SG11201803667RA - Systems and methods for region-adaptive defect detection - Google Patents

Systems and methods for region-adaptive defect detection

Info

Publication number
SG11201803667RA
SG11201803667RA SG11201803667RA SG11201803667RA SG11201803667RA SG 11201803667R A SG11201803667R A SG 11201803667RA SG 11201803667R A SG11201803667R A SG 11201803667RA SG 11201803667R A SG11201803667R A SG 11201803667RA SG 11201803667R A SG11201803667R A SG 11201803667RA
Authority
SG
Singapore
Prior art keywords
international
california
test image
image
region
Prior art date
Application number
SG11201803667RA
Inventor
Christopher Maher
Bjorn Brauer
Vijay Ramachandran
Laurent Karsenti
Eliezer Rosengaus
John Jordan
Roni Miller
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG11201803667RA publication Critical patent/SG11201803667RA/en

Links

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • G06T7/001Industrial image inspection using an image reference approach
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1717Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8803Visual inspection
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/10Segmentation; Edge detection
    • G06T7/11Region-based segmentation
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00Arrangements for image or video recognition or understanding
    • G06V10/70Arrangements for image or video recognition or understanding using pattern recognition or machine learning
    • G06V10/74Image or video pattern matching; Proximity measures in feature spaces
    • G06V10/75Organisation of the matching processes, e.g. simultaneous or sequential comparisons of image or video features; Coarse-fine approaches, e.g. multi-scale approaches; using context analysis; Selection of dictionaries
    • G06V10/751Comparing pixel values or logical combinations thereof, or feature values having positional relevance, e.g. template matching
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00Arrangements for image or video recognition or understanding
    • G06V10/70Arrangements for image or video recognition or understanding using pattern recognition or machine learning
    • G06V10/74Image or video pattern matching; Proximity measures in feature spaces
    • G06V10/75Organisation of the matching processes, e.g. simultaneous or sequential comparisons of image or video features; Coarse-fine approaches, e.g. multi-scale approaches; using context analysis; Selection of dictionaries
    • G06V10/758Involving statistics of pixels or of feature values, e.g. histogram matching
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06VIMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00Arrangements for image or video recognition or understanding
    • G06V10/88Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/1765Method using an image detector and processing of image signal
    • G01N2021/177Detector of the video camera type
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/20Special algorithmic details
    • G06T2207/20172Image enhancement details
    • G06T2207/20182Noise reduction or smoothing in the temporal domain; Spatio-temporal filtering
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 26 May 2017(26.05.2017) WIPOIPCT (10) International Publication Number WO 2017/087571 A1 (51) International Patent Classification: G06T 7/00 (2006.01) G01N 21/17 (2006.01) G01N21/88 (2006.01) (21) International Application Number: PCT/US2016/062355 (22) International Filing Date: 16 November 2016 (16.11.2016) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/257,025 18 November 2015 (18.11.2015) US 15/350,632 14 November 2016 (14.11.2016) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Department, One Technology Drive, Milpitas, Cali­ fornia 95035 (US). (72) Inventors: MAHER, Christopher; 407 Lawndale Aven­ ue, Campbell, California 95008 (US). BRAUER, Bjorn; 16698 NW Tucson Street, Beaverton, Oregon 97006 (US). RAMACHANDRAN, Vijay; 832 Duncardine Way, Sunnyvale, California 94087 (US). KARSENTI, Laurent; Haraz Street 16/1, 76086 Rehovot (IL). ROSENGAUS, Eliezer; 3704 Ortega Court, Palo Alto, California 94303 (US). JORDAN, John; 3397 Ivan Way, Mountain View, California 94040 (US). MILLER, Roni; Zamenhof 16, Tel Aviv, Rotem Littman, 17 Eshkol St., Hod Hasharon (IL). (74) Agents: MCANDREWS, Kevin et al.; KLA-Tencor Corp., Legal Department, One Technology Drive, Milpitas, California 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, [Continued on next page] (54) Title: SYSTEMS AND METHODS FOR REGION-ADAPTIVE DEFECT DETECTION 100 1102 INSPECTION MEASUREMENT SUB-SYSTEM J 1 i i i t 104 SAMPLE 106 CONTROLLER 108 : i 1110 m PROCESSOR ' i i i : MEMORY e i 1 (57) : A defect detection meth­ od includes acquiring a reference im­ age; selecting a target region of the ref­ erence image; identifying, based on a matching metric, one or more compar­ ative regions of the reference image corresponding to the target region; ac­ quiring a test image; masking the test image with the target region of the ref­ erence image and the one or more com­ parative regions of the reference image; defining a defect threshold for the tar­ get region in the test image based on the one or more comparative regions in the test image; and determining whether the target region of the test image con­ tains a defect based on the defect threshold. WO 2017/087571 A1 TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: with international search report (Art. 21(3))
SG11201803667RA 2015-11-18 2016-11-16 Systems and methods for region-adaptive defect detection SG11201803667RA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562257025P 2015-11-18 2015-11-18
US15/350,632 US10535131B2 (en) 2015-11-18 2016-11-14 Systems and methods for region-adaptive defect detection
PCT/US2016/062355 WO2017087571A1 (en) 2015-11-18 2016-11-16 Systems and methods for region-adaptive defect detection

Publications (1)

Publication Number Publication Date
SG11201803667RA true SG11201803667RA (en) 2018-06-28

Family

ID=58690746

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201803667RA SG11201803667RA (en) 2015-11-18 2016-11-16 Systems and methods for region-adaptive defect detection

Country Status (8)

Country Link
US (1) US10535131B2 (en)
JP (1) JP6873129B2 (en)
KR (1) KR102445535B1 (en)
CN (1) CN108352063B (en)
IL (1) IL258804B (en)
SG (1) SG11201803667RA (en)
TW (1) TWI699521B (en)
WO (1) WO2017087571A1 (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10186026B2 (en) * 2015-11-17 2019-01-22 Kla-Tencor Corp. Single image detection
CN110191661B (en) * 2016-12-20 2022-07-05 株式会社资生堂 Coating control device, coating control method, and recording medium
US11151711B2 (en) * 2018-06-06 2021-10-19 Kla-Tencor Corporation Cross layer common-unique analysis for nuisance filtering
US11429806B2 (en) 2018-11-09 2022-08-30 Canon Virginia, Inc. Devices, systems, and methods for anomaly detection
CN109580632B (en) * 2018-11-23 2021-03-30 京东方科技集团股份有限公司 Defect determination method, device and storage medium
US11474052B2 (en) 2019-01-09 2022-10-18 The Boeing Company Real time additive manufacturing process inspection using x-ray emission and detection through a build chamber
US11321846B2 (en) 2019-03-28 2022-05-03 Canon Virginia, Inc. Devices, systems, and methods for topological normalization for anomaly detection
CN111768357B (en) * 2019-03-29 2024-03-01 银河水滴科技(北京)有限公司 Image detection method and device
US11120546B2 (en) * 2019-09-24 2021-09-14 Kla Corporation Unsupervised learning-based reference selection for enhanced defect inspection sensitivity
US11416982B2 (en) 2019-10-01 2022-08-16 KLA Corp. Controlling a process for inspection of a specimen
US11328435B2 (en) * 2020-06-08 2022-05-10 KLA Corp. Image alignment setup for specimens with intra- and inter-specimen variations using unsupervised learning and adaptive database generation methods
CN111986159B (en) * 2020-07-24 2024-02-27 苏州威华智能装备有限公司 Electrode defect detection method and device for solar cell and storage medium
US11803960B2 (en) * 2020-08-12 2023-10-31 Kla Corporation Optical image contrast metric for optical target search
DE102020123979A1 (en) 2020-09-15 2022-03-17 Carl Zeiss Smt Gmbh Defect detection for semiconductor structures on a wafer
CN112381799B (en) * 2020-11-16 2024-01-23 广东电网有限责任公司肇庆供电局 Wire strand breakage confirmation method and device, electronic equipment and computer readable storage medium
CN113283279B (en) * 2021-01-25 2024-01-19 广东技术师范大学 Multi-target tracking method and device in video based on deep learning
CN112819778B (en) * 2021-01-28 2022-04-12 中国空气动力研究与发展中心超高速空气动力研究所 Multi-target full-pixel segmentation method for aerospace material damage detection image
US11921052B2 (en) 2022-03-31 2024-03-05 Kla Corporation Inspection with previous step subtraction
CN114723701B (en) * 2022-03-31 2023-04-18 厦门力和行自动化有限公司 Gear defect detection method and system based on computer vision
US11922619B2 (en) 2022-03-31 2024-03-05 Kla Corporation Context-based defect inspection
CN115876823B (en) * 2023-01-19 2023-07-14 合肥晶合集成电路股份有限公司 Film defect detection method, film defect detection device and detection system
CN116152257B (en) * 2023-04-22 2023-06-27 拓普思传感器(太仓)有限公司 Detection information optimization method applied to sensor, server and medium

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6154714A (en) 1997-11-17 2000-11-28 Heuristic Physics Laboratories Method for using wafer navigation to reduce testing times of integrated circuit wafers
US6539106B1 (en) * 1999-01-08 2003-03-25 Applied Materials, Inc. Feature-based defect detection
US7135344B2 (en) 2003-07-11 2006-11-14 Applied Materials, Israel, Ltd. Design-based monitoring
US7676007B1 (en) 2004-07-21 2010-03-09 Jihoon Choi System and method for interpolation based transmit beamforming for MIMO-OFDM with partial feedback
US7676077B2 (en) 2005-11-18 2010-03-09 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
US7570796B2 (en) 2005-11-18 2009-08-04 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
US8041103B2 (en) 2005-11-18 2011-10-18 Kla-Tencor Technologies Corp. Methods and systems for determining a position of inspection data in design data space
JP2008203034A (en) * 2007-02-19 2008-09-04 Olympus Corp Defect detection device and method
JP2008258982A (en) * 2007-04-05 2008-10-23 Canon Inc Image processor, control method therefor, and program
US7796804B2 (en) * 2007-07-20 2010-09-14 Kla-Tencor Corp. Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer
US8126255B2 (en) 2007-09-20 2012-02-28 Kla-Tencor Corp. Systems and methods for creating persistent data for a wafer and for using persistent data for inspection-related functions
JP2009186319A (en) 2008-02-06 2009-08-20 Fujitsu Microelectronics Ltd Defect inspection method and defect inspection apparatus
US8702566B2 (en) 2008-12-23 2014-04-22 Paul Mazzanobile Speed and/or agility training devices and systems and methods for use thereof
JP5275017B2 (en) * 2008-12-25 2013-08-28 株式会社日立ハイテクノロジーズ Defect inspection method and apparatus
JP2010164487A (en) * 2009-01-16 2010-07-29 Tokyo Seimitsu Co Ltd Defect inspecting apparatus and defect inspecting method
WO2010090914A2 (en) * 2009-02-03 2010-08-12 Qcept Technologies, Inc. Patterned wafer inspection system using a non-vibrating contact potential difference sensor
JP5570530B2 (en) * 2009-02-13 2014-08-13 ケーエルエー−テンカー コーポレイション Defect detection on wafer
US9098893B2 (en) * 2011-12-21 2015-08-04 Applied Materials Israel, Ltd. System, method and computer program product for classification within inspection images
JP5767963B2 (en) * 2011-12-28 2015-08-26 株式会社キーエンス Appearance inspection apparatus, appearance inspection method, and computer program
JP2013160629A (en) * 2012-02-06 2013-08-19 Hitachi High-Technologies Corp Defect inspection method, defect inspection apparatus, program, and output unit
US9041793B2 (en) * 2012-05-17 2015-05-26 Fei Company Scanning microscope having an adaptive scan
US8977035B2 (en) * 2012-06-13 2015-03-10 Applied Materials Israel, Ltd. System, method and computer program product for detection of defects within inspection images
US9367911B2 (en) * 2012-06-13 2016-06-14 Applied Materials Israel, Ltd. Apparatus and method for defect detection including patch-to-patch comparisons
US9916653B2 (en) * 2012-06-27 2018-03-13 Kla-Tenor Corporation Detection of defects embedded in noise for inspection in semiconductor manufacturing
US9189844B2 (en) * 2012-10-15 2015-11-17 Kla-Tencor Corp. Detecting defects on a wafer using defect-specific information
US9311698B2 (en) 2013-01-09 2016-04-12 Kla-Tencor Corp. Detecting defects on a wafer using template image matching
US9222895B2 (en) 2013-02-25 2015-12-29 Kla-Tencor Corp. Generalized virtual inspector
TWI614569B (en) * 2013-04-01 2018-02-11 克萊譚克公司 Method and system of detecting defects in photomasks
US10127652B2 (en) * 2014-02-06 2018-11-13 Kla-Tencor Corp. Defect detection and classification based on attributes determined from a standard reference image
US10290092B2 (en) * 2014-05-15 2019-05-14 Applied Materials Israel, Ltd System, a method and a computer program product for fitting based defect detection

Also Published As

Publication number Publication date
KR102445535B1 (en) 2022-09-20
CN108352063B (en) 2022-03-25
US10535131B2 (en) 2020-01-14
IL258804B (en) 2021-04-29
US20170140516A1 (en) 2017-05-18
TWI699521B (en) 2020-07-21
JP6873129B2 (en) 2021-05-19
IL258804A (en) 2018-06-28
KR20180071404A (en) 2018-06-27
CN108352063A (en) 2018-07-31
TW201728892A (en) 2017-08-16
WO2017087571A1 (en) 2017-05-26
JP2019505089A (en) 2019-02-21

Similar Documents

Publication Publication Date Title
SG11201803667RA (en) Systems and methods for region-adaptive defect detection
SG11201903715XA (en) High sensitivity repeater defect detection
SG11201909420QA (en) Picture-based vehicle loss assessment method and apparatus, and electronic device
SG11201808494TA (en) Signal light detection
SG11201806595UA (en) Using cell-free dna fragment size to determine copy number variations
SG11201804518TA (en) A method to design geophysical surveys using full wavefield inversion point-spread function analysis
SG11201807053TA (en) Compositions and methods for identifying rare cells
SG11201809913PA (en) Methods for detecting target nucleic acids in a sample
SG11201908288XA (en) Configurable annotations for privacy-sensitive user content
SG11201903836QA (en) Image-based vehicle damage determining method, apparatus, and electronic device
SG11201811343SA (en) System and methods for detecting online fraud
SG11201901334SA (en) Convolutional neural network-based mode selection and defect classification for image fusion
SG11201906413XA (en) Exposure apparatus
SG11201907747XA (en) Systems and methods for metrology with layer-specific illumination spectra
SG11201907074RA (en) Determining the impacts of stochastic behavior on overlay metrology data
SG11201807666SA (en) Perspective correction for curved display screens
SG11201908509TA (en) Biosensors for biological or chemical analysis and methods of manufacturing the same
SG11201806647VA (en) Systems and methods for allergen detection
SG11201900509YA (en) Simultaneous capturing of overlay signals from multiple targets
SG11201901668RA (en) Detection of anomalies in multivariate data
SG11201805103VA (en) Method and system for service enablement
SG11201805176RA (en) A method and an apparatus for monitoring and controlling deposit formation
SG11201908549RA (en) Automated quality control and spectral error correction for sample analysis instruments
SG11202000495YA (en) Methods and systems for environmental credit scoring
SG11201810924WA (en) System and method for secondary analysis of nucleotide sequencing data