SG11201610032VA - Marking method for wafer dice - Google Patents

Marking method for wafer dice

Info

Publication number
SG11201610032VA
SG11201610032VA SG11201610032VA SG11201610032VA SG11201610032VA SG 11201610032V A SG11201610032V A SG 11201610032VA SG 11201610032V A SG11201610032V A SG 11201610032VA SG 11201610032V A SG11201610032V A SG 11201610032VA SG 11201610032V A SG11201610032V A SG 11201610032VA
Authority
SG
Singapore
Prior art keywords
marking method
wafer dice
dice
wafer
marking
Prior art date
Application number
SG11201610032VA
Other languages
English (en)
Inventor
Sun Jung Kim
Jae Man Choi
Sung Beom Jung
Jung Jin Seo
Hye Ji Jung
Original Assignee
Eo Technics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eo Technics Co Ltd filed Critical Eo Technics Co Ltd
Publication of SG11201610032VA publication Critical patent/SG11201610032VA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67282Marking devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • B23K26/032Observing, e.g. monitoring, the workpiece using optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/0869Devices involving movement of the laser head in at least one axial direction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/359Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • H01L21/268Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/56Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54433Marks applied to semiconductor devices or parts containing identification or tracking information
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54453Marks applied to semiconductor devices or parts for use prior to dicing
    • H01L2223/5446Located in scribe lines
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Laser Beam Processing (AREA)
SG11201610032VA 2014-06-26 2014-07-01 Marking method for wafer dice SG11201610032VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140079116A KR101563165B1 (ko) 2014-06-26 2014-06-26 웨이퍼 다이들의 마킹방법
PCT/KR2014/005871 WO2015199269A1 (fr) 2014-06-26 2014-07-01 Procédé de marquage pour dés de plaquette

Publications (1)

Publication Number Publication Date
SG11201610032VA true SG11201610032VA (en) 2016-12-29

Family

ID=54428251

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201610032VA SG11201610032VA (en) 2014-06-26 2014-07-01 Marking method for wafer dice

Country Status (6)

Country Link
US (1) US10290525B2 (fr)
KR (1) KR101563165B1 (fr)
CN (1) CN106463498B (fr)
SG (1) SG11201610032VA (fr)
TW (1) TWI569352B (fr)
WO (1) WO2015199269A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6903270B2 (ja) * 2017-06-29 2021-07-14 株式会社Nsテクノロジーズ 電子部品搬送装置および電子部品検査装置
KR102236272B1 (ko) * 2019-03-15 2021-04-05 주식회사 이오테크닉스 웨이퍼 다이의 마킹 장치 및 마킹 방법
CN114682920A (zh) * 2020-12-31 2022-07-01 大族激光科技产业集团股份有限公司 一种晶圆的激光打标方法及激光打标系统

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5910846A (en) * 1996-05-16 1999-06-08 Micron Technology, Inc. Method and apparatus for detecting the endpoint in chemical-mechanical polishing of semiconductor wafers
KR100265723B1 (ko) 1997-04-10 2000-09-15 윤종용 비젼인식을 이용한 반도체 웨이퍼 정렬방법
US6309943B1 (en) * 2000-04-25 2001-10-30 Amkor Technology, Inc. Precision marking and singulation method
US6950196B2 (en) * 2000-09-20 2005-09-27 Kla-Tencor Technologies Corp. Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen
JP2004111955A (ja) 2002-08-30 2004-04-08 Nsk Ltd アライメント調整装置
JP2004193171A (ja) 2002-12-06 2004-07-08 Nikon Corp 基準ウエハ、較正方法、位置検出方法、露光方法及びプログラム
US7315361B2 (en) 2005-04-29 2008-01-01 Gsi Group Corporation System and method for inspecting wafers in a laser marking system
CN101311705A (zh) * 2007-05-22 2008-11-26 力晶半导体股份有限公司 检视晶片缺陷的方法
JP4946668B2 (ja) 2007-07-02 2012-06-06 日本電気株式会社 基板位置検出装置及び基板位置検出方法
TWI351070B (en) 2007-07-31 2011-10-21 King Yuan Electronics Co Ltd Method for marking wafer, method for marking failed die, method for aligning wafer and wafer test equipment
CN101419177B (zh) 2007-10-25 2011-06-15 宝山钢铁股份有限公司 一种用于多台线扫描摄像机标定的方法
TW201006598A (en) * 2008-04-11 2010-02-16 Applied Materials Inc Laser scribe inspection methods and systems
US8017942B2 (en) * 2008-11-25 2011-09-13 Infineon Technologies Ag Semiconductor device and method
JP5885230B2 (ja) 2011-04-05 2016-03-15 富士機械製造株式会社 ダイ位置判定システム。
KR101350214B1 (ko) * 2012-07-06 2014-01-16 주식회사 미르기술 비접촉식 발광다이오드 검사장치와 이를 이용한 검사방법

Also Published As

Publication number Publication date
CN106463498B (zh) 2019-03-29
US10290525B2 (en) 2019-05-14
US20170162410A1 (en) 2017-06-08
WO2015199269A1 (fr) 2015-12-30
TWI569352B (zh) 2017-02-01
CN106463498A (zh) 2017-02-22
TW201603169A (zh) 2016-01-16
KR101563165B1 (ko) 2015-10-26

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