SG11201602499TA - Precision batch production method for manufacturing ferrite rods - Google Patents
Precision batch production method for manufacturing ferrite rodsInfo
- Publication number
- SG11201602499TA SG11201602499TA SG11201602499TA SG11201602499TA SG11201602499TA SG 11201602499T A SG11201602499T A SG 11201602499TA SG 11201602499T A SG11201602499T A SG 11201602499TA SG 11201602499T A SG11201602499T A SG 11201602499TA SG 11201602499T A SG11201602499T A SG 11201602499TA
- Authority
- SG
- Singapore
- Prior art keywords
- production method
- batch production
- ferrite rods
- manufacturing ferrite
- precision batch
- Prior art date
Links
- 238000010923 batch production Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 229910000859 α-Fe Inorganic materials 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/18—Phase-shifters
- H01P1/19—Phase-shifters using a ferromagnetic device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P3/00—Waveguides; Transmission lines of the waveguide type
- H01P3/12—Hollow waveguides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/041—Printed circuit coils
- H01F41/046—Printed circuit coils structurally combined with ferromagnetic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02197—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides the material having a perovskite structure, e.g. BaTiO3
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
- Chemically Coating (AREA)
- Coating By Spraying Or Casting (AREA)
- Coils Or Transformers For Communication (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13187538 | 2013-10-07 | ||
| PCT/EP2014/071079 WO2015052059A1 (en) | 2013-10-07 | 2014-10-01 | Precision batch production method for manufacturing ferrite rods |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201602499TA true SG11201602499TA (en) | 2016-04-28 |
Family
ID=49303841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201602499TA SG11201602499TA (en) | 2013-10-07 | 2014-10-01 | Precision batch production method for manufacturing ferrite rods |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9825347B2 (enExample) |
| EP (1) | EP3055871A1 (enExample) |
| JP (1) | JP6293875B2 (enExample) |
| KR (1) | KR20160067940A (enExample) |
| CN (1) | CN105814655B (enExample) |
| SG (1) | SG11201602499TA (enExample) |
| WO (1) | WO2015052059A1 (enExample) |
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| EP3920200A1 (en) | 2014-05-05 | 2021-12-08 | 3D Glass Solutions, Inc. | 2d and 3d inductors antenna and transformers fabricating photoactive substrates |
| US12165809B2 (en) | 2016-02-25 | 2024-12-10 | 3D Glass Solutions, Inc. | 3D capacitor and capacitor array fabricating photoactive substrates |
| KR20180134868A (ko) | 2016-02-25 | 2018-12-19 | 3디 글래스 솔루션즈 인코포레이티드 | 3d 커패시터 및 커패시터 어레이 제작용 광활성 기재 |
| US11161773B2 (en) | 2016-04-08 | 2021-11-02 | 3D Glass Solutions, Inc. | Methods of fabricating photosensitive substrates suitable for optical coupler |
| US9912028B2 (en) * | 2016-04-18 | 2018-03-06 | Eagantu Ltd. | Wide band radio frequency circulator |
| WO2018200804A1 (en) * | 2017-04-28 | 2018-11-01 | 3D Glass Solutions, Inc. | Rf circulator |
| JP6995891B2 (ja) | 2017-07-07 | 2022-01-17 | スリーディー グラス ソリューションズ，インク | パッケージ光活性ガラス基板内のｒｆシステムのための２ｄ及び３ｄのｒｆ集中素子デバイス |
| US10854946B2 (en) | 2017-12-15 | 2020-12-01 | 3D Glass Solutions, Inc. | Coupled transmission line resonate RF filter |
| WO2019136024A1 (en) | 2018-01-04 | 2019-07-11 | 3D Glass Solutions, Inc. | Impedance matching conductive structure for high efficiency rf circuits |
| KR102626372B1 (ko) | 2018-04-10 | 2024-01-16 | 3디 글래스 솔루션즈 인코포레이티드 | Rf 집적형 전력 조절 커패시터 |
| JP6976409B2 (ja) | 2018-05-29 | 2021-12-08 | スリーディー グラス ソリューションズ, インク3D Glass Solutions, Inc | 低挿入損失ｒｆ伝送線路 |
| CA3112608C (en) | 2018-09-17 | 2021-12-28 | 3D Glass Solutions, Inc. | High efficiency compact slotted antenna with a ground plane |
| KR102577948B1 (ko) | 2018-11-14 | 2023-09-14 | 옵티시스 인코포레이티드 | 불규칙 육각형 단면을 가지는 중공의 금속 도파관 및 이를 제조하는 방법 |
| US11996600B2 (en) | 2018-11-14 | 2024-05-28 | Optisys, Inc. | Hollow metal waveguides having irregular hexagonal cross sections with specified interior angles |
| WO2020106774A1 (en) | 2018-11-19 | 2020-05-28 | Optisys, LLC | Irregular hexagon cross-sectioned hollow metal waveguide filters |
| KR102393450B1 (ko) | 2018-12-28 | 2022-05-04 | 3디 글래스 솔루션즈 인코포레이티드 | 광활성 유리 기판들에서 ｒｆ, 마이크로파, 및 ｍｍ 파 시스템들을 위한 이종 통합 |
| CA3107812C (en) | 2018-12-28 | 2023-06-27 | 3D Glass Solutions, Inc. | Annular capacitor rf, microwave and mm wave systems |
| US11962057B2 (en) | 2019-04-05 | 2024-04-16 | 3D Glass Solutions, Inc. | Glass based empty substrate integrated waveguide devices |
| JP7188825B2 (ja) | 2019-04-18 | 2022-12-13 | スリーディー グラス ソリューションズ，インク | 高効率ダイダイシング及びリリース |
| US10727216B1 (en) | 2019-05-10 | 2020-07-28 | Sandisk Technologies Llc | Method for removing a bulk substrate from a bonded assembly of wafers |
| CN110202880B (zh) * | 2019-06-03 | 2020-05-22 | 西安交通大学 | 一种柔性微波器件及其制备方法 |
| EP4121988A4 (en) | 2020-04-17 | 2023-08-30 | 3D Glass Solutions, Inc. | BROADBAND INDUCTOR |
| US11501905B2 (en) * | 2020-08-31 | 2022-11-15 | Boston Applied Technologies, Inc. | Composition and method of making a monolithic heterostructure of multiferroic thin films |
| US12183963B2 (en) | 2020-10-19 | 2024-12-31 | Optisys, Inc. | Device comprising a transition between a waveguide port and two or more coaxial waveguides |
| WO2022094325A1 (en) | 2020-10-29 | 2022-05-05 | Optisys, Inc. | Integrated balanced radiating elements |
| CN112103602B (zh) * | 2020-11-05 | 2021-03-16 | 中国电子科技集团公司第九研究所 | 一种宽带高频法拉第隔离器 |
| CN112909458B (zh) * | 2021-02-08 | 2021-09-10 | 湖南国科雷电子科技有限公司 | 一种w波段e面波导滤波器 |
| US12119554B2 (en) | 2021-05-14 | 2024-10-15 | Optisys, Inc. | Planar monolithic combiner and multiplexer for antenna arrays |
| CN116345099A (zh) * | 2023-01-13 | 2023-06-27 | 西南应用磁学研究所(中国电子科技集团公司第九研究所) | 一种硅基腔体环行器/隔离器及其加工方法 |
| CN120824531A (zh) * | 2025-06-27 | 2025-10-21 | 河北美泰电子科技有限公司 | 一种晶圆级异质集成的mems环行器及其制备方法 |
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-
2014
- 2014-10-01 WO PCT/EP2014/071079 patent/WO2015052059A1/en not_active Ceased
- 2014-10-01 EP EP14780474.4A patent/EP3055871A1/en not_active Withdrawn
- 2014-10-01 US US15/027,286 patent/US9825347B2/en not_active Expired - Fee Related
- 2014-10-01 SG SG11201602499TA patent/SG11201602499TA/en unknown
- 2014-10-01 CN CN201480066647.2A patent/CN105814655B/zh not_active Expired - Fee Related
- 2014-10-01 JP JP2016517478A patent/JP6293875B2/ja not_active Expired - Fee Related
- 2014-10-01 KR KR1020167011943A patent/KR20160067940A/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JP6293875B2 (ja) | 2018-04-25 |
| CN105814655A (zh) | 2016-07-27 |
| JP2016535930A (ja) | 2016-11-17 |
| EP3055871A1 (en) | 2016-08-17 |
| WO2015052059A1 (en) | 2015-04-16 |
| KR20160067940A (ko) | 2016-06-14 |
| CN105814655B (zh) | 2018-08-07 |
| US9825347B2 (en) | 2017-11-21 |
| US20160254579A1 (en) | 2016-09-01 |
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