SG11202001636RA - Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk - Google Patents

Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk

Info

Publication number
SG11202001636RA
SG11202001636RA SG11202001636RA SG11202001636RA SG11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA
Authority
SG
Singapore
Prior art keywords
manufacturing
glass substrate
magnetic disk
polishing liquid
manufacturing glass
Prior art date
Application number
SG11202001636RA
Other languages
English (en)
Inventor
Toshio Takizawa
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG11202001636RA publication Critical patent/SG11202001636RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
    • B24B7/245—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass discontinuous
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/02—Lapping machines or devices; Accessories designed for working surfaces of revolution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/241—Methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
SG11202001636RA 2017-10-31 2018-10-31 Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk SG11202001636RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017210817 2017-10-31
PCT/JP2018/040610 WO2019088209A1 (ja) 2017-10-31 2018-10-31 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法

Publications (1)

Publication Number Publication Date
SG11202001636RA true SG11202001636RA (en) 2020-03-30

Family

ID=66331926

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202001636RA SG11202001636RA (en) 2017-10-31 2018-10-31 Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk

Country Status (5)

Country Link
US (3) US11214713B2 (zh)
JP (3) JP6692006B2 (zh)
CN (2) CN113913156B (zh)
SG (1) SG11202001636RA (zh)
WO (1) WO2019088209A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6692006B2 (ja) * 2017-10-31 2020-05-13 Hoya株式会社 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法
CN112266729A (zh) * 2020-11-17 2021-01-26 云南光电辅料有限公司 一种超低色散玻璃镜片用抛光液及其制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4885352B2 (ja) * 2000-12-12 2012-02-29 昭和電工株式会社 研磨材スラリー及び研磨微粉
JP4807905B2 (ja) 2001-04-05 2011-11-02 昭和電工株式会社 研磨材スラリー及び研磨微粉
JP2002371267A (ja) * 2001-06-15 2002-12-26 Mitsui Mining & Smelting Co Ltd セリウム系研摩材粒子の製造方法及びセリウム系研摩材粒子
JP5256832B2 (ja) 2007-04-17 2013-08-07 日立化成株式会社 研磨剤及びその製造方法
MY154861A (en) * 2008-12-22 2015-08-14 Kao Corp Polishing liquid composition for magnetic-disk substrate
CN101486879A (zh) 2009-02-20 2009-07-22 包头迅博新材料有限公司 一种稀土精细抛光材料及其制造工艺
JP2011110637A (ja) * 2009-11-25 2011-06-09 Asahi Glass Co Ltd 磁気ディスク用ガラス基板の製造方法
CN102079950A (zh) 2009-11-27 2011-06-01 东莞市卓越研磨材料有限公司 单分散稀土抛光粉制备方法
MX337752B (es) * 2010-02-10 2016-03-17 Saint Gobain Ceramics Particulas ceramicas y metodos para producirlas.
JP5736681B2 (ja) 2010-07-15 2015-06-17 旭硝子株式会社 研磨液及び磁気ディスク用ガラス基板の製造方法
WO2012043214A1 (ja) * 2010-09-30 2012-04-05 コニカミノルタオプト株式会社 情報記録媒体用ガラス基板の製造方法および情報記録媒体
US8421536B2 (en) * 2011-09-21 2013-04-16 Analog Devices, Inc. Apparatus and methods for electronic amplification
SG11201401813PA (en) 2011-11-09 2014-09-26 Dowa Eco System Co Ltd Recycling method for polishing agent
WO2013146090A1 (ja) * 2012-03-30 2013-10-03 Hoya株式会社 磁気ディスク用ガラス基板の製造方法
CN107093433B (zh) 2012-08-29 2018-10-16 Hoya株式会社 磁盘用玻璃基板和磁盘
US20160239913A1 (en) 2013-08-13 2016-08-18 Cfph, Llc Foreign exchange trading
JP6063611B2 (ja) 2014-06-30 2017-01-18 Hoya株式会社 磁気ディスク用ガラス基板の製造方法
TW201817835A (zh) 2015-01-12 2018-05-16 美商慧盛材料美國責任有限公司 用於化學機械平坦化組合物之複合研磨粒及其使用方法
CN106479371A (zh) 2016-08-15 2017-03-08 惠州市米特仑科技有限公司 一种高精度复合抛光液及其制备方法
JP6692006B2 (ja) * 2017-10-31 2020-05-13 Hoya株式会社 研磨液、ガラス基板の製造方法、及び、磁気ディスクの製造方法

Also Published As

Publication number Publication date
CN111094502B (zh) 2021-11-16
US20200208015A1 (en) 2020-07-02
CN113913156B (zh) 2022-06-24
JP6692006B2 (ja) 2020-05-13
JP2020128539A (ja) 2020-08-27
US11214713B2 (en) 2022-01-04
JP7201639B2 (ja) 2023-01-10
US20230287244A1 (en) 2023-09-14
US11680187B2 (en) 2023-06-20
US20220119680A1 (en) 2022-04-21
JP2023052035A (ja) 2023-04-11
JPWO2019088209A1 (ja) 2020-06-11
WO2019088209A1 (ja) 2019-05-09
CN111094502A (zh) 2020-05-01
CN113913156A (zh) 2022-01-11

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