SG11201900403PA - Circuits and methods providing mutual capacitance in vertical electrical connections - Google Patents

Circuits and methods providing mutual capacitance in vertical electrical connections

Info

Publication number
SG11201900403PA
SG11201900403PA SG11201900403PA SG11201900403PA SG11201900403PA SG 11201900403P A SG11201900403P A SG 11201900403PA SG 11201900403P A SG11201900403P A SG 11201900403PA SG 11201900403P A SG11201900403P A SG 11201900403PA SG 11201900403P A SG11201900403P A SG 11201900403PA
Authority
SG
Singapore
Prior art keywords
international
vertical electrical
electrical connections
san diego
vertical
Prior art date
Application number
SG11201900403PA
Other languages
English (en)
Inventor
Priyatharshan Pathmanathan
Devarshi Patel
Dennis Allen Northgrave
Kyle Roberts
Original Assignee
Qualcomm Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qualcomm Inc filed Critical Qualcomm Inc
Publication of SG11201900403PA publication Critical patent/SG11201900403PA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40Capacitors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49822Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49827Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/0228Compensation of cross-talk by a mutually correlated lay-out of printed circuit traces, e.g. for compensation of cross-talk in mounted connectors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • H05K1/115Via connections; Lands around holes or via connections
    • H05K1/116Lands, clearance holes or other lay-out details concerning the surrounding of a via
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/02Arrangements for writing information into, or reading information out from, a digital store with means for avoiding parasitic signals
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/162Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/09636Details of adjacent, not connected vias

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Electrotherapy Devices (AREA)
  • Details Of Connecting Devices For Male And Female Coupling (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Geometry (AREA)
SG11201900403PA 2016-09-02 2017-08-08 Circuits and methods providing mutual capacitance in vertical electrical connections SG11201900403PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/255,412 US9722012B1 (en) 2016-09-02 2016-09-02 Circuits and methods providing mutual capacitance in vertical electrical connections
PCT/US2017/045888 WO2018044514A1 (en) 2016-09-02 2017-08-08 Circuits and methods providing mutual capacitance in vertical electrical connections

Publications (1)

Publication Number Publication Date
SG11201900403PA true SG11201900403PA (en) 2019-03-28

Family

ID=59382664

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201900403PA SG11201900403PA (en) 2016-09-02 2017-08-08 Circuits and methods providing mutual capacitance in vertical electrical connections

Country Status (8)

Country Link
US (1) US9722012B1 (zh)
EP (1) EP3508039A1 (zh)
KR (1) KR102000779B1 (zh)
CN (1) CN109691241B (zh)
AU (1) AU2017321176B2 (zh)
SG (1) SG11201900403PA (zh)
TW (1) TWI630608B (zh)
WO (1) WO2018044514A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10149377B2 (en) 2016-06-24 2018-12-04 Invensas Corporation Stacked transmission line
US11862547B2 (en) * 2020-02-28 2024-01-02 Intel Corporation Differential crosstalk self-cancelation in stackable structures
TWI756860B (zh) * 2020-10-08 2022-03-01 緯創資通股份有限公司 訊號傳輸之通道結構
CN115003008B (zh) * 2022-05-25 2023-10-20 长鑫存储技术有限公司 用于改善远端串扰的导体结构、半导体封装结构和电路板
CN117787197A (zh) * 2022-09-22 2024-03-29 长鑫存储技术有限公司 电路结构及其形成方法、存储器
CN118317500A (zh) * 2023-01-07 2024-07-09 深圳市中兴微电子技术有限公司 电路结构、电子设备以及互容结构设计方法

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US6316801B1 (en) * 1998-03-04 2001-11-13 Nec Corporation Semiconductor device having capacitive element structure and multilevel interconnection structure and method of fabricating the same
US6819543B2 (en) * 2002-12-31 2004-11-16 Intel Corporation Multilayer capacitor with multiple plates per layer
US7154047B2 (en) * 2004-02-27 2006-12-26 Texas Instruments Incorporated Via structure of packages for high frequency semiconductor devices
US7980900B2 (en) * 2004-05-14 2011-07-19 Commscope, Inc. Of North Carolina Next high frequency improvement by using frequency dependent effective capacitance
EP2018660B1 (en) * 2006-05-02 2020-03-25 Murata Integrated Passive Solutions Electric device comprising an electrode with enhanced stability
TWI325512B (en) * 2006-08-01 2010-06-01 Au Optronics Corp Liquid crystal display panel and method for making liquid crystal display panel
KR100791339B1 (ko) * 2006-08-25 2008-01-03 삼성전자주식회사 평탄화 저항 패턴을 포함하는 복합칩 반도체 소자 및 그제조 방법
US9240621B2 (en) 2009-06-24 2016-01-19 Intel Corporation Micro-strip crosstalk compensation using stubs
JP5724531B2 (ja) * 2010-04-12 2015-05-27 セイコーエプソン株式会社 電気光学装置及び電子機器
TWI438882B (zh) * 2011-11-01 2014-05-21 Unimicron Technology Corp 嵌埋電容元件之封裝基板及其製法
US9331137B1 (en) * 2012-03-27 2016-05-03 Altera Corporation Metal-insulator-metal capacitors between metal interconnect layers
JP5904856B2 (ja) * 2012-04-23 2016-04-20 キヤノン株式会社 プリント配線板、半導体パッケージ及びプリント回路板
US20140177150A1 (en) 2012-12-21 2014-06-26 Olufemi B. Oluwafemi Crosstalk cancelation in striplines
US10103054B2 (en) 2013-03-13 2018-10-16 Intel Corporation Coupled vias for channel cross-talk reduction
US9105635B2 (en) 2013-03-13 2015-08-11 Intel Corporation Stubby pads for channel cross-talk reduction
US20150085458A1 (en) 2013-09-26 2015-03-26 Raul Enriquez Shibayama Reducing Far End Crosstalk in Single Ended Interconnects and Buses
US9893761B2 (en) 2014-09-25 2018-02-13 Intel Corporation Signal routing with reduced crosstalk

Also Published As

Publication number Publication date
WO2018044514A1 (en) 2018-03-08
CN109691241B (zh) 2022-09-30
US9722012B1 (en) 2017-08-01
AU2017321176A1 (en) 2019-02-07
EP3508039A1 (en) 2019-07-10
TW201812761A (zh) 2018-04-01
AU2017321176B2 (en) 2019-12-12
KR20190028551A (ko) 2019-03-18
BR112019003457A2 (pt) 2019-05-21
TWI630608B (zh) 2018-07-21
KR102000779B1 (ko) 2019-07-17
CN109691241A (zh) 2019-04-26

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