SG133510A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG133510A1
SG133510A1 SG200608501-3A SG2006085013A SG133510A1 SG 133510 A1 SG133510 A1 SG 133510A1 SG 2006085013 A SG2006085013 A SG 2006085013A SG 133510 A1 SG133510 A1 SG 133510A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
substrate
device manufacturing
compensating
pulse
Prior art date
Application number
SG200608501-3A
Other languages
English (en)
Inventor
Huibert Visser
David William Callan
Schmidt Robert-Han Munnig
Roberto B Wiener
De Ven Johannes Theodorus Van
George Howard Robbins
Original Assignee
Asml Netherlands Bv
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Asml Holding Nv filed Critical Asml Netherlands Bv
Publication of SG133510A1 publication Critical patent/SG133510A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
SG200608501-3A 2005-12-09 2006-12-06 Lithographic apparatus and device manufacturing method SG133510A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/297,641 US7626181B2 (en) 2005-12-09 2005-12-09 Lithographic apparatus and device manufacturing method
US11/371,232 US7714305B2 (en) 2005-12-09 2006-03-09 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG133510A1 true SG133510A1 (en) 2007-07-30

Family

ID=37814290

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200608501-3A SG133510A1 (en) 2005-12-09 2006-12-06 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (3) US7626181B2 (fr)
EP (2) EP1847877A3 (fr)
JP (1) JP4482551B2 (fr)
KR (2) KR100830662B1 (fr)
CN (1) CN1996149B (fr)
DE (1) DE602006001507D1 (fr)
SG (1) SG133510A1 (fr)
TW (1) TWI381251B (fr)

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CN111580346B (zh) * 2020-05-21 2021-06-25 吉林大学 Dmd光刻系统中倾角及放大倍率的测量和校正方法

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Also Published As

Publication number Publication date
DE602006001507D1 (de) 2008-07-31
KR100830662B1 (ko) 2008-05-19
CN1996149A (zh) 2007-07-11
US20070162781A1 (en) 2007-07-12
KR20070061461A (ko) 2007-06-13
US7626181B2 (en) 2009-12-01
EP1795966B1 (fr) 2008-06-18
US20070150779A1 (en) 2007-06-28
EP1795966A1 (fr) 2007-06-13
EP1847877A3 (fr) 2009-02-11
US20070150778A1 (en) 2007-06-28
TW200732856A (en) 2007-09-01
EP1847877A2 (fr) 2007-10-24
KR20080015038A (ko) 2008-02-15
CN1996149B (zh) 2010-12-08
TWI381251B (zh) 2013-01-01
KR100841425B1 (ko) 2008-06-25
JP4482551B2 (ja) 2010-06-16
JP2007165885A (ja) 2007-06-28
US7714305B2 (en) 2010-05-11

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