SG112108A1 - Display device and method of manufacturing the same - Google Patents
Display device and method of manufacturing the sameInfo
- Publication number
- SG112108A1 SG112108A1 SG200407601A SG200407601A SG112108A1 SG 112108 A1 SG112108 A1 SG 112108A1 SG 200407601 A SG200407601 A SG 200407601A SG 200407601 A SG200407601 A SG 200407601A SG 112108 A1 SG112108 A1 SG 112108A1
- Authority
- SG
- Singapore
- Prior art keywords
- manufacturing
- same
- display device
- display
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0221—Manufacture or treatment of multiple TFTs comprising manufacture, treatment or patterning of TFT semiconductor bodies
- H10D86/0223—Manufacture or treatment of multiple TFTs comprising manufacture, treatment or patterning of TFT semiconductor bodies comprising crystallisation of amorphous, microcrystalline or polycrystalline semiconductor materials
- H10D86/0229—Manufacture or treatment of multiple TFTs comprising manufacture, treatment or patterning of TFT semiconductor bodies comprising crystallisation of amorphous, microcrystalline or polycrystalline semiconductor materials characterised by control of the annealing or irradiation parameters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
- H01L21/02675—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using laser beams
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
- H10D30/6731—Top-gate only TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6757—Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0251—Manufacture or treatment of multiple TFTs characterised by increasing the uniformity of device parameters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6741—Group IV materials, e.g. germanium or silicon carbide
- H10D30/6743—Silicon
- H10D30/6745—Polycrystalline or microcrystalline silicon
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Thin Film Transistor (AREA)
- Recrystallisation Techniques (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003398085A JP2005159162A (ja) | 2003-11-27 | 2003-11-27 | 表示装置及びその製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG112108A1 true SG112108A1 (en) | 2005-06-29 |
Family
ID=34723053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG200407601A SG112108A1 (en) | 2003-11-27 | 2004-11-25 | Display device and method of manufacturing the same |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7084081B2 (enExample) |
| JP (1) | JP2005159162A (enExample) |
| KR (1) | KR100693235B1 (enExample) |
| CN (1) | CN100372054C (enExample) |
| SG (1) | SG112108A1 (enExample) |
| TW (1) | TWI266921B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4589830B2 (ja) * | 2005-06-29 | 2010-12-01 | 共同印刷株式会社 | フレキシブルディスプレイ及びその製造方法 |
| US7187123B2 (en) * | 2004-12-29 | 2007-03-06 | Dupont Displays, Inc. | Display device |
| KR100703467B1 (ko) * | 2005-01-07 | 2007-04-03 | 삼성에스디아이 주식회사 | 박막트랜지스터 |
| KR101293566B1 (ko) * | 2007-01-11 | 2013-08-06 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
| WO2009042784A1 (en) * | 2007-09-25 | 2009-04-02 | The Trustees Of Columbia University In The City Of New York | Methods of producing high uniformity in thin film transistor devices fabricated on laterally crystallized thin films |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3221473B2 (ja) * | 1994-02-03 | 2001-10-22 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JPH11121751A (ja) | 1997-10-13 | 1999-04-30 | Sanyo Electric Co Ltd | 薄膜半導体装置の製造方法 |
| KR100292048B1 (ko) * | 1998-06-09 | 2001-07-12 | 구본준, 론 위라하디락사 | 박막트랜지스터액정표시장치의제조방법 |
| JP2000243968A (ja) | 1999-02-24 | 2000-09-08 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタとその製造方法及びそれを用いた液晶表示装置とその製造方法 |
| JP2000243969A (ja) | 1999-02-24 | 2000-09-08 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタとその製造方法及びそれを用いた液晶表示装置とその製造方法 |
| US6479837B1 (en) * | 1998-07-06 | 2002-11-12 | Matsushita Electric Industrial Co., Ltd. | Thin film transistor and liquid crystal display unit |
| JP2000133807A (ja) | 1998-10-22 | 2000-05-12 | Seiko Epson Corp | 多結晶シリコン薄膜トランジスタ |
| JP2001109399A (ja) * | 1999-10-04 | 2001-04-20 | Sanyo Electric Co Ltd | カラー表示装置 |
| JP5030345B2 (ja) * | 2000-09-29 | 2012-09-19 | 三洋電機株式会社 | 半導体装置 |
| JP4289816B2 (ja) * | 2001-03-22 | 2009-07-01 | シャープ株式会社 | 半導体装置及びその製造方法 |
| JP2004119919A (ja) * | 2002-09-30 | 2004-04-15 | Hitachi Ltd | 半導体薄膜および半導体薄膜の製造方法 |
-
2003
- 2003-11-27 JP JP2003398085A patent/JP2005159162A/ja active Pending
-
2004
- 2004-09-30 KR KR1020040077809A patent/KR100693235B1/ko not_active Expired - Fee Related
- 2004-09-30 TW TW093129637A patent/TWI266921B/zh not_active IP Right Cessation
- 2004-11-25 SG SG200407601A patent/SG112108A1/en unknown
- 2004-11-26 US US10/996,409 patent/US7084081B2/en not_active Expired - Lifetime
- 2004-11-29 CN CNB2004100974912A patent/CN100372054C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005159162A (ja) | 2005-06-16 |
| CN1638024A (zh) | 2005-07-13 |
| TW200523596A (en) | 2005-07-16 |
| TWI266921B (en) | 2006-11-21 |
| CN100372054C (zh) | 2008-02-27 |
| KR20050051539A (ko) | 2005-06-01 |
| US7084081B2 (en) | 2006-08-01 |
| US20050158903A1 (en) | 2005-07-21 |
| KR100693235B1 (ko) | 2007-03-12 |
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