SG11201900804WA - System and method for generating multi-channel tunable illumination from a broadband source - Google Patents

System and method for generating multi-channel tunable illumination from a broadband source

Info

Publication number
SG11201900804WA
SG11201900804WA SG11201900804WA SG11201900804WA SG11201900804WA SG 11201900804W A SG11201900804W A SG 11201900804WA SG 11201900804W A SG11201900804W A SG 11201900804WA SG 11201900804W A SG11201900804W A SG 11201900804WA SG 11201900804W A SG11201900804W A SG 11201900804WA
Authority
SG
Singapore
Prior art keywords
illumination
channel
international
filter
pct
Prior art date
Application number
SG11201900804WA
Other languages
English (en)
Inventor
Andy Hill (Andrew)
Amnon Manassen
Ohad Bachar
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG11201900804WA publication Critical patent/SG11201900804WA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/255—Details, e.g. use of specially adapted sources, lighting or optical systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0418—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using attenuators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/021—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using plane or convex mirrors, parallel phase plates, or particular reflectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
    • G01J3/0213—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using attenuators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/06—Scanning arrangements arrangements for order-selection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J2001/4247—Photometry, e.g. photographic exposure meter using electric radiation detectors for testing lamps or other light sources
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/06—Scanning arrangements arrangements for order-selection
    • G01J2003/069—Complex motion, e.g. rotation of grating and correcting translation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1213—Filters in general, e.g. dichroic, band
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1213—Filters in general, e.g. dichroic, band
    • G01J2003/1217—Indexed discrete filters or choppers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1213—Filters in general, e.g. dichroic, band
    • G01J2003/1221—Mounting; Adjustment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G01J2003/123—Indexed discrete filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G01J2003/1234—Continuously variable IF [CVIF]; Wedge type
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G01J2003/1243—Pivoting IF or other position variation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G01J2003/1247—Tuning
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G01N2021/3148—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths using three or more wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G01N2021/3166—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths using separate detectors and filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G01N2021/317—Special constructive features
    • G01N2021/3177—Use of spatially separated filters in simultaneous way
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/066—Modifiable path; multiple paths in one sample
    • G01N2201/0666—Selectable paths; insertable multiple sources
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/066—Modifiable path; multiple paths in one sample
    • G01N2201/0668—Multiple paths; optimisable path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/067—Electro-optic, magneto-optic, acousto-optic elements
    • G01N2201/0675—SLM
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G01N2201/0683—Brewster plate; polarisation controlling elements

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Peptides Or Proteins (AREA)
SG11201900804WA 2016-08-17 2017-08-09 System and method for generating multi-channel tunable illumination from a broadband source SG11201900804WA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662375996P 2016-08-17 2016-08-17
US15/387,180 US10371626B2 (en) 2016-08-17 2016-12-21 System and method for generating multi-channel tunable illumination from a broadband source
PCT/US2017/046084 WO2018034908A1 (en) 2016-08-17 2017-08-09 System and method for generating multi-channel tunable illumination from a broadband source

Publications (1)

Publication Number Publication Date
SG11201900804WA true SG11201900804WA (en) 2019-03-28

Family

ID=61191521

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201900804WA SG11201900804WA (en) 2016-08-17 2017-08-09 System and method for generating multi-channel tunable illumination from a broadband source

Country Status (7)

Country Link
US (1) US10371626B2 (enExample)
JP (1) JP6782834B2 (enExample)
KR (1) KR102265871B1 (enExample)
CN (1) CN109564157B (enExample)
SG (1) SG11201900804WA (enExample)
TW (1) TWI728171B (enExample)
WO (1) WO2018034908A1 (enExample)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10444161B2 (en) 2017-04-05 2019-10-15 Kla-Tencor Corporation Systems and methods for metrology with layer-specific illumination spectra
US10871395B2 (en) * 2017-04-14 2020-12-22 Kla Corporation Filter assembly for providing adjustable spectral capabilities in a broadband inspection system
US10401738B2 (en) * 2017-08-02 2019-09-03 Kla-Tencor Corporation Overlay metrology using multiple parameter configurations
US10714327B2 (en) * 2018-03-19 2020-07-14 Kla-Tencor Corporation System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination
US10840055B2 (en) * 2018-03-20 2020-11-17 Kla Corporation System and method for photocathode illumination inspection
US10677588B2 (en) * 2018-04-09 2020-06-09 Kla-Tencor Corporation Localized telecentricity and focus optimization for overlay metrology
WO2019217330A1 (en) * 2018-05-07 2019-11-14 Stc. Unm Method and system for in-line optical scatterometry
KR102207041B1 (ko) * 2019-05-17 2021-01-25 주식회사 더웨이브톡 광학 측정 장치
TWI660230B (zh) * 2018-05-30 2019-05-21 台達電子工業股份有限公司 投影裝置
CN110554552A (zh) * 2018-05-30 2019-12-10 台达电子工业股份有限公司 投影装置
KR102120551B1 (ko) 2018-09-14 2020-06-09 (주)오로스 테크놀로지 오버레이 측정장치
EP3931865A4 (en) 2019-02-14 2023-02-15 KLA Corporation SYSTEM AND METHOD FOR MEASUREMENT OF MISREGISTRATION OF SEMICONDUCTOR DEVICE WAFERS USING INDUCED TOPOGRAPHY
US11156846B2 (en) 2019-04-19 2021-10-26 Kla Corporation High-brightness illumination source for optical metrology
US20200340858A1 (en) * 2019-04-24 2020-10-29 Applied Materials, Inc. Plasma emission monitoring system with cross-dispersion grating
KR102528000B1 (ko) * 2019-05-17 2023-05-03 주식회사 더웨이브톡 광학 측정 장치
JP2022533246A (ja) * 2019-05-23 2022-07-21 東京エレクトロン株式会社 ハイパースペクトルイメージングを使用する半導体プロセスの光学的診断
EP3783438A1 (en) 2019-08-21 2021-02-24 ASML Netherlands B.V. Wavelength selection module, illumination system and metrology system
KR102721975B1 (ko) * 2019-08-21 2024-10-28 삼성전자주식회사 단색화 장치
US11662562B2 (en) * 2020-02-09 2023-05-30 Kla Corporation Broadband illumination tuning
US11300405B2 (en) * 2020-08-03 2022-04-12 Kla Corporation Grey-mode scanning scatterometry overlay metrology
FI129324B (en) 2021-01-08 2021-11-30 Timegate Instr Oy APPARATUS AND METHOD FOR MEASURING THE SPECTRUM COMPONENTS OF RADIATED LIGHT
US12111580B2 (en) * 2021-03-11 2024-10-08 Kla Corporation Optical metrology utilizing short-wave infrared wavelengths
DE102021203620A1 (de) * 2021-04-13 2022-10-13 Carl Zeiss Microscopy Gmbh Vorrichtung und Verfahren zur Multispot-Scanning-Mikroskopie
CN113237548A (zh) * 2021-04-28 2021-08-10 航天科工深圳（集团）有限公司 基于声光可调谐滤波器的高分辨光学系统
US12188818B2 (en) 2021-06-18 2025-01-07 Samsung Electronics Co., Ltd. Spectrometer, metrology system, and semiconductor inspection method
US11913834B2 (en) * 2021-08-16 2024-02-27 Endress+Hauser Optical Analysis, Inc. Spatially offset Raman probe with coaxial excitation and collection apertures
US11531275B1 (en) 2021-08-25 2022-12-20 Kla Corporation Parallel scatterometry overlay metrology
JP7410625B2 (ja) * 2021-09-28 2024-01-10 キヤノン株式会社 照明装置、計測装置、基板処理装置、および物品の製造方法
FI131148B1 (en) 2021-11-17 2024-10-30 Teknologian Tutkimuskeskus Vtt Oy Improved hyperspectral light source
KR102750985B1 (ko) * 2023-03-29 2025-01-09 (주) 오로스테크놀로지 파장 가변형 광섬유 광원 및 이를 구비한 오버레이 측정 장치
CN116540504B (zh) * 2023-07-04 2024-04-26 之江实验室 一种基于连续谱光源的可变波长激光直写光刻系统与应用
US12411420B2 (en) * 2023-09-29 2025-09-09 Kla Corporation Small in-die target design for overlay measurement
US20250147382A1 (en) * 2023-11-07 2025-05-08 Iism Inc. Tunable duv laser system using angle-dependent wavelength selector
US20250164410A1 (en) * 2023-11-22 2025-05-22 Tokyo Electron Limited Optical metrology
US20250216189A1 (en) * 2023-12-28 2025-07-03 Onto Innovation Inc. Metrology device with wavelength-frequency multiplexing

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2043288B (en) * 1979-03-02 1983-01-26 Pye Electronic Prod Ltd Ebert monochromator
JP2550651B2 (ja) 1988-03-28 1996-11-06 株式会社島津製作所 ダブルモノクロメータ
GB9015793D0 (en) * 1990-07-18 1990-09-05 Medical Res Council Confocal scanning optical microscope
JPH0783622A (ja) 1993-09-20 1995-03-28 Mitsubishi Electric Corp 膜厚測定装置
US6879619B1 (en) * 1999-07-27 2005-04-12 Intel Corporation Method and apparatus for filtering an optical beam
AU7982600A (en) * 1999-09-14 2001-04-17 Corning Incorporated Dual grating light filtering system
US6989898B2 (en) * 2003-01-23 2006-01-24 Agilent Technologies, Inc. Dynamic method for changing the operation of a multiple-pass monochromator between additive and subtractive modes
JP2005156607A (ja) * 2003-11-20 2005-06-16 Nec Viewtechnology Ltd 色分離装置及びプロジェクタ
WO2005114148A2 (en) * 2004-05-14 2005-12-01 Kla-Tencor Technologies Corp. Systems and methods for measurement or analysis of a specimen
DE102004047820A1 (de) * 2004-09-29 2006-03-30 Leica Microsystems Cms Gmbh Rastermikroskop und rastermikroskopisches Verfahren
US20070091325A1 (en) * 2005-01-07 2007-04-26 Mehrdad Nikoonahad Multi-channel optical metrology
US7382456B2 (en) * 2005-12-29 2008-06-03 Honeywell Asca, Inc. Spectroscopic sensor for measuring sheet properties
US7936462B2 (en) * 2007-01-19 2011-05-03 Thorlabs, Inc. Optical coherence tomography imaging system and method
US7570358B2 (en) * 2007-03-30 2009-08-04 Asml Netherlands Bv Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensor
WO2009001390A1 (en) 2007-06-28 2008-12-31 Gian Luca Ferri Adjustable multi-band excitation and visualization / imaging system for simultaneous viewing multiple fluorescence
ATE489655T1 (de) * 2007-10-22 2010-12-15 Tecan Trading Ag Laser scanner-gerät für fluoreszenzmessungen
US8896832B2 (en) * 2010-06-17 2014-11-25 Kla-Tencor Corp. Discrete polarization scatterometry
US9372118B1 (en) * 2011-03-07 2016-06-21 Fluxdata, Inc. Apparatus and method for multispectral based detection
TW201247016A (en) * 2011-04-12 2012-11-16 Koninkl Philips Electronics Nv Apparatus, system and method for pulse width modulated lighting control
CN104965385B (zh) * 2011-07-08 2018-01-26 深圳市光峰光电技术有限公司 投影系统、光源系统以及光源组件
EP2957899A1 (en) * 2013-02-13 2015-12-23 Sony Corporation Measuring device and measuring method
US9512985B2 (en) * 2013-02-22 2016-12-06 Kla-Tencor Corporation Systems for providing illumination in optical metrology
US9354177B2 (en) * 2013-06-26 2016-05-31 Kla-Tencor Corporation System and method for defect detection and photoluminescence measurement of a sample
DE102013227108A1 (de) * 2013-09-03 2015-03-05 Leica Microsystems Cms Gmbh Vorrichtung und Verfahren zum Untersuchen einer Probe
US9306369B2 (en) * 2013-11-22 2016-04-05 Trumpf Laser Gmbh Wavelength selective external resonator and beam combining system for dense wavelength beam combining laser
US9546962B2 (en) * 2014-02-12 2017-01-17 Kla-Tencor Corporation Multi-spot scanning collection optics
CN106572792B (zh) * 2014-06-05 2020-03-06 海德堡大学 用于多光谱成像的方法和部件
JP6836848B2 (ja) * 2016-06-22 2021-03-03 株式会社ミツトヨ レーザ光調整方法、及びレーザ光源装置

Also Published As

Publication number Publication date
KR20190032601A (ko) 2019-03-27
CN109564157B (zh) 2022-06-17
TWI728171B (zh) 2021-05-21
TW201809796A (zh) 2018-03-16
US20180052099A1 (en) 2018-02-22
US10371626B2 (en) 2019-08-06
JP2019528444A (ja) 2019-10-10
WO2018034908A1 (en) 2018-02-22
KR102265871B1 (ko) 2021-06-16
JP6782834B2 (ja) 2020-11-11
CN109564157A (zh) 2019-04-02

Similar Documents

Publication Publication Date Title
SG11201900804WA (en) System and method for generating multi-channel tunable illumination from a broadband source
SG11201900509YA (en) Simultaneous capturing of overlay signals from multiple targets
SG11201910019PA (en) Microorganisms and methods for producing cannabinoids and cannabinoid derivatives
SG11201901334SA (en) Convolutional neural network-based mode selection and defect classification for image fusion
SG11201907747XA (en) Systems and methods for metrology with layer-specific illumination spectra
SG11201811333RA (en) Solid inspection apparatus and method of use
SG11201803666WA (en) Single image detection
SG11201900246TA (en) Determining drivability of objects for autonomous vehicles
SG11201908847TA (en) Apparatuses, systems and methods for imaging flow cytometry
SG11201807369UA (en) System and method for beam adjustment request
SG11201903771XA (en) Binding molecules specific for asct2 and uses thereof
SG11201901783UA (en) A device to manipulate ions of same or different polarities
SG11201901644TA (en) Optical detection of vibrations
SG11201901834WA (en) Micrornas as biomarkers for endometriosis
SG11201908815SA (en) Device and method for detection and classification of pathogens
SG11201902667UA (en) Methods and systems for chromatography data analysis
SG11201900723YA (en) Apparatus and system for enhanced selective contaminant removal processes related thereto
SG11201810682PA (en) Dark field wafer nano-defect inspection system with a singular beam
SG11201900442PA (en) Sorting of t lymphocytes in a microfluidic device
SG11201805906WA (en) Diagnostic and prognostic methods for cardiovascular diseases and events
SG11201900803YA (en) Surface defect inspection with large particle monitoring and laser power control
SG11201906583YA (en) Method for adjusting color temperature based on screen brightness, non-transitory computer-readable storage medium and terminal device
SG11202000114TA (en) Hybrid inspection system for efficient process window discovery
SG11201906188QA (en) Method for adjusting color temperature based on rgb optical spectral energy reconstruction, non-transitory computer-readable storage medium and terminal device
SG11201806432PA (en) Methods for assessing risk of developing colorectal cancer