SG121847A1 - Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system - Google Patents

Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system

Info

Publication number
SG121847A1
SG121847A1 SG200307646A SG200307646A SG121847A1 SG 121847 A1 SG121847 A1 SG 121847A1 SG 200307646 A SG200307646 A SG 200307646A SG 200307646 A SG200307646 A SG 200307646A SG 121847 A1 SG121847 A1 SG 121847A1
Authority
SG
Singapore
Prior art keywords
projection apparatus
lithographic projection
cleaning
component
device manufacturing
Prior art date
Application number
SG200307646A
Other languages
English (en)
Inventor
Levinus Pieter Bakker
Ralph Kurt
Bastiaan Matthias Mertens
Markus Weiss
Johann Trenkler
Wolfgang Singer
Original Assignee
Asml Netherlands Bv
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2002161875 external-priority patent/DE10261875A1/de
Application filed by Asml Netherlands Bv, Zeiss Carl Smt Ag filed Critical Asml Netherlands Bv
Publication of SG121847A1 publication Critical patent/SG121847A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B6/00—Cleaning by electrostatic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200307646A 2002-12-20 2003-12-19 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system SG121847A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2002161875 DE10261875A1 (de) 2002-12-20 2002-12-20 Verfahren zur Reinigung von Oberflächen
EP02080488 2002-12-24

Publications (1)

Publication Number Publication Date
SG121847A1 true SG121847A1 (en) 2006-05-26

Family

ID=32826163

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200307646A SG121847A1 (en) 2002-12-20 2003-12-19 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system

Country Status (6)

Country Link
US (1) US7116394B2 (ja)
JP (2) JP3867918B2 (ja)
KR (1) KR100737759B1 (ja)
CN (1) CN1534381A (ja)
SG (1) SG121847A1 (ja)
TW (1) TWI251117B (ja)

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CN106249550B (zh) * 2015-12-21 2018-07-06 中国科学院长春光学精密机械与物理研究所 一种极紫外光学元件表面污染层厚度控制方法及装置
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US10520805B2 (en) * 2016-07-29 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for localized EUV pellicle glue removal
IL273836B2 (en) 2017-10-31 2023-09-01 Asml Netherlands Bv A measuring device, a method for measuring a structure, a method for making a device
EP3506011A1 (en) * 2017-12-28 2019-07-03 ASML Netherlands B.V. Apparatus for and a method of removing contaminant particles from a component of a metrology apparatus
KR102429845B1 (ko) * 2017-12-28 2022-08-04 에이에스엠엘 네델란즈 비.브이. 장치의 컴포넌트로부터 오염물 입자를 제거하는 장치 및 방법
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CN110560424A (zh) * 2019-09-18 2019-12-13 宁波南大光电材料有限公司 一种用于光刻设备的非接触式超声清洗装置
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Also Published As

Publication number Publication date
KR20040055694A (ko) 2004-06-26
CN1534381A (zh) 2004-10-06
TWI251117B (en) 2006-03-11
JP3867918B2 (ja) 2007-01-17
JP2006165588A (ja) 2006-06-22
KR100737759B1 (ko) 2007-07-10
TW200421016A (en) 2004-10-16
US7116394B2 (en) 2006-10-03
JP2004207740A (ja) 2004-07-22
US20040218157A1 (en) 2004-11-04

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