SG155146A1 - Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device - Google Patents

Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Info

Publication number
SG155146A1
SG155146A1 SG200901295-6A SG2009012956A SG155146A1 SG 155146 A1 SG155146 A1 SG 155146A1 SG 2009012956 A SG2009012956 A SG 2009012956A SG 155146 A1 SG155146 A1 SG 155146A1
Authority
SG
Singapore
Prior art keywords
radiation
sensitive composition
forming
coloring layer
liquid crystal
Prior art date
Application number
SG200901295-6A
Other languages
English (en)
Inventor
Takumi Matoba
Takaki Minowa
Toshiyuki Koide
Hidenori Naruse
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG155146A1 publication Critical patent/SG155146A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
SG200901295-6A 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device SG155146A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008047271A JP5157522B2 (ja) 2008-02-28 2008-02-28 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子

Publications (1)

Publication Number Publication Date
SG155146A1 true SG155146A1 (en) 2009-09-30

Family

ID=41094655

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200901295-6A SG155146A1 (en) 2008-02-28 2009-02-24 Radiation-sensitive composition for forming a coloring layer, color filter, and color liquid crystal display device

Country Status (5)

Country Link
JP (1) JP5157522B2 (ja)
KR (1) KR101705894B1 (ja)
CN (1) CN101526741B (ja)
SG (1) SG155146A1 (ja)
TW (1) TWI569099B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013041156A (ja) * 2011-08-17 2013-02-28 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP5778568B2 (ja) * 2011-12-16 2015-09-16 東京応化工業株式会社 厚膜用化学増幅型ポジ型ホトレジスト組成物、厚膜ホトレジスト積層体、厚膜ホトレジストパターンの製造方法及び接続端子の製造方法
WO2015053183A1 (ja) * 2013-10-11 2015-04-16 富士フイルム株式会社 感光性組成物、分散組成物、これを用いたカラーフィルタの製造方法、カラーフィルタ、及び、固体撮像素子
JP6520091B2 (ja) 2013-12-16 2019-05-29 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
JP6847580B2 (ja) * 2016-02-09 2021-03-24 東京応化工業株式会社 ブラックカラムスペーサ用感光性樹脂組成物、ブラックカラムスペーサ、表示装置、及びブラックカラムスペーサの形成方法
JP6689434B1 (ja) * 2019-02-06 2020-04-28 昭和電工株式会社 感光性樹脂組成物、有機ｅｌ素子隔壁、及び有機ｅｌ素子

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214580A (ja) * 1999-01-26 2000-08-04 Mitsubishi Chemicals Corp カラ―フィルタ―用光重合性組成物、およびカラ―フィルタ―
KR100783603B1 (ko) * 2002-01-05 2007-12-07 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴의 형성방법
TWI314943B (en) * 2002-08-29 2009-09-21 Radiation-sensitive resin composition
JP2004264747A (ja) * 2003-03-04 2004-09-24 Fuji Photo Film Co Ltd 感光性平版印刷版
JP4393258B2 (ja) * 2003-08-29 2010-01-06 富士フイルム株式会社 画像記録材料及び平版印刷版
CN101023394B (zh) * 2004-09-17 2011-12-21 凸版印刷株式会社 着色碱性显影性感光性树脂组合物和使用了该着色碱性显影性感光性树脂组合物的彩色滤光片
JP4483769B2 (ja) * 2004-11-11 2010-06-16 三菱化学株式会社 色材分散液、着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2006195425A (ja) * 2004-12-15 2006-07-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP2006251562A (ja) * 2005-03-11 2006-09-21 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP4661384B2 (ja) * 2005-06-16 2011-03-30 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP4685664B2 (ja) * 2005-11-25 2011-05-18 三菱製紙株式会社 感光性平版印刷版材料
JP2007256445A (ja) * 2006-03-22 2007-10-04 Mitsubishi Paper Mills Ltd 光重合性組成物および感光性平版印刷版材料
JP4635935B2 (ja) * 2006-03-29 2011-02-23 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP4706559B2 (ja) * 2006-05-29 2011-06-22 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP4752649B2 (ja) * 2006-07-12 2011-08-17 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
TWI437366B (zh) * 2007-09-26 2014-05-11 Fujifilm Corp 固態攝像元件用著色感光性組成物、固態攝像元件用彩色濾光器及其製造方法

Also Published As

Publication number Publication date
TWI569099B (zh) 2017-02-01
JP2009204895A (ja) 2009-09-10
KR101705894B1 (ko) 2017-02-10
CN101526741B (zh) 2013-10-23
TW200941140A (en) 2009-10-01
KR20090093822A (ko) 2009-09-02
JP5157522B2 (ja) 2013-03-06
CN101526741A (zh) 2009-09-09

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