SG130183A1 - Position measurement system and lithographic apparatus - Google Patents

Position measurement system and lithographic apparatus

Info

Publication number
SG130183A1
SG130183A1 SG200606018-0A SG2006060180A SG130183A1 SG 130183 A1 SG130183 A1 SG 130183A1 SG 2006060180 A SG2006060180 A SG 2006060180A SG 130183 A1 SG130183 A1 SG 130183A1
Authority
SG
Singapore
Prior art keywords
measurement system
position measurement
distance
lithographic apparatus
fraction
Prior art date
Application number
SG200606018-0A
Other languages
English (en)
Inventor
Wouter Onno Pril
Emiel Jozef Melanie Eussen
Der Pasch Engelbertus Anto Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG130183A1 publication Critical patent/SG130183A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
SG200606018-0A 2005-09-02 2006-09-01 Position measurement system and lithographic apparatus SG130183A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/217,670 US7348574B2 (en) 2005-09-02 2005-09-02 Position measurement system and lithographic apparatus

Publications (1)

Publication Number Publication Date
SG130183A1 true SG130183A1 (en) 2007-03-20

Family

ID=37441549

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200606018-0A SG130183A1 (en) 2005-09-02 2006-09-01 Position measurement system and lithographic apparatus

Country Status (7)

Country Link
US (2) US7348574B2 (ja)
EP (1) EP1760529B1 (ja)
JP (1) JP4639171B2 (ja)
KR (1) KR100860862B1 (ja)
CN (1) CN100549834C (ja)
SG (1) SG130183A1 (ja)
TW (1) TWI299783B (ja)

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US8174671B2 (en) * 2007-06-21 2012-05-08 Asml Netherlands B.V. Lithographic projection apparatus and method for controlling a support structure
KR101843699B1 (ko) * 2007-07-18 2018-03-29 가부시키가이샤 니콘 계측 방법, 스테이지 장치, 및 노광 장치
US8194232B2 (en) * 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
JP5489068B2 (ja) * 2007-07-24 2014-05-14 株式会社ニコン 位置計測システム、露光装置、位置計測方法、露光方法及びデバイス製造方法、並びに工具及び計測方法
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
KR101409149B1 (ko) * 2007-07-24 2014-06-17 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
US8867022B2 (en) * 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8237919B2 (en) * 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
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KR102574558B1 (ko) 2015-02-23 2023-09-04 가부시키가이샤 니콘 계측 장치, 리소그래피 시스템 및 노광 장치, 그리고 관리 방법, 중첩 계측 방법 및 디바이스 제조 방법
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Also Published As

Publication number Publication date
US20070052976A1 (en) 2007-03-08
US20070051160A1 (en) 2007-03-08
CN100549834C (zh) 2009-10-14
EP1760529B1 (en) 2011-12-28
KR20070026237A (ko) 2007-03-08
US7599043B2 (en) 2009-10-06
CN1924708A (zh) 2007-03-07
KR100860862B1 (ko) 2008-09-29
JP4639171B2 (ja) 2011-02-23
TWI299783B (en) 2008-08-11
TW200712430A (en) 2007-04-01
JP2007071874A (ja) 2007-03-22
EP1760529A1 (en) 2007-03-07
US7348574B2 (en) 2008-03-25

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