SG129369A1 - Stage apparatus, lithographic apparatus and devicemanufacturing method - Google Patents

Stage apparatus, lithographic apparatus and devicemanufacturing method

Info

Publication number
SG129369A1
SG129369A1 SG200604590A SG200604590A SG129369A1 SG 129369 A1 SG129369 A1 SG 129369A1 SG 200604590 A SG200604590 A SG 200604590A SG 200604590 A SG200604590 A SG 200604590A SG 129369 A1 SG129369 A1 SG 129369A1
Authority
SG
Singapore
Prior art keywords
die
devicemanufacturing
pattern
stage
lithographic apparatus
Prior art date
Application number
SG200604590A
Other languages
English (en)
Inventor
Erik Roelof Loopstra
Arno Jan Bleeker
Heine Melle Mulder
Oscar Franciscus Josz Noordman
Timotheus Franciscus Sengers
Laurentius Catrinus Jorritsma
Mark Trentelman
Gerrit Streutker
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/179,780 external-priority patent/US7417715B2/en
Priority claimed from US11/335,715 external-priority patent/US7671970B2/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG129369A1 publication Critical patent/SG129369A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200604590A 2005-07-13 2006-07-07 Stage apparatus, lithographic apparatus and devicemanufacturing method SG129369A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/179,780 US7417715B2 (en) 2005-07-13 2005-07-13 Stage apparatus, lithographic apparatus and device manufacturing method using two patterning devices
US11/335,715 US7671970B2 (en) 2005-07-13 2006-01-20 Stage apparatus with two patterning devices, lithographic apparatus and device manufacturing method skipping an exposure field pitch
US11/445,466 US7924406B2 (en) 2005-07-13 2006-06-02 Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels

Publications (1)

Publication Number Publication Date
SG129369A1 true SG129369A1 (en) 2007-02-26

Family

ID=37116168

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200604590A SG129369A1 (en) 2005-07-13 2006-07-07 Stage apparatus, lithographic apparatus and devicemanufacturing method

Country Status (6)

Country Link
US (2) US7924406B2 (de)
EP (1) EP1744216A3 (de)
JP (1) JP4468334B2 (de)
KR (1) KR100794689B1 (de)
SG (1) SG129369A1 (de)
TW (1) TWI315454B (de)

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US7548302B2 (en) * 2005-03-29 2009-06-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317506B2 (en) * 2005-03-29 2008-01-08 Asml Netherlands B.V. Variable illumination source
US7782442B2 (en) * 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
KR20080088579A (ko) * 2005-12-28 2008-10-02 가부시키가이샤 니콘 노광 장치 및 노광 방법, 디바이스 제조 방법
EP1986224A4 (de) * 2006-02-16 2012-01-25 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
EP1986222A4 (de) * 2006-02-16 2010-09-01 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
JPWO2007094470A1 (ja) * 2006-02-16 2009-07-09 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
KR20080102192A (ko) * 2006-02-16 2008-11-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US8023103B2 (en) * 2006-03-03 2011-09-20 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
WO2007100087A1 (ja) * 2006-03-03 2007-09-07 Nikon Corporation 露光装置及びデバイス製造方法
US7884921B2 (en) * 2006-04-12 2011-02-08 Nikon Corporation Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method
JP4998803B2 (ja) * 2006-04-14 2012-08-15 株式会社ニコン 露光装置、デバイス製造方法、および露光方法
JP5158439B2 (ja) * 2006-04-17 2013-03-06 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
KR20090048541A (ko) * 2006-07-12 2009-05-14 가부시키가이샤 니콘 조명 광학 장치, 노광 장치 및 디바이스 제조 방법
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US7782446B2 (en) 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
US9250536B2 (en) 2007-03-30 2016-02-02 Asml Netherlands B.V. Lithographic apparatus and method
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US20080278698A1 (en) * 2007-05-08 2008-11-13 Asml Netherlands B.V. Lithographic apparatus and method
US8237913B2 (en) * 2007-05-08 2012-08-07 Asml Netherlands B.V. Lithographic apparatus and method
US8355113B2 (en) * 2007-12-17 2013-01-15 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
SG156564A1 (en) * 2008-04-09 2009-11-26 Asml Holding Nv Lithographic apparatus and device manufacturing method
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US20090305171A1 (en) * 2008-06-10 2009-12-10 Nikon Corporation Apparatus for scanning sites on a wafer along a short dimension of the sites
US8736813B2 (en) * 2008-08-26 2014-05-27 Nikon Corporation Exposure apparatus with an illumination system generating multiple illumination beams
US8705170B2 (en) * 2008-08-29 2014-04-22 Nikon Corporation High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations
US20100091257A1 (en) * 2008-10-10 2010-04-15 Nikon Corporation Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location
JP5489534B2 (ja) * 2009-05-21 2014-05-14 キヤノン株式会社 露光装置及びデバイス製造方法
US8351022B2 (en) * 2009-06-15 2013-01-08 Asml Netherlands B.V. Radiation beam modification apparatus and method
NL2005013A (en) * 2009-07-31 2011-02-02 Asml Netherlands Bv Positioning system, lithographic apparatus and method.
JP5294489B2 (ja) * 2009-12-14 2013-09-18 株式会社ブイ・テクノロジー 露光方法及び露光装置
EP2369413B1 (de) * 2010-03-22 2021-04-07 ASML Netherlands BV Beleuchtungssystem und Lithographievorrichtung
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Also Published As

Publication number Publication date
TW200707138A (en) 2007-02-16
EP1744216A3 (de) 2010-01-27
US20070013890A1 (en) 2007-01-18
KR100794689B1 (ko) 2008-01-14
JP4468334B2 (ja) 2010-05-26
KR20070008466A (ko) 2007-01-17
EP1744216A2 (de) 2007-01-17
US7924406B2 (en) 2011-04-12
JP2007027732A (ja) 2007-02-01
US20070013885A1 (en) 2007-01-18
US7671968B2 (en) 2010-03-02
TWI315454B (en) 2009-10-01

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