SG120285A1 - Patterned mask holding device and method using twoholding systems - Google Patents
Patterned mask holding device and method using twoholding systemsInfo
- Publication number
- SG120285A1 SG120285A1 SG200505332A SG200505332A SG120285A1 SG 120285 A1 SG120285 A1 SG 120285A1 SG 200505332 A SG200505332 A SG 200505332A SG 200505332 A SG200505332 A SG 200505332A SG 120285 A1 SG120285 A1 SG 120285A1
- Authority
- SG
- Singapore
- Prior art keywords
- twoholding
- systems
- holding device
- patterned mask
- mask holding
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
- G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/922,862 US7196775B2 (en) | 2004-08-23 | 2004-08-23 | Patterned mask holding device and method using two holding systems |
Publications (1)
Publication Number | Publication Date |
---|---|
SG120285A1 true SG120285A1 (en) | 2006-03-28 |
Family
ID=35448244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200505332A SG120285A1 (en) | 2004-08-23 | 2005-08-23 | Patterned mask holding device and method using twoholding systems |
Country Status (7)
Country | Link |
---|---|
US (1) | US7196775B2 (ja) |
EP (1) | EP1630613A3 (ja) |
JP (3) | JP4488982B2 (ja) |
KR (1) | KR100700471B1 (ja) |
CN (1) | CN100552545C (ja) |
SG (1) | SG120285A1 (ja) |
TW (1) | TWI275158B (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7352438B2 (en) * | 2006-02-14 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR100738996B1 (ko) * | 2006-06-21 | 2007-07-12 | 오에프티 주식회사 | 노광장치 |
US7933000B2 (en) * | 2006-11-16 | 2011-04-26 | Asml Netherlands B.V. | Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device |
US8469342B2 (en) * | 2007-07-23 | 2013-06-25 | Creative Technology Corporation | Substrate suction apparatus and method for manufacturing the same |
NL2003877A (en) | 2009-02-05 | 2010-08-09 | Asml Holding Nv | Reticle support that reduces reticle slippage. |
US9325007B2 (en) | 2009-10-27 | 2016-04-26 | Applied Materials, Inc. | Shadow mask alignment and management system |
EP2397905A1 (en) * | 2010-06-15 | 2011-12-21 | Applied Materials, Inc. | Magnetic holding device and method for holding a substrate |
NL2006565A (en) * | 2010-06-30 | 2012-01-02 | Asml Holding Nv | Reticle clamping system. |
JP2012054360A (ja) * | 2010-08-31 | 2012-03-15 | Nuflare Technology Inc | 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 |
US20130250271A1 (en) * | 2012-02-17 | 2013-09-26 | Nikon Corporation | Stage assembly with secure device holder |
KR102131659B1 (ko) * | 2013-07-08 | 2020-07-09 | 삼성디스플레이 주식회사 | 마스크 클램핑 장치 및 마스크 제조 방법 |
JP6294636B2 (ja) * | 2013-11-08 | 2018-03-14 | キヤノン株式会社 | 原版保持装置、露光装置、物品の製造方法、および原版保持方法 |
CN108648166A (zh) * | 2018-06-06 | 2018-10-12 | 中山新诺科技股份有限公司 | 曝光图形处理的方法和系统 |
WO2021215555A1 (ko) * | 2020-04-22 | 2021-10-28 | 엘지전자 주식회사 | 노광기 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4963921A (en) * | 1985-06-24 | 1990-10-16 | Canon Kabushiki Kaisha | Device for holding a mask |
US5847813A (en) * | 1996-08-07 | 1998-12-08 | Nikon Corporation | Mask holder for microlithography exposure |
US6172738B1 (en) * | 1996-09-24 | 2001-01-09 | Canon Kabushiki Kaisha | Scanning exposure apparatus and device manufacturing method using the same |
JP2002233984A (ja) * | 2001-02-06 | 2002-08-20 | Mitsubishi Paper Mills Ltd | シート状電子材料の吸着搬送方法 |
US20030179354A1 (en) * | 1996-03-22 | 2003-09-25 | Nikon Corporation | Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method |
US20050128463A1 (en) * | 2003-12-15 | 2005-06-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6290660A (ja) * | 1985-10-17 | 1987-04-25 | Matsushita Electric Ind Co Ltd | 露光装置 |
JP2748127B2 (ja) | 1988-09-02 | 1998-05-06 | キヤノン株式会社 | ウエハ保持方法 |
JPH04147642A (ja) * | 1990-10-09 | 1992-05-21 | Nippon Telegr & Teleph Corp <Ntt> | 真空・静電チャック |
JP3012069B2 (ja) * | 1991-12-04 | 2000-02-21 | キヤノン株式会社 | X線露光用マスク構造体及びこれを用いたx線露光装置 |
JP2809595B2 (ja) * | 1994-11-28 | 1998-10-08 | シーケーディ株式会社 | 板状物の熱処理装置及び熱処理方法 |
JP3689949B2 (ja) * | 1995-12-19 | 2005-08-31 | 株式会社ニコン | 投影露光装置、及び該投影露光装置を用いたパターン形成方法 |
JPH09246168A (ja) * | 1996-03-01 | 1997-09-19 | Canon Inc | 走査型露光装置および方法ならびに該装置を用いてデバイスを製造する方法 |
JPH10116780A (ja) * | 1996-10-14 | 1998-05-06 | Nikon Corp | 縦型基板保持装置 |
JP3469999B2 (ja) * | 1996-10-30 | 2003-11-25 | 京セラ株式会社 | 吸着盤の製造方法 |
DE19756486C1 (de) * | 1997-12-18 | 1999-04-22 | Schott Glas | Trägertisch für eine Photomaske in einer Vorrichtung zur Mikrochip-Herstellung |
WO2000065645A1 (fr) * | 1999-04-27 | 2000-11-02 | Nikon Corporation | Dispositif a etages et dispositif d'exposition |
JP2001244177A (ja) * | 2000-02-28 | 2001-09-07 | Nikon Corp | ステージ装置とホルダ、および走査型露光装置並びに露光装置 |
TW508653B (en) * | 2000-03-24 | 2002-11-01 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit manufacturing method |
JP2001358055A (ja) * | 2000-06-15 | 2001-12-26 | Nikon Corp | 露光装置及びデバイス製造方法 |
JP4196675B2 (ja) * | 2001-02-13 | 2008-12-17 | 株式会社ニコン | 保持装置、保持方法、露光装置、およびデバイス製造方法 |
JP3637490B2 (ja) * | 2002-01-31 | 2005-04-13 | 株式会社半導体先端テクノロジーズ | 露光装置及び露光方法 |
EP1359469B1 (en) * | 2002-05-01 | 2011-03-02 | ASML Netherlands B.V. | Chuck, lithographic projection apparatus and device manufacturing method |
JP2004153122A (ja) * | 2002-10-31 | 2004-05-27 | Nikon Corp | 露光装置 |
-
2004
- 2004-08-23 US US10/922,862 patent/US7196775B2/en not_active Expired - Fee Related
-
2005
- 2005-07-21 TW TW094124750A patent/TWI275158B/zh not_active IP Right Cessation
- 2005-08-18 EP EP05017992A patent/EP1630613A3/en not_active Withdrawn
- 2005-08-22 KR KR1020050076695A patent/KR100700471B1/ko active IP Right Grant
- 2005-08-23 SG SG200505332A patent/SG120285A1/en unknown
- 2005-08-23 JP JP2005241767A patent/JP4488982B2/ja active Active
- 2005-08-23 CN CNB2005100915694A patent/CN100552545C/zh not_active Expired - Fee Related
-
2009
- 2009-03-19 JP JP2009068740A patent/JP4857355B2/ja not_active Expired - Fee Related
- 2009-09-28 JP JP2009222608A patent/JP5088899B2/ja not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4963921A (en) * | 1985-06-24 | 1990-10-16 | Canon Kabushiki Kaisha | Device for holding a mask |
US20030179354A1 (en) * | 1996-03-22 | 2003-09-25 | Nikon Corporation | Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method |
US5847813A (en) * | 1996-08-07 | 1998-12-08 | Nikon Corporation | Mask holder for microlithography exposure |
US6172738B1 (en) * | 1996-09-24 | 2001-01-09 | Canon Kabushiki Kaisha | Scanning exposure apparatus and device manufacturing method using the same |
JP2002233984A (ja) * | 2001-02-06 | 2002-08-20 | Mitsubishi Paper Mills Ltd | シート状電子材料の吸着搬送方法 |
US20050128463A1 (en) * | 2003-12-15 | 2005-06-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
TW200620525A (en) | 2006-06-16 |
JP4857355B2 (ja) | 2012-01-18 |
TWI275158B (en) | 2007-03-01 |
CN1740910A (zh) | 2006-03-01 |
KR100700471B1 (ko) | 2007-03-28 |
KR20060053207A (ko) | 2006-05-19 |
US20060038973A1 (en) | 2006-02-23 |
EP1630613A3 (en) | 2009-04-29 |
US7196775B2 (en) | 2007-03-27 |
JP2009147371A (ja) | 2009-07-02 |
JP2006060241A (ja) | 2006-03-02 |
CN100552545C (zh) | 2009-10-21 |
EP1630613A2 (en) | 2006-03-01 |
JP2010045380A (ja) | 2010-02-25 |
JP5088899B2 (ja) | 2012-12-05 |
JP4488982B2 (ja) | 2010-06-23 |
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