SG11202010886VA - Scanning differential interference contrast in an imaging system design - Google Patents

Scanning differential interference contrast in an imaging system design

Info

Publication number
SG11202010886VA
SG11202010886VA SG11202010886VA SG11202010886VA SG11202010886VA SG 11202010886V A SG11202010886V A SG 11202010886VA SG 11202010886V A SG11202010886V A SG 11202010886VA SG 11202010886V A SG11202010886V A SG 11202010886VA SG 11202010886V A SG11202010886V A SG 11202010886VA
Authority
SG
Singapore
Prior art keywords
imaging system
system design
differential interference
interference contrast
scanning differential
Prior art date
Application number
SG11202010886VA
Other languages
English (en)
Inventor
Raymond Chu
Andrew Zeng
Donald Pettibone
Chunsheng Huang
Bret Whiteside
Fabrice Paccoret
Xuan Wang
Chuanyong Huang
Steve Xu
Anatoly Romanovsky
Original Assignee
Kla Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Corp filed Critical Kla Corp
Publication of SG11202010886VA publication Critical patent/SG11202010886VA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4795—Scattering, i.e. diffuse reflection spatially resolved investigating of object in scattering medium
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/141—Beam splitting or combining systems operating by reflection only using dichroic mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/56—Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8848—Polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Optics & Photonics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
SG11202010886VA 2018-10-26 2019-10-25 Scanning differential interference contrast in an imaging system design SG11202010886VA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862751472P 2018-10-26 2018-10-26
US16/584,370 US10705026B2 (en) 2018-10-26 2019-09-26 Scanning differential interference contrast in an imaging system design
PCT/US2019/057971 WO2020086920A1 (en) 2018-10-26 2019-10-25 Scanning differential interference contrast in an imaging system design

Publications (1)

Publication Number Publication Date
SG11202010886VA true SG11202010886VA (en) 2020-11-27

Family

ID=70328550

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202010886VA SG11202010886VA (en) 2018-10-26 2019-10-25 Scanning differential interference contrast in an imaging system design

Country Status (8)

Country Link
US (1) US10705026B2 (ko)
JP (1) JP7344225B2 (ko)
KR (1) KR102580562B1 (ko)
CN (1) CN112136037B (ko)
IL (1) IL278807B2 (ko)
SG (1) SG11202010886VA (ko)
TW (1) TWI797390B (ko)
WO (1) WO2020086920A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230092006A1 (en) * 2020-02-12 2023-03-23 Mgi Tech Co., Ltd. Optical imaging system and biochemical substance detection system using same
WO2023135681A1 (ja) * 2022-01-12 2023-07-20 株式会社日立ハイテク 表面検査装置
CN115166062B (zh) * 2022-08-22 2024-06-11 天津大学 一种基于差分干涉的全光学超声探测器及探测方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5232384A (en) * 1975-09-08 1977-03-11 Fuji Photo Film Co Ltd Densitometer
JPH05232384A (ja) * 1992-02-18 1993-09-10 Olympus Optical Co Ltd 干渉顕微鏡
GB9610471D0 (en) * 1996-05-18 1996-07-24 Univ Nottingham Optical measurement
US6404544B1 (en) * 1999-06-01 2002-06-11 Optical Perspectives Group, Llc Wavelength multiplexed quantitative differential interference contrast microscopy
US6741356B1 (en) * 1999-09-20 2004-05-25 Olympus Corporation Method for detecting physical amount of object and optical apparatus using the same
JP2001242382A (ja) * 1999-12-24 2001-09-07 Olympus Optical Co Ltd 微分干渉光学系
US20050254065A1 (en) 2004-05-12 2005-11-17 Stokowski Stanley E Method and apparatus for detecting surface characteristics on a mask blank
JP5132982B2 (ja) * 2007-05-02 2013-01-30 株式会社日立ハイテクノロジーズ パターン欠陥検査装置および方法
US8143600B2 (en) 2008-02-18 2012-03-27 Visiongate, Inc. 3D imaging of live cells with ultraviolet radiation
CN102067040B (zh) * 2008-06-26 2013-05-08 Asml荷兰有限公司 重叠测量设备、光刻设备和使用这种重叠测量设备的器件制造方法
JP5171744B2 (ja) 2009-07-01 2013-03-27 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置
JP5553635B2 (ja) * 2009-10-23 2014-07-16 キヤノン株式会社 補償光学装置、撮像装置および補償光学方法、撮像方法
US20110242312A1 (en) * 2010-03-30 2011-10-06 Lasertec Corporation Inspection system and inspection method
JP4716148B1 (ja) * 2010-03-30 2011-07-06 レーザーテック株式会社 検査装置並びに欠陥分類方法及び欠陥検出方法
CN103852458B (zh) * 2014-02-28 2016-02-03 浙江大学 一种基于宽场受激发射差分的显微方法和装置
US9726615B2 (en) 2014-07-22 2017-08-08 Kla-Tencor Corporation System and method for simultaneous dark field and phase contrast inspection
US9860466B2 (en) * 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
CN107710050A (zh) * 2015-06-30 2018-02-16 3M创新有限公司 照明器
WO2018003359A1 (ja) * 2016-07-01 2018-01-04 富士フイルム株式会社 積層型カラーフィルター、キット、積層型カラーフィルターの製造方法および光学センサ
JP6738254B2 (ja) 2016-09-26 2020-08-12 株式会社日立ハイテク 欠陥検出装置及び欠陥観察装置
WO2018100582A1 (en) * 2016-12-02 2018-06-07 Lumus Ltd. Optical system with compact collimating image projector

Also Published As

Publication number Publication date
IL278807B1 (en) 2023-08-01
IL278807B2 (en) 2023-12-01
KR102580562B1 (ko) 2023-09-19
IL278807A (en) 2021-01-31
TWI797390B (zh) 2023-04-01
WO2020086920A1 (en) 2020-04-30
US10705026B2 (en) 2020-07-07
US20200132608A1 (en) 2020-04-30
TW202022687A (zh) 2020-06-16
CN112136037A (zh) 2020-12-25
KR20210069730A (ko) 2021-06-11
JP2022503371A (ja) 2022-01-12
CN112136037B (zh) 2022-03-29
JP7344225B2 (ja) 2023-09-13

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