SG11201906423YA - Identifying process variations during product manufacture - Google Patents
Identifying process variations during product manufactureInfo
- Publication number
- SG11201906423YA SG11201906423YA SG11201906423YA SG11201906423YA SG11201906423YA SG 11201906423Y A SG11201906423Y A SG 11201906423YA SG 11201906423Y A SG11201906423Y A SG 11201906423YA SG 11201906423Y A SG11201906423Y A SG 11201906423YA SG 11201906423Y A SG11201906423Y A SG 11201906423YA
- Authority
- SG
- Singapore
- Prior art keywords
- product
- international
- contrast
- images
- imaging parameter
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70681—Metrology strategies
- G03F7/70683—Mark designs
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0118—Apparatus with remote processing
- G01N2021/0143—Apparatus with remote processing with internal and external computer
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Automation & Control Theory (AREA)
- Health & Medical Sciences (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Complex Calculations (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762457781P | 2017-02-10 | 2017-02-10 | |
US201762591088P | 2017-11-27 | 2017-11-27 | |
PCT/US2018/017273 WO2018148318A1 (en) | 2017-02-10 | 2018-02-07 | Identifying process variations during product manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201906423YA true SG11201906423YA (en) | 2019-08-27 |
Family
ID=63107157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201906423YA SG11201906423YA (en) | 2017-02-10 | 2018-02-07 | Identifying process variations during product manufacture |
Country Status (8)
Country | Link |
---|---|
US (1) | US10379449B2 (de) |
JP (1) | JP6941176B2 (de) |
KR (1) | KR102267996B1 (de) |
CN (1) | CN110301032B (de) |
DE (1) | DE112018000764T5 (de) |
SG (1) | SG11201906423YA (de) |
TW (1) | TWI738968B (de) |
WO (1) | WO2018148318A1 (de) |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6140140A (en) * | 1998-09-16 | 2000-10-31 | Advanced Micro Devices, Inc. | Method for detecting process sensitivity to integrated circuit layout by compound processing |
TW432452B (en) | 1998-10-15 | 2001-05-01 | Applied Materials Inc | Detection of wafer fragments in a wafer processing apparatus |
JP2003332396A (ja) * | 2002-05-13 | 2003-11-21 | Mitsubishi Electric Corp | 半導体装置の検査方法 |
EP1517183A1 (de) * | 2003-08-29 | 2005-03-23 | ASML Netherlands B.V. | Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel |
NO20040756L (no) * | 2004-02-20 | 2005-08-22 | Renewable Energy Corp | Fremgangsmate og system for a etablere samsvar og sporbarhet mellom vaffere og solceller |
US7355689B2 (en) * | 2005-01-31 | 2008-04-08 | Applied Materials, Inc. | Automatic optical inspection using multiple objectives |
JP4320308B2 (ja) * | 2005-03-15 | 2009-08-26 | 株式会社ルネサステクノロジ | 欠陥検査方法 |
JP4812484B2 (ja) * | 2006-03-24 | 2011-11-09 | 株式会社日立ハイテクノロジーズ | ボルテージコントラストを伴った欠陥をレビューする方法およびその装置 |
US20080062385A1 (en) | 2006-04-07 | 2008-03-13 | Asml Netherlands B.V. | Method of monitoring polarization performance, polarization measurement assembly, lithographic apparatus and computer program product using the same |
US7673278B2 (en) * | 2007-11-29 | 2010-03-02 | Tokyo Electron Limited | Enhanced process yield using a hot-spot library |
WO2015080858A1 (en) * | 2013-12-01 | 2015-06-04 | Kla-Tencor Corporation | Target element types for process parameter metrology |
JP6532479B2 (ja) | 2014-03-31 | 2019-06-19 | ケーエルエー−テンカー コーポレイション | スキャタロメトリ計測法を用いた焦点測定 |
-
2018
- 2018-02-07 SG SG11201906423YA patent/SG11201906423YA/en unknown
- 2018-02-07 JP JP2019543278A patent/JP6941176B2/ja active Active
- 2018-02-07 DE DE112018000764.2T patent/DE112018000764T5/de active Pending
- 2018-02-07 CN CN201880011008.4A patent/CN110301032B/zh active Active
- 2018-02-07 WO PCT/US2018/017273 patent/WO2018148318A1/en active Application Filing
- 2018-02-07 US US15/760,787 patent/US10379449B2/en active Active
- 2018-02-07 KR KR1020197026690A patent/KR102267996B1/ko active IP Right Grant
- 2018-02-08 TW TW107104466A patent/TWI738968B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO2018148318A1 (en) | 2018-08-16 |
US10379449B2 (en) | 2019-08-13 |
CN110301032B (zh) | 2021-02-05 |
TW201841280A (zh) | 2018-11-16 |
JP6941176B2 (ja) | 2021-09-29 |
KR20190108184A (ko) | 2019-09-23 |
KR102267996B1 (ko) | 2021-06-22 |
JP2020507928A (ja) | 2020-03-12 |
DE112018000764T5 (de) | 2019-12-19 |
US20190033730A1 (en) | 2019-01-31 |
CN110301032A (zh) | 2019-10-01 |
TWI738968B (zh) | 2021-09-11 |
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