SG11201502043XA - Electrolytic cell equipped with microelectrodes - Google Patents

Electrolytic cell equipped with microelectrodes

Info

Publication number
SG11201502043XA
SG11201502043XA SG11201502043XA SG11201502043XA SG11201502043XA SG 11201502043X A SG11201502043X A SG 11201502043XA SG 11201502043X A SG11201502043X A SG 11201502043XA SG 11201502043X A SG11201502043X A SG 11201502043XA SG 11201502043X A SG11201502043X A SG 11201502043XA
Authority
SG
Singapore
Prior art keywords
microelectrodes
electrolytic cell
cell equipped
electrolytic
cell
Prior art date
Application number
SG11201502043XA
Other languages
English (en)
Inventor
Andrea Francesco Gullá
Original Assignee
Industrie De Nora Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industrie De Nora Spa filed Critical Industrie De Nora Spa
Publication of SG11201502043XA publication Critical patent/SG11201502043XA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/13—Ozone
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/26—Chlorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/28—Per-compounds
    • C25B1/30—Peroxides
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Inert Electrodes (AREA)
  • Secondary Cells (AREA)
  • Electrolytic Production Of Metals (AREA)
SG11201502043XA 2012-11-09 2013-11-08 Electrolytic cell equipped with microelectrodes SG11201502043XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT001909A ITMI20121909A1 (it) 2012-11-09 2012-11-09 Cella elettrolitica dotata di microelettrodi
PCT/EP2013/073356 WO2014072458A1 (en) 2012-11-09 2013-11-08 Electrolytic cell equipped with microelectrodes

Publications (1)

Publication Number Publication Date
SG11201502043XA true SG11201502043XA (en) 2015-05-28

Family

ID=47522793

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201502043XA SG11201502043XA (en) 2012-11-09 2013-11-08 Electrolytic cell equipped with microelectrodes

Country Status (19)

Country Link
US (2) US11421332B2 (ko)
EP (1) EP2917385B1 (ko)
JP (1) JP6441225B2 (ko)
KR (1) KR102161431B1 (ko)
CN (1) CN104769161B (ko)
AR (1) AR093389A1 (ko)
AU (1) AU2013343480B2 (ko)
BR (1) BR112015010179B1 (ko)
CA (1) CA2885291C (ko)
ES (1) ES2606682T3 (ko)
HK (1) HK1207891A1 (ko)
IL (1) IL237860A (ko)
IT (1) ITMI20121909A1 (ko)
MX (1) MX362479B (ko)
RU (1) RU2632901C2 (ko)
SG (1) SG11201502043XA (ko)
TW (1) TWI595117B (ko)
WO (1) WO2014072458A1 (ko)
ZA (1) ZA201502733B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110073038B (zh) 2016-12-09 2023-04-18 制造系统有限公司 用于受控电化学表面改性的装置和方法
EP3759263A4 (en) 2018-02-28 2021-11-24 Manufacturing Systems Limited CATALYSIS DEVICE AND METHOD
AU2019385031B2 (en) * 2018-11-19 2022-08-04 Asahi Kasei Kabushiki Kaisha Hydrogen production method
CN116370684A (zh) * 2023-04-11 2023-07-04 菱王电梯有限公司 消杀除味系统、载人电梯系统及其控制方法

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US5403680A (en) * 1988-08-30 1995-04-04 Osaka Gas Company, Ltd. Photolithographic and electron beam lithographic fabrication of micron and submicron three-dimensional arrays of electronically conductive polymers
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DE19506242C2 (de) * 1995-02-23 1998-05-20 Metallgesellschaft Ag Verfahren zur direkten elektrochemischen Oxidation von sulfithaltigen Lösungen, insbesondere Abwässern aus Gasreinigungsanlagen
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JP4116726B2 (ja) * 1999-02-04 2008-07-09 ペルメレック電極株式会社 電気化学的処理方法及び装置
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GB0318215D0 (en) 2003-08-04 2003-09-03 Element Six Ltd Diamond microelectrodes
JP4877641B2 (ja) * 2004-08-31 2012-02-15 住友電気工業株式会社 ダイヤモンド局所配線電極
JP3949157B2 (ja) * 2005-04-08 2007-07-25 三菱電線工業株式会社 半導体素子およびその製造方法
WO2007092331A2 (en) * 2006-02-02 2007-08-16 Esa Biosciences, Inc. Detection methods and devices
EP2002248A1 (en) * 2006-03-17 2008-12-17 Element Six Limited Microelectrode array
CA2547373A1 (en) * 2006-05-18 2007-11-18 Ozomax Inc. Miniature ozone generator with internal or external power supply for purifiying water
JP5503287B2 (ja) * 2006-09-05 2014-05-28 エレメント シックス リミテッド 固体電極
WO2008153829A1 (en) * 2007-05-29 2008-12-18 Transphorm, Inc. Electrolysis transistor
JP5207529B2 (ja) * 2008-06-30 2013-06-12 クロリンエンジニアズ株式会社 硫酸電解槽及び硫酸電解槽を用いた硫酸リサイクル型洗浄システム
KR100862923B1 (ko) 2008-07-14 2008-10-13 황부성 수소산소 혼합가스 발생시스템
US8888969B2 (en) * 2008-09-02 2014-11-18 The Governing Council Of The University Of Toronto Nanostructured microelectrodes and biosensing devices incorporating the same
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Also Published As

Publication number Publication date
US20220356589A1 (en) 2022-11-10
EP2917385B1 (en) 2016-09-07
US20150308003A1 (en) 2015-10-29
HK1207891A1 (en) 2016-02-12
CA2885291C (en) 2020-08-25
TW201418523A (zh) 2014-05-16
MX362479B (es) 2019-01-18
AU2013343480A1 (en) 2015-04-09
JP6441225B2 (ja) 2018-12-19
BR112015010179B1 (pt) 2021-06-22
CN104769161A (zh) 2015-07-08
KR20150084928A (ko) 2015-07-22
RU2632901C2 (ru) 2017-10-11
US11421332B2 (en) 2022-08-23
IL237860A (en) 2016-12-29
TWI595117B (zh) 2017-08-11
ITMI20121909A1 (it) 2014-05-10
AR093389A1 (es) 2015-06-03
WO2014072458A1 (en) 2014-05-15
JP2016502600A (ja) 2016-01-28
AU2013343480B2 (en) 2017-07-20
BR112015010179A2 (pt) 2017-07-11
EP2917385A1 (en) 2015-09-16
ZA201502733B (en) 2016-11-30
RU2015120786A (ru) 2016-12-27
ES2606682T3 (es) 2017-03-27
CN104769161B (zh) 2017-05-10
CA2885291A1 (en) 2014-05-15
KR102161431B1 (ko) 2020-10-07
MX2015005608A (es) 2015-09-04

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