SG11201601098VA - Container for storing photomask blanks - Google Patents

Container for storing photomask blanks

Info

Publication number
SG11201601098VA
SG11201601098VA SG11201601098VA SG11201601098VA SG11201601098VA SG 11201601098V A SG11201601098V A SG 11201601098VA SG 11201601098V A SG11201601098V A SG 11201601098VA SG 11201601098V A SG11201601098V A SG 11201601098VA SG 11201601098V A SG11201601098V A SG 11201601098VA
Authority
SG
Singapore
Prior art keywords
container
photomask blanks
storing
storing photomask
blanks
Prior art date
Application number
SG11201601098VA
Other languages
English (en)
Inventor
Tsutomu Suzuki
Shinichi Ohori
Ryuji Koitabashi
Hideo Nakagawa
Takuro Takasaka
Takahiro Kinoshita
Hiroshi Fukuda
Original Assignee
Shinetsu Polymer Co
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=52665312&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG11201601098V(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shinetsu Polymer Co, Shinetsu Chemical Co filed Critical Shinetsu Polymer Co
Publication of SG11201601098VA publication Critical patent/SG11201601098VA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00—Characterised by the use of unspecified polymers
    • C08J2300/22—Thermoplastic resins

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
SG11201601098VA 2013-09-11 2014-07-24 Container for storing photomask blanks SG11201601098VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013188177 2013-09-11
PCT/JP2014/003912 WO2015037176A1 (ja) 2013-09-11 2014-07-24 フォトマスクブランクス基板収納容器

Publications (1)

Publication Number Publication Date
SG11201601098VA true SG11201601098VA (en) 2016-03-30

Family

ID=52665312

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201601098VA SG11201601098VA (en) 2013-09-11 2014-07-24 Container for storing photomask blanks

Country Status (8)

Country Link
US (1) US20160216603A1 (zh)
EP (1) EP3045973B1 (zh)
JP (1) JP5952972B2 (zh)
KR (1) KR102217579B1 (zh)
CN (1) CN105518529A (zh)
SG (1) SG11201601098VA (zh)
TW (1) TWI627495B (zh)
WO (1) WO2015037176A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017097242A (ja) * 2015-11-26 2017-06-01 アルバック成膜株式会社 ケース、フォトマスクブランクスの輸送方法
JP6723945B2 (ja) * 2016-04-07 2020-07-15 信越化学工業株式会社 フォトマスクブランクス基板収納容器、フォトマスクブランクス基板の保管方法、及びフォトマスクブランクス基板の輸送方法
KR102382330B1 (ko) 2016-04-07 2022-04-01 신에쓰 가가꾸 고교 가부시끼가이샤 포토마스크 블랭크스 기판 수납 용기, 포토마스크 블랭크스 기판의 보관 방법, 및 포토마스크 블랭크스 기판의 수송 방법
TWI730423B (zh) * 2019-09-24 2021-06-11 美商微相科技股份有限公司 光罩盒結構
TWI727713B (zh) 2020-03-23 2021-05-11 家登精密工業股份有限公司 光罩盒及其耐磨件

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5025924A (en) * 1988-11-16 1991-06-25 Toppan Printing Co., Ltd. Container
JPH08245868A (ja) * 1995-03-13 1996-09-24 Kawasaki Steel Corp 帯電防止性に優れた樹脂組成物およびその成形体
JP3283743B2 (ja) * 1996-01-11 2002-05-20 帝人株式会社 シリコンウェーハーキャリア
JP3880131B2 (ja) * 1997-05-07 2007-02-14 信越ポリマー株式会社 基板収納容器
JP3838786B2 (ja) * 1997-09-30 2006-10-25 信越ポリマー株式会社 精密基板収納容器及びその位置決め構造並びに精密基板収納容器の位置決め方法
JP4743731B2 (ja) * 2000-09-27 2011-08-10 信越ポリマー株式会社 熱可塑性樹脂組成物からなる基板収納容器
JP4470017B2 (ja) * 2001-08-28 2010-06-02 日本ゼオン株式会社 精密基板用容器
JP3910397B2 (ja) * 2001-10-12 2007-04-25 信越ポリマー株式会社 基板収納容器用ガスケット部材及びこれを用いた基板収納容器
JP3944699B2 (ja) 2001-11-06 2007-07-11 信越化学工業株式会社 基板収納容器
WO2004025721A1 (ja) * 2002-09-11 2004-03-25 Shin-Etsu Polymer Co., Ltd. 基板収納容器
US7318524B2 (en) * 2003-12-24 2008-01-15 Cryovac, Inc. Oxygen scavenging form/fill/seal package for limited lifetime optical data storage media
JP4863633B2 (ja) * 2004-03-31 2012-01-25 テクノポリマー株式会社 熱可塑性樹脂組成物及び樹脂成形体
KR101142813B1 (ko) * 2004-03-31 2012-05-08 테크노 폴리머 가부시키가이샤 열가소성 수지 조성물 및 수지 성형체
DE102004063912B4 (de) * 2004-04-22 2007-09-20 Siltronic Ag Verfahren zum versandfertigen Verpacken von Halbleiterscheiben
WO2006035894A1 (ja) * 2004-09-29 2006-04-06 Hoya Corporation 薄膜付基板の支持部材、薄膜付基板の収納容器、マスクブランク収納体、転写マスク収納体、及び薄膜付基板の輸送方法
JP2006330421A (ja) * 2005-05-27 2006-12-07 Toppan Printing Co Ltd フォトマスクケース
WO2007081876A2 (en) * 2006-01-04 2007-07-19 Liquidia Technologies, Inc. Nanostructured surfaces for biomedical/biomaterial applications and processes thereof
CN101823604B (zh) * 2006-05-29 2012-06-27 信越聚合物株式会社 基板收纳容器
JP2010072420A (ja) * 2008-09-19 2010-04-02 Toppan Printing Co Ltd フォトマスクケース
JP2011018771A (ja) * 2009-07-09 2011-01-27 Shin Etsu Polymer Co Ltd 基板収納容器
JP5871276B2 (ja) * 2010-04-22 2016-03-01 信越ポリマー株式会社 基板収納容器

Also Published As

Publication number Publication date
KR20160055140A (ko) 2016-05-17
EP3045973A1 (en) 2016-07-20
US20160216603A1 (en) 2016-07-28
TW201510639A (zh) 2015-03-16
CN105518529A (zh) 2016-04-20
JP5952972B2 (ja) 2016-07-13
TWI627495B (zh) 2018-06-21
WO2015037176A1 (ja) 2015-03-19
KR102217579B1 (ko) 2021-02-18
JPWO2015037176A1 (ja) 2017-03-02
EP3045973A4 (en) 2017-03-22
EP3045973B1 (en) 2018-04-11

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