-01-09 Jds Uniphase Corporation Planar lightwave circuit variable optical attenuator
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JPWO2006025386A1 (ja) * 2004-08-31 2008-05-08 株式会社ニコン 位置合わせ方法、処理システム、基板の投入再現性計測方法、位置計測方法、露光方法、基板処理装置、計測方法及び計測装置
JP2006120889A (ja) * 2004-10-22 2006-05-11 Sony Corp 半導体装置の製造方法及びその方法に用いられる半導体ウェハホルダ
US7230681B2 (en) 2004-11-18 2007-06-12 International Business Machines Corporation Method and apparatus for immersion lithography
TWI649790B (zh) 2004-11-18 2019-02-01 日商尼康股份有限公司 位置測量方法、位置控制方法、測量方法、裝載方法、曝光方法及曝光裝置、及元件製造方法
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352440B2 (en) * 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
US20060147821A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) * 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7787101B2 (en) 2006-02-16 2010-08-31 International Business Machines Corporation Apparatus and method for reducing contamination in immersion lithography
JP2007266074A (ja) * 2006-03-27 2007-10-11 Toshiba Corp 半導体装置の製造方法及び液浸リソグラフィーシステム
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008227452A (ja) * 2007-02-16 2008-09-25 Canon Inc 露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
JP4944182B2 (ja) 2012-05-30
EP2196857A3 (en) 2010-07-21
US8619258B2 (en) 2013-12-31
JP5364808B2 (ja) 2013-12-11
KR20100066413A (ko) 2010-06-17
TWI431431B (zh) 2014-03-21
US20100143832A1 (en) 2010-06-10
CN101813891B (zh) 2014-07-16
EP2196857A2 (en) 2010-06-16
CN101813891A (zh) 2010-08-25
JP2010141313A (ja) 2010-06-24
TW201027277A (en) 2010-07-16
KR101152834B1 (ko) 2012-06-12
JP2012109618A (ja) 2012-06-07

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