SG128586A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG128586A1
SG128586A1 SG200603932A SG200603932A SG128586A1 SG 128586 A1 SG128586 A1 SG 128586A1 SG 200603932 A SG200603932 A SG 200603932A SG 200603932 A SG200603932 A SG 200603932A SG 128586 A1 SG128586 A1 SG 128586A1
Authority
SG
Singapore
Prior art keywords
substrate
lithographic apparatus
support structure
patterning object
device manufacturing
Prior art date
Application number
SG200603932A
Other languages
English (en)
Inventor
Dirk-Jan Bijvoet
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG128586A1 publication Critical patent/SG128586A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200603932A 2005-06-24 2006-06-09 Lithographic apparatus and device manufacturing method SG128586A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/165,574 US7372549B2 (en) 2005-06-24 2005-06-24 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG128586A1 true SG128586A1 (en) 2007-01-30

Family

ID=36699332

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200603932A SG128586A1 (en) 2005-06-24 2006-06-09 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (1) US7372549B2 (zh)
EP (1) EP1736830B1 (zh)
JP (1) JP4580900B2 (zh)
KR (1) KR100743200B1 (zh)
CN (1) CN1885169B (zh)
DE (1) DE602006011679D1 (zh)
SG (1) SG128586A1 (zh)
TW (1) TWI300519B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7791708B2 (en) * 2006-12-27 2010-09-07 Asml Netherlands B.V. Lithographic apparatus, substrate table, and method for enhancing substrate release properties
NL1036215A1 (nl) * 2007-12-11 2009-06-15 Asml Netherlands Bv Lithographic method and carrier substrate.
NL1036735A1 (nl) 2008-04-10 2009-10-13 Asml Holding Nv Shear-layer chuck for lithographic apparatus.
WO2010010034A1 (en) * 2008-07-21 2010-01-28 Asml Netherlands B.V. Optical element mount for lithographic apparatus
JPWO2012081234A1 (ja) 2010-12-14 2014-05-22 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
US9880462B2 (en) 2014-11-28 2018-01-30 Samsung Electronics Co., Ltd. Pellicle and exposure mask including the same
CN108474109B (zh) * 2016-01-13 2021-08-03 应用材料公司 保持基板的保持布置、支撑基板的载体、沉积系统、保持基板的方法和释放基板的方法
JP6605730B2 (ja) 2016-11-10 2019-11-13 アプライド マテリアルズ インコーポレイテッド 基板を保持するための保持装置、保持装置を含むキャリア、キャリアを用いた処理システム、および基板を保持装置から解放する方法
CN211929431U (zh) * 2017-11-20 2020-11-13 应用材料公司 基板支撑件、真空处理设备及基板处理系统
KR102395754B1 (ko) * 2017-11-20 2022-05-06 어플라이드 머티어리얼스, 인코포레이티드 기판을 프로세싱하기 위한 기판 지지부, 진공 프로세싱 장치 및 기판 프로세싱 시스템
EP4220302A1 (en) * 2022-01-27 2023-08-02 ASML Netherlands B.V. System for holding an object in a semiconductor manufacturing process, lithographic apparatus provided with said system and method

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
US4842136A (en) 1987-02-13 1989-06-27 Canon Kabushiki Kaisha Dust-proof container having improved construction for holding a reticle therein
DE69505448T2 (de) * 1994-03-15 1999-04-22 Canon Kk Maske und Maskenträger
US5923408A (en) * 1996-01-31 1999-07-13 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
JPH10116886A (ja) * 1996-10-11 1998-05-06 Nikon Corp 試料保持方法及び露光装置
JP2000311933A (ja) * 1999-04-27 2000-11-07 Canon Inc 基板保持装置、基板搬送システム、露光装置、塗布装置およびデバイス製造方法ならびに基板保持部クリーニング方法
WO2001056074A1 (fr) * 2000-01-28 2001-08-02 Hitachi Tokyo Electronics Co., Ltd. Support de tranche, systeme d'exposition et procede de fabrication de dispositif a semiconducteur
EP1260126B1 (en) * 2000-02-17 2005-04-27 Matsushita Electric Industrial Co., Ltd. Recognition apparatus for component mount panel, component mounting apparatus for liquid crystal panel, and component mounting method for liquid crystal panel
DE10043315C1 (de) 2000-09-02 2002-06-20 Zeiss Carl Projektionsbelichtungsanlage
US6628503B2 (en) 2001-03-13 2003-09-30 Nikon Corporation Gas cooled electrostatic pin chuck for vacuum applications
JP4288694B2 (ja) * 2001-12-20 2009-07-01 株式会社ニコン 基板保持装置、露光装置及びデバイス製造方法
US6872439B2 (en) * 2002-05-13 2005-03-29 The Regents Of The University Of California Adhesive microstructure and method of forming same
KR100522885B1 (ko) 2002-06-07 2005-10-20 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스제조방법
EP1369745B1 (en) 2002-06-07 2013-02-27 ASML Netherlands B.V. Lihographic apparatus and device manufaturing method
JP4340046B2 (ja) * 2002-07-25 2009-10-07 株式会社日立ハイテクノロジーズ 露光装置のマスク板固定方法およびマスク板支持装置
EP1486828B1 (en) 2003-06-09 2013-10-09 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1491953A1 (en) 2003-06-23 2004-12-29 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2005311084A (ja) * 2004-04-21 2005-11-04 Canon Inc 露光装置、デバイス製造方法、パターン生成装置及びメンテナンス方法
JP2005150759A (ja) * 2004-12-15 2005-06-09 Nikon Corp 走査型露光装置

Also Published As

Publication number Publication date
CN1885169B (zh) 2010-07-07
JP2007005789A (ja) 2007-01-11
EP1736830B1 (en) 2010-01-13
DE602006011679D1 (de) 2010-03-04
US7372549B2 (en) 2008-05-13
EP1736830A1 (en) 2006-12-27
US20060290915A1 (en) 2006-12-28
TW200705137A (en) 2007-02-01
KR20060135508A (ko) 2006-12-29
KR100743200B1 (ko) 2007-07-27
CN1885169A (zh) 2006-12-27
JP4580900B2 (ja) 2010-11-17
TWI300519B (en) 2008-09-01

Similar Documents

Publication Publication Date Title
TW200705137A (en) Lithographic apparatus and device manufacturing method
ATE439198T1 (de) Kryofluidunterstütztes herstellungsverfahren
JP2008532806A5 (zh)
BRPI0606961A2 (pt) sistema de usinagem rápida e métodos para fabricação de artigos abrasivos
SG164330A1 (en) Lithographic apparatus and device manufacturing method
BRPI0718589A2 (pt) Carbono de grande área superficial e processo para a produção do mesmo.
TW200641161A (en) Method of forming mask and mask
TW200632542A (en) Mask, mask forming method, pattern forming method, and wiring pattern forming method
DE602007008025D1 (de) Papiermaterial mit verbessertem Prägemuster und Herstellungsverfahren dafür
TWI265305B (en) Integration of optical product with multiple optical components and casting apparatus thereof
TW200707138A (en) Stage apparatus, lithographic apparatus and device manufacturing method
TW200740288A (en) Mask, film forming method, light-emitting device, and electronic apparatus
EP2098362A4 (en) ENGRAVED PLATE AND BASE MATERIAL WITH CONCRETE STRUCTURE AND ENGRAVED PLATE
ATE500725T1 (de) Schneidevorrichtung
TW200625529A (en) Contact hole structures and contact structures and fabrication methods thereof
SG131887A1 (en) Lithographic apparatus and device manufacturing method
TW200630760A (en) Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus
ATE423227T1 (de) Vorrichtung zum ätzen einer leitfähigen schicht und ätzverfahren
WO2009154767A3 (en) A heat-transfer structure
WO2008142784A1 (ja) インプリント装置
SG146614A1 (en) Lithographic apparatus and device manufacturing method using multiple exposures and multiple exposure types
TW200620279A (en) MRAM over sloped pillar and the manufacturing method thereof
TW200739267A (en) Photosensitive transfer material, bulkhead and production method thereof, optical element and production method thereof, and display device
MY152019A (en) Manufacturing method for absorptive article
TW200732785A (en) Light guide plate and manufacturing method of light guide plate pattern