JP6293875B2 - フェライトロッドを製造するための精密バッチ製造法 - Google Patents

フェライトロッドを製造するための精密バッチ製造法 Download PDF

Info

Publication number
JP6293875B2
JP6293875B2 JP2016517478A JP2016517478A JP6293875B2 JP 6293875 B2 JP6293875 B2 JP 6293875B2 JP 2016517478 A JP2016517478 A JP 2016517478A JP 2016517478 A JP2016517478 A JP 2016517478A JP 6293875 B2 JP6293875 B2 JP 6293875B2
Authority
JP
Japan
Prior art keywords
ferrite
layer
semiconductor substrate
etching
gold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2016517478A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016535930A (ja
JP2016535930A5 (enExample
Inventor
ジョン ブレーン ミルズ
ジョン ブレーン ミルズ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips NV filed Critical Koninklijke Philips NV
Publication of JP2016535930A publication Critical patent/JP2016535930A/ja
Application granted granted Critical
Publication of JP6293875B2 publication Critical patent/JP6293875B2/ja
Publication of JP2016535930A5 publication Critical patent/JP2016535930A5/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00—Auxiliary devices
    • H01P1/18—Phase-shifters
    • H01P1/19—Phase-shifters using a ferromagnetic device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00—Waveguides; Transmission lines of the waveguide type
    • H01P3/12—Hollow waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041—Printed circuit coils
    • H01F41/046—Printed circuit coils structurally combined with ferromagnetic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/69398—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides the material having a perovskite structure, e.g. BaTiO3

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Chemically Coating (AREA)
  • Coating By Spraying Or Casting (AREA)
JP2016517478A 2013-10-07 2014-10-01 フェライトロッドを製造するための精密バッチ製造法 Expired - Fee Related JP6293875B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13187538 2013-10-07
EP13187538.7 2013-10-07
PCT/EP2014/071079 WO2015052059A1 (en) 2013-10-07 2014-10-01 Precision batch production method for manufacturing ferrite rods

Publications (3)

Publication Number Publication Date
JP2016535930A JP2016535930A (ja) 2016-11-17
JP6293875B2 true JP6293875B2 (ja) 2018-04-25
JP2016535930A5 JP2016535930A5 (enExample) 2018-05-10

Family

ID=49303841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016517478A Expired - Fee Related JP6293875B2 (ja) 2013-10-07 2014-10-01 フェライトロッドを製造するための精密バッチ製造法

Country Status (7)

Country Link
US (1) US9825347B2 (enExample)
EP (1) EP3055871A1 (enExample)
JP (1) JP6293875B2 (enExample)
KR (1) KR20160067940A (enExample)
CN (1) CN105814655B (enExample)
SG (1) SG11201602499TA (enExample)
WO (1) WO2015052059A1 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6574207B2 (ja) 2014-05-05 2019-09-11 スリーディー グラス ソリューションズ，インク３Ｄ Ｇｌａｓｓ Ｓｏｌｕｔｉｏｎｓ，Ｉｎｃ 光活性基板を製造する、２ｄ及び３ｄインダクタ、アンテナ、並びにトランス
AU2017223993B2 (en) 2016-02-25 2019-07-04 3D Glass Solutions, Inc. 3D capacitor and capacitor array fabricating photoactive substrates
US12165809B2 (en) 2016-02-25 2024-12-10 3D Glass Solutions, Inc. 3D capacitor and capacitor array fabricating photoactive substrates
WO2017177171A1 (en) 2016-04-08 2017-10-12 3D Glass Solutions, Inc. Methods of fabricating photosensitive substrates suitable for optical coupler
CN108886191A (zh) * 2016-04-18 2018-11-23 伊根图有限公司 宽频带射频环形器
US11101532B2 (en) 2017-04-28 2021-08-24 3D Glass Solutions, Inc. RF circulator
KR102418671B1 (ko) 2017-07-07 2022-07-12 3디 글래스 솔루션즈 인코포레이티드 패키지 광활성 유리 기판들에서 ｒｆ 시스템을 위한 2ｄ 및 3ｄ 집중 소자 디바이스들
KR102614826B1 (ko) 2017-12-15 2023-12-19 3디 글래스 솔루션즈 인코포레이티드 결합 전송 라인 공진 rf 필터
KR102600200B1 (ko) 2018-01-04 2023-11-10 3디 글래스 솔루션즈 인코포레이티드 고효율 ｒｆ 회로들을 위한 임피던스 정합 도전성 구조
US11076489B2 (en) 2018-04-10 2021-07-27 3D Glass Solutions, Inc. RF integrated power condition capacitor
US10903545B2 (en) 2018-05-29 2021-01-26 3D Glass Solutions, Inc. Method of making a mechanically stabilized radio frequency transmission line device
US11139582B2 (en) 2018-09-17 2021-10-05 3D Glass Solutions, Inc. High efficiency compact slotted antenna with a ground plane
US11996600B2 (en) 2018-11-14 2024-05-28 Optisys, Inc. Hollow metal waveguides having irregular hexagonal cross sections with specified interior angles
EP3881391A4 (en) 2018-11-14 2022-07-27 Optisys, LLC HOLLOW METAL WAVEGUIDES WITH IRREGULAR HEXAGONAL CROSS-SECTIONS AND METHOD OF MANUFACTURE THEREOF
US11233304B2 (en) 2018-11-19 2022-01-25 Optisys, LLC Irregular hexagon cross-sectioned hollow metal waveguide filters
KR102493538B1 (ko) 2018-12-28 2023-02-06 3디 글래스 솔루션즈 인코포레이티드 광활성 유리 기판들에서 ｒｆ, 마이크로파, 및 ｍｍ 파 시스템들을 위한 이종 통합
US11270843B2 (en) 2018-12-28 2022-03-08 3D Glass Solutions, Inc. Annular capacitor RF, microwave and MM wave systems
KR20210147040A (ko) 2019-04-05 2021-12-06 3디 글래스 솔루션즈 인코포레이티드 유리 기반의 빈 기판 집적 도파관 디바이스
KR102601781B1 (ko) 2019-04-18 2023-11-14 3디 글래스 솔루션즈 인코포레이티드 고효율 다이 다이싱 및 릴리스
US10727216B1 (en) 2019-05-10 2020-07-28 Sandisk Technologies Llc Method for removing a bulk substrate from a bonded assembly of wafers
CN110202880B (zh) * 2019-06-03 2020-05-22 西安交通大学 一种柔性微波器件及其制备方法
CA3177603C (en) 2020-04-17 2024-01-09 3D Glass Solutions, Inc. Broadband induction
US11501905B2 (en) * 2020-08-31 2022-11-15 Boston Applied Technologies, Inc. Composition and method of making a monolithic heterostructure of multiferroic thin films
WO2022087027A1 (en) 2020-10-19 2022-04-28 Optisys, LLC Broadband waveguide to dual-coaxial transition
WO2022094325A1 (en) 2020-10-29 2022-05-05 Optisys, Inc. Integrated balanced radiating elements
CN112103602B (zh) * 2020-11-05 2021-03-16 中国电子科技集团公司第九研究所 一种宽带高频法拉第隔离器
CN112909458B (zh) * 2021-02-08 2021-09-10 湖南国科雷电子科技有限公司 一种w波段e面波导滤波器
WO2022241483A2 (en) 2021-05-14 2022-11-17 Optisys, Inc. Planar monolithic combiner and multiplexer for antenna arrays
US12690457B2 (en) 2021-07-15 2026-07-21 3D Glass Solutions, Inc. Thermal transfer, management and integrated control structure
CN116345099B (zh) * 2023-01-13 2026-01-06 西南应用磁学研究所(中国电子科技集团公司第九研究所) 一种硅基腔体环行器/隔离器及其加工方法
CN120824531B (zh) * 2025-06-27 2026-02-06 河北美泰电子科技有限公司 一种晶圆级异质集成的mems环行器及其制备方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5238163A (en) * 1975-09-20 1977-03-24 Omron Tateisi Electronics Co Passive element
JPS5246787A (en) * 1975-10-11 1977-04-13 Hitachi Ltd Coil for integrated circuit and process for production of same
JPH02166801A (ja) * 1988-12-20 1990-06-27 Mitsubishi Electric Corp ファラデー旋回子用フェライト
JPH02188001A (ja) * 1989-01-17 1990-07-24 Uniden Corp 円偏波対直線偏波変換器
JPH06164222A (ja) 1992-11-25 1994-06-10 Murata Mfg Co Ltd マイクロ波用磁性体及びその製造方法
US5772820A (en) 1995-08-07 1998-06-30 Northrop Grumman Corporation Process for fabricating a microwave power device
US5828271A (en) 1997-03-06 1998-10-27 Northrop Grumman Corporation Planar ferrite toroid microwave phase shifter
US5876539A (en) 1997-06-17 1999-03-02 Northrop Grumman Corporaiton Fabrication of ferrite toroids
US6060433A (en) 1998-01-26 2000-05-09 Nz Applied Technologies Corporation Method of making a microwave device having a polycrystalline ferrite substrate
US6171886B1 (en) * 1998-06-30 2001-01-09 Eastman Kodak Company Method of making integrated hybrid silicon-based micro-actuator devices
US6249039B1 (en) * 1998-09-10 2001-06-19 Bourns, Inc. Integrated inductive components and method of fabricating such components
US6498549B1 (en) 1998-12-07 2002-12-24 Corning Applied Technologies Corporation Dual-tuning microwave devices using ferroelectric/ferrite layers
US6600601B1 (en) 1999-04-12 2003-07-29 Shin-Etsu Chemical Co., Ltd. Polarization-independent optical isolator and production method thereof
US6645677B1 (en) 2000-09-18 2003-11-11 Micronic Laser Systems Ab Dual layer reticle blank and manufacturing process
US6673181B1 (en) * 2001-10-29 2004-01-06 Northrop Grumman Corporation Method of manufacturing ferromagnetic toroids used in ferrite phase shifters
JP2003264405A (ja) * 2002-03-08 2003-09-19 Opnext Japan Inc 高周波伝送線路およびそれを用いた電子部品並びに電子装置
US6952042B2 (en) 2002-06-17 2005-10-04 Honeywell International, Inc. Microelectromechanical device with integrated conductive shield
US7078983B2 (en) 2004-06-09 2006-07-18 Raytheon Company Low-profile circulator
JP2005244084A (ja) * 2004-02-27 2005-09-08 Mitsubishi Electric Corp らせん状高周波コイルとその製造方法
EP1746430A1 (en) * 2005-07-22 2007-01-24 Liaisons Electroniques-Mecaniques Lem S.A. Orthogonal fluxgate magnetic field sensor
US7480435B2 (en) * 2005-12-30 2009-01-20 Intel Corporation Embedded waveguide printed circuit board structure
TW200905703A (en) * 2007-07-27 2009-02-01 Delta Electronics Inc Magnetic device and manufacturing method thereof
US20110123783A1 (en) 2009-11-23 2011-05-26 David Sherrer Multilayer build processses and devices thereof
JP5815353B2 (ja) * 2011-09-28 2015-11-17 株式会社フジクラ コイル配線素子およびコイル配線素子の製造方法
US9293245B2 (en) * 2013-08-05 2016-03-22 Qualcomm Mems Technologies, Inc. Integration of a coil and a discontinuous magnetic core

Also Published As

Publication number Publication date
WO2015052059A1 (en) 2015-04-16
US20160254579A1 (en) 2016-09-01
CN105814655A (zh) 2016-07-27
KR20160067940A (ko) 2016-06-14
SG11201602499TA (en) 2016-04-28
JP2016535930A (ja) 2016-11-17
US9825347B2 (en) 2017-11-21
CN105814655B (zh) 2018-08-07
EP3055871A1 (en) 2016-08-17

Similar Documents

Publication Publication Date Title
US9825347B2 (en) Precision batch production method for manufacturing ferrite rods
KR101917052B1 (ko) 열관리
US8917150B2 (en) Waveguide balun having waveguide structures disposed over a ground plane and having probes located in channels
US7834808B2 (en) Multilayer electronic component systems and methods of manufacture
Lee et al. Low-loss LTCC cavity filters using system-on-package technology at 60 GHz
TWI389451B (zh) 使用電感器-電容器諧振器之薄膜帶通濾波器
CA2039593C (en) Microwave resonator composed of oxide superconductor material
Wong et al. Substrate integrated waveguide quasi-elliptic filter using slot-coupled and microstrip-line cross-coupled structures
Shah et al. High-directivity MEMS-tunable directional couplers for 10–18-GHz broadband applications
Wang et al. Novel electrically tunable microwave solenoid inductor and compact phase shifter utilizing permaloy and PZT thin films
Chang et al. Planar air-filled terahertz antenna array based on channelized coplanar waveguide using hierarchical silicon bulk micromachining
Alkaraki et al. 10-GHz low-loss liquid metal SIW phase shifter for phased array antennas
Karmakar et al. Si-RF Technology
Jguirim et al. Design and additive microfabrication of a two-pole 287-GHz waveguide bandpass filter
Verona et al. Slow-wave distributed MEMS phase shifter in CMOS for millimeter-wave applications
Llamas-Garro et al. A planar high-$ Q $ micromachined monolithic half-coaxial transmission-line filter
Ding An Air-gapped Cavity MEMS Filter for 5G Millime-ter Wave Applications
Hyeon et al. Micromachined substrate integrated waveguides with electroplated copper vias in reflowed glass substrate for millimeter-wave applications
US20180241128A1 (en) Low-loss silicon on insulator based dielectric microstrip line
KR20020068769A (ko) 집적 3차원 솔레노이드 인덕터 및 그 제조 방법
US20050251994A1 (en) Method for manufacturing nonradiative dielectric waveguide and nonradiative dielectric waveguide
Zheng et al. WR-1.5 band waveguide bandpass dual-mode filter on silicon micromachining technique
JP2005244084A (ja) らせん状高周波コイルとその製造方法
Chen et al. Design of a novel type of narrow band BPFs using high-Q M-PhC resonators
Wang et al. Reconfigurable microwave device based on self-rolling interdigital microactuator

Legal Events

Date Code Title Description
RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20170214

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170830

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170830

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20170830

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20171101

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20171207

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180118

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180214

R150 Certificate of patent or registration of utility model

Ref document number: 6293875

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees