SG11201507862SA - Improved process for preparing choline hydroxide - Google Patents

Improved process for preparing choline hydroxide

Info

Publication number
SG11201507862SA
SG11201507862SA SG11201507862SA SG11201507862SA SG11201507862SA SG 11201507862S A SG11201507862S A SG 11201507862SA SG 11201507862S A SG11201507862S A SG 11201507862SA SG 11201507862S A SG11201507862S A SG 11201507862SA SG 11201507862S A SG11201507862S A SG 11201507862SA
Authority
SG
Singapore
Prior art keywords
improved process
choline hydroxide
preparing choline
preparing
hydroxide
Prior art date
Application number
SG11201507862SA
Other languages
English (en)
Inventor
Kristof Moonen
Dieter Ulrichts
Daan Scheldeman
Original Assignee
Taminco
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taminco filed Critical Taminco
Publication of SG11201507862SA publication Critical patent/SG11201507862SA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C213/00Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
    • C07C213/04Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reaction of ammonia or amines with olefin oxides or halohydrins
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C209/00Preparation of compounds containing amino groups bound to a carbon skeleton
    • C07C209/04Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups
    • C07C209/14Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of hydroxy groups or of etherified or esterified hydroxy groups
    • C07C209/16Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of hydroxy groups or of etherified or esterified hydroxy groups with formation of amino groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C211/00Compounds containing amino groups bound to a carbon skeleton
    • C07C211/01Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms
    • C07C211/02Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
    • C07C211/03Monoamines
    • C07C211/04Mono-, di- or tri-methylamine
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C213/00Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
    • C07C213/10Separation; Purification; Stabilisation; Use of additives
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C215/00Compounds containing amino and hydroxy groups bound to the same carbon skeleton
    • C07C215/02Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C215/40Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton with quaternised nitrogen atoms bound to carbon atoms of the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K23/00Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/38Cationic compounds
    • C11D1/62Quaternary ammonium compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Detergent Compositions (AREA)
SG11201507862SA 2013-04-11 2014-04-10 Improved process for preparing choline hydroxide SG11201507862SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP2013057617 2013-04-11
PCT/EP2014/057294 WO2014167065A1 (en) 2013-04-11 2014-04-10 Improved process for preparing choline hydroxide

Publications (1)

Publication Number Publication Date
SG11201507862SA true SG11201507862SA (en) 2015-10-29

Family

ID=48407437

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201507862SA SG11201507862SA (en) 2013-04-11 2014-04-10 Improved process for preparing choline hydroxide

Country Status (14)

Country Link
US (1) US9527799B2 (ko)
JP (1) JP6530372B2 (ko)
KR (1) KR102223527B1 (ko)
CN (1) CN105228979B (ko)
AR (1) AR095846A1 (ko)
AU (1) AU2014253067C1 (ko)
BR (1) BR112015025267B1 (ko)
CA (1) CA2907882C (ko)
MX (1) MX353852B (ko)
MY (1) MY182325A (ko)
RU (1) RU2678972C2 (ko)
SG (1) SG11201507862SA (ko)
WO (1) WO2014167065A1 (ko)
ZA (1) ZA201507025B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10563042B2 (en) 2016-12-14 2020-02-18 Ecolab Usa Inc. Quaternary cationic polymers
WO2019241056A1 (en) 2018-06-12 2019-12-19 Ecolab Usa Inc. Quaternary cationic surfactants and polymers for use as release and coating modifying agents in creping and tissue papers
CN109776336B (zh) * 2019-03-13 2022-05-20 湖北仙粼化工有限公司 一种二乙醇单异丙醇胺连续生产工艺
CN113214093B (zh) * 2021-05-21 2022-11-29 济南亚西亚药业有限公司 酒石酸氢胆碱废母液中回收氯化胆碱和酒石酸盐的方法
CN113548973A (zh) * 2021-07-28 2021-10-26 上海德迈世欧化工有限公司 一种电子级氢氧化胆碱溶液的制备方法
WO2023102167A1 (en) * 2021-12-03 2023-06-08 Huntsman Petrochemical Llc Production of anhydrous quaternary ammonium hydroxides

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2774759A (en) 1955-01-06 1956-12-18 American Cyanamid Co Preparation of choline base and choline salts
FR1171967A (fr) 1955-09-29 1959-02-04 Seac Soc Et Applic Chimique Procédé pour l'obtention de dérivés hyposulfites de bases organiques azotées, simples ou à fonctions multiples
DE2115094B2 (de) 1971-03-29 1981-07-23 Basf Ag, 6700 Ludwigshafen Verfahren zur kontinuierlichen Herstellung einer wäßrigen Cholinchloridlösung
US4294911A (en) 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
JPS5821825A (ja) * 1981-08-03 1983-02-08 Toshiba Corp フォトレジスト現像液及びその製造方法
US4425202A (en) 1982-08-18 1984-01-10 Thiokol Corporation Method of making and color stabilization of choline base
JPS59134752A (ja) * 1983-01-18 1984-08-02 Sanyo Chem Ind Ltd 第4級アンモニウム水酸化物の組成物
US4464461A (en) 1983-07-22 1984-08-07 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
DD241596A1 (de) 1985-10-04 1986-12-17 Chemisch Pharmazeutisches Werk Verfahren und vorrichtung zur herstellung von cholin
JPS62108848A (ja) 1985-11-06 1987-05-20 Nippon Zeon Co Ltd 水酸化2−ヒドロキシエチルトリアルキルアンモニウム水溶液の製造法
JPS62178549A (ja) 1986-01-31 1987-08-05 Nippon Zeon Co Ltd 水酸化2−ヒドロキシエチルトリメチルアンモニウム水溶液の製造方法
US4686002A (en) 1986-07-18 1987-08-11 Syntex (U.S.A.) Inc. Stabilized choline base solutions
JPH01230549A (ja) 1988-03-10 1989-09-14 Sumitomo Chem Co Ltd N,n−ジエチルメタアミノフェノールの精製方法
US5209858A (en) 1991-02-06 1993-05-11 E. I. Du Pont De Nemours And Company Stabilization of choline and its derivatives against discoloration
CN1078231A (zh) * 1992-05-02 1993-11-10 中国石油化工总公司上海石油化工总厂 氯化胆碱的制造方法
JP3478893B2 (ja) * 1995-02-10 2003-12-15 日本ヒドラジン工業株式会社 高純度コリンの製造方法
US6417112B1 (en) * 1998-07-06 2002-07-09 Ekc Technology, Inc. Post etch cleaning composition and process for dual damascene system
US6440326B1 (en) 1998-08-13 2002-08-27 Mitsubishi Gas Chemical Company, Inc. Photoresist removing composition
JP4184672B2 (ja) 2001-02-19 2008-11-19 日本乳化剤株式会社 第4級アンモニウム水酸化物含有組成物及びその製造法
JP2002357908A (ja) 2001-05-31 2002-12-13 Tokyo Ohka Kogyo Co Ltd ホトレジスト用剥離液
US7543592B2 (en) 2001-12-04 2009-06-09 Ekc Technology, Inc. Compositions and processes for photoresist stripping and residue removal in wafer level packaging
US8003587B2 (en) 2002-06-06 2011-08-23 Ekc Technology, Inc. Semiconductor process residue removal composition and process
DE10244397A1 (de) 2002-09-24 2004-04-01 Basf Ag Cholinascorbat-Formulierungen
DE10355088A1 (de) 2003-11-24 2005-06-09 Basf Ag Verfahren zur Herstellung von fremdsalzarmen Sulfinaten
EP1781594A1 (en) 2004-07-09 2007-05-09 Akzo Nobel N.V. Composition comprising choline hydroxide and process for preparing the same
JP2006298820A (ja) * 2005-04-20 2006-11-02 Mitsubishi Rayon Co Ltd トリメチルアミンの製造方法
US20080139436A1 (en) 2006-09-18 2008-06-12 Chris Reid Two step cleaning process to remove resist, etch residue, and copper oxide from substrates having copper and low-K dielectric material
EP2206140A2 (en) 2007-10-31 2010-07-14 EKC Technology, INC. Compounds for photoresist stripping
CA2855935A1 (en) 2011-11-22 2013-05-30 Taminco N.V. Stabilized choline solutions and methods for preparing the same
US20140329184A1 (en) 2011-11-22 2014-11-06 Taminco Stabilized choline solutions and methods for preparing the same
CN104066711B (zh) 2011-12-29 2017-04-19 塔明克公司 生产氢氧化胆碱的方法
EP2804477B1 (en) * 2012-01-19 2018-06-27 Dow AgroSciences LLC Process for preparing choline hydroxide from trimethylamine and ethylene oxide
CA2851406C (en) 2012-04-13 2019-12-17 Huntsman Petrochemical Llc Using novel amines to stabilize quaternary trialkylalkanolamines

Also Published As

Publication number Publication date
WO2014167065A1 (en) 2014-10-16
AU2014253067B2 (en) 2018-07-05
AU2014253067C1 (en) 2018-10-04
US9527799B2 (en) 2016-12-27
ZA201507025B (en) 2016-12-21
AU2014253067A1 (en) 2015-10-22
CA2907882C (en) 2021-01-26
CN105228979B (zh) 2018-04-27
CN105228979A (zh) 2016-01-06
CA2907882A1 (en) 2014-10-16
MY182325A (en) 2021-01-19
BR112015025267A2 (pt) 2017-07-18
KR102223527B1 (ko) 2021-03-08
AR095846A1 (es) 2015-11-18
BR112015025267B1 (pt) 2020-11-10
MX2015014218A (es) 2015-12-11
JP2016516759A (ja) 2016-06-09
KR20160004266A (ko) 2016-01-12
JP6530372B2 (ja) 2019-06-12
RU2015142671A (ru) 2017-05-16
MX353852B (es) 2018-01-30
US20160068476A1 (en) 2016-03-10
RU2678972C2 (ru) 2019-02-05

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