SG11201601098VA - Container for storing photomask blanks - Google Patents

Container for storing photomask blanks

Info

Publication number
SG11201601098VA
SG11201601098VA SG11201601098VA SG11201601098VA SG11201601098VA SG 11201601098V A SG11201601098V A SG 11201601098VA SG 11201601098V A SG11201601098V A SG 11201601098VA SG 11201601098V A SG11201601098V A SG 11201601098VA SG 11201601098V A SG11201601098V A SG 11201601098VA
Authority
SG
Singapore
Prior art keywords
container
photomask blanks
storing
storing photomask
blanks
Prior art date
Application number
SG11201601098VA
Inventor
Tsutomu Suzuki
Shinichi Ohori
Ryuji Koitabashi
Hideo Nakagawa
Takuro Takasaka
Takahiro Kinoshita
Hiroshi Fukuda
Original Assignee
Shinetsu Polymer Co
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=52665312&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG11201601098V(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shinetsu Polymer Co, Shinetsu Chemical Co filed Critical Shinetsu Polymer Co
Publication of SG11201601098VA publication Critical patent/SG11201601098VA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735—Closed carriers
    • H01L21/67389—Closed carriers characterised by atmosphere control
    • H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00—Characterised by the use of unspecified polymers
    • C08J2300/22—Thermoplastic resins
SG11201601098VA 2013-09-11 2014-07-24 Container for storing photomask blanks SG11201601098VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013188177 2013-09-11
PCT/JP2014/003912 WO2015037176A1 (en) 2013-09-11 2014-07-24 Container for storing photomask blanks

Publications (1)

Publication Number Publication Date
SG11201601098VA true SG11201601098VA (en) 2016-03-30

Family

ID=52665312

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201601098VA SG11201601098VA (en) 2013-09-11 2014-07-24 Container for storing photomask blanks

Country Status (8)

Country Link
US (1) US20160216603A1 (en)
EP (1) EP3045973B1 (en)
JP (1) JP5952972B2 (en)
KR (1) KR102217579B1 (en)
CN (1) CN105518529A (en)
SG (1) SG11201601098VA (en)
TW (1) TWI627495B (en)
WO (1) WO2015037176A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017097242A (en) * 2015-11-26 2017-06-01 アルバック成膜株式会社 Case and method for transporting photomask blank
JP6723945B2 (en) * 2016-04-07 2020-07-15 信越化学工業株式会社 Photomask blanks substrate storage container, photomask blanks substrate storage method, and photomask blanks substrate transportation method
KR102382330B1 (en) * 2016-04-07 2022-04-01 신에쓰 가가꾸 고교 가부시끼가이샤 Container for storing photomask blanks substrate, keeping method of photomask blanks substrate, and conveying method of photomask blanks substrate
TWI730423B (en) * 2019-09-24 2021-06-11 美商微相科技股份有限公司 Mask box structure
TWI727713B (en) 2020-03-23 2021-05-11 家登精密工業股份有限公司 Reticle pod and wear parts thereof

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5025924A (en) * 1988-11-16 1991-06-25 Toppan Printing Co., Ltd. Container
JPH08245868A (en) * 1995-03-13 1996-09-24 Kawasaki Steel Corp Resin composition excellent in antistatic property and its molded item
JP3283743B2 (en) * 1996-01-11 2002-05-20 帝人株式会社 Silicon wafer carrier
JP3880131B2 (en) * 1997-05-07 2007-02-14 信越ポリマー株式会社 Substrate storage container
JP3838786B2 (en) * 1997-09-30 2006-10-25 信越ポリマー株式会社 Precision substrate storage container, positioning structure thereof, and positioning method of precision substrate storage container
JP4743731B2 (en) * 2000-09-27 2011-08-10 信越ポリマー株式会社 Substrate storage container made of thermoplastic resin composition
JP4470017B2 (en) * 2001-08-28 2010-06-02 日本ゼオン株式会社 Precision substrate container
JP3910397B2 (en) * 2001-10-12 2007-04-25 信越ポリマー株式会社 Gasket member for substrate storage container and substrate storage container using the same
JP3944699B2 (en) 2001-11-06 2007-07-11 信越化学工業株式会社 Substrate storage container
KR100615761B1 (en) * 2002-09-11 2006-08-28 신에츠 폴리머 가부시키가이샤 Substrate-storing container
US7318524B2 (en) * 2003-12-24 2008-01-15 Cryovac, Inc. Oxygen scavenging form/fill/seal package for limited lifetime optical data storage media
CN1946805B (en) * 2004-03-31 2010-10-06 大科能树脂有限公司 Thermoplastic resin composition and resin molded product
JP4863633B2 (en) * 2004-03-31 2012-01-25 テクノポリマー株式会社 Thermoplastic resin composition and resin molded body
DE102004063912B4 (en) * 2004-04-22 2007-09-20 Siltronic Ag Method for ready-to-ship packaging of semiconductor wafers
US20080257779A1 (en) * 2004-09-29 2008-10-23 Hoya Corporation Supporting Member For Thin-Film-Coated Boards, Storage Container For Thin-Film-Coated Boards, Mask-Blank-Storing Body, Transfer-Mask-Storing Body, and Method For Transporting Thin-Film-Coated Boards
JP2006330421A (en) * 2005-05-27 2006-12-07 Toppan Printing Co Ltd Photomask case
US8944804B2 (en) * 2006-01-04 2015-02-03 Liquidia Technologies, Inc. Nanostructured surfaces for biomedical/biomaterial applications and processes thereof
EP2022730B1 (en) * 2006-05-29 2013-08-14 Shin-Etsu Polymer Co. Ltd. Substrate container
JP2010072420A (en) * 2008-09-19 2010-04-02 Toppan Printing Co Ltd Photomask case
JP2011018771A (en) * 2009-07-09 2011-01-27 Shin Etsu Polymer Co Ltd Substrate-storing container
WO2011132553A1 (en) * 2010-04-22 2011-10-27 信越ポリマー株式会社 Substrate storage container

Also Published As

Publication number Publication date
EP3045973A4 (en) 2017-03-22
JP5952972B2 (en) 2016-07-13
US20160216603A1 (en) 2016-07-28
JPWO2015037176A1 (en) 2017-03-02
TWI627495B (en) 2018-06-21
EP3045973B1 (en) 2018-04-11
KR102217579B1 (en) 2021-02-18
KR20160055140A (en) 2016-05-17
TW201510639A (en) 2015-03-16
EP3045973A1 (en) 2016-07-20
CN105518529A (en) 2016-04-20
WO2015037176A1 (en) 2015-03-19

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