JP6293875B2 - フェライトロッドを製造するための精密バッチ製造法 - Google Patents

フェライトロッドを製造するための精密バッチ製造法 Download PDF

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Publication number
JP6293875B2
JP6293875B2 JP2016517478A JP2016517478A JP6293875B2 JP 6293875 B2 JP6293875 B2 JP 6293875B2 JP 2016517478 A JP2016517478 A JP 2016517478A JP 2016517478 A JP2016517478 A JP 2016517478A JP 6293875 B2 JP6293875 B2 JP 6293875B2
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Japan
Prior art keywords
ferrite
layer
semiconductor substrate
etching
gold
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Expired - Fee Related
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JP2016517478A
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Japanese (ja)
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JP2016535930A (ja
JP2016535930A5 (enExample
Inventor
ジョン ブレーン ミルズ
ジョン ブレーン ミルズ
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Koninklijke Philips NV
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Koninklijke Philips NV
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00—Auxiliary devices
    • H01P1/18—Phase-shifters
    • H01P1/19—Phase-shifters using a ferromagnetic device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00—Waveguides; Transmission lines of the waveguide type
    • H01P3/12—Hollow waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041—Printed circuit coils
    • H01F41/046—Printed circuit coils structurally combined with ferromagnetic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/69398—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides the material having a perovskite structure, e.g. BaTiO3

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Chemically Coating (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Coils Or Transformers For Communication (AREA)
JP2016517478A 2013-10-07 2014-10-01 フェライトロッドを製造するための精密バッチ製造法 Expired - Fee Related JP6293875B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13187538.7 2013-10-07
EP13187538 2013-10-07
PCT/EP2014/071079 WO2015052059A1 (en) 2013-10-07 2014-10-01 Precision batch production method for manufacturing ferrite rods

Publications (3)

Publication Number Publication Date
JP2016535930A JP2016535930A (ja) 2016-11-17
JP6293875B2 true JP6293875B2 (ja) 2018-04-25
JP2016535930A5 JP2016535930A5 (enExample) 2018-05-10

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016517478A Expired - Fee Related JP6293875B2 (ja) 2013-10-07 2014-10-01 フェライトロッドを製造するための精密バッチ製造法

Country Status (7)

Country Link
US (1) US9825347B2 (enExample)
EP (1) EP3055871A1 (enExample)
JP (1) JP6293875B2 (enExample)
KR (1) KR20160067940A (enExample)
CN (1) CN105814655B (enExample)
SG (1) SG11201602499TA (enExample)
WO (1) WO2015052059A1 (enExample)

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KR102642603B1 (ko) 2018-12-28 2024-03-05 3디 글래스 솔루션즈 인코포레이티드 광활성 유리 기판들에서 ｒｆ, 마이크로파, 및 ｍｍ 파 시스템들을 위한 이종 통합
CA3107812C (en) 2018-12-28 2023-06-27 3D Glass Solutions, Inc. Annular capacitor rf, microwave and mm wave systems
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CN110202880B (zh) * 2019-06-03 2020-05-22 西安交通大学 一种柔性微波器件及其制备方法
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CN112103602B (zh) * 2020-11-05 2021-03-16 中国电子科技集团公司第九研究所 一种宽带高频法拉第隔离器
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Also Published As

Publication number Publication date
CN105814655A (zh) 2016-07-27
JP2016535930A (ja) 2016-11-17
CN105814655B (zh) 2018-08-07
US9825347B2 (en) 2017-11-21
SG11201602499TA (en) 2016-04-28
US20160254579A1 (en) 2016-09-01
KR20160067940A (ko) 2016-06-14
EP3055871A1 (en) 2016-08-17
WO2015052059A1 (en) 2015-04-16

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