HK1207891A1 - Electrolytic cell equipped with microelectrodes - Google Patents

Electrolytic cell equipped with microelectrodes

Info

Publication number
HK1207891A1
HK1207891A1 HK15108444.8A HK15108444A HK1207891A1 HK 1207891 A1 HK1207891 A1 HK 1207891A1 HK 15108444 A HK15108444 A HK 15108444A HK 1207891 A1 HK1207891 A1 HK 1207891A1
Authority
HK
Hong Kong
Prior art keywords
microelectrodes
electrolytic cell
cell equipped
electrolytic
cell
Prior art date
Application number
HK15108444.8A
Other languages
English (en)
Chinese (zh)
Inventor
‧古拉
Original Assignee
Industrie De Nora Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industrie De Nora Spa filed Critical Industrie De Nora Spa
Publication of HK1207891A1 publication Critical patent/HK1207891A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/13—Ozone
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/26—Chlorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/28—Per-compounds
    • C25B1/30—Peroxides
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Inert Electrodes (AREA)
  • Secondary Cells (AREA)
  • Electrolytic Production Of Metals (AREA)
HK15108444.8A 2012-11-09 2015-08-31 Electrolytic cell equipped with microelectrodes HK1207891A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT001909A ITMI20121909A1 (it) 2012-11-09 2012-11-09 Cella elettrolitica dotata di microelettrodi
PCT/EP2013/073356 WO2014072458A1 (en) 2012-11-09 2013-11-08 Electrolytic cell equipped with microelectrodes

Publications (1)

Publication Number Publication Date
HK1207891A1 true HK1207891A1 (en) 2016-02-12

Family

ID=47522793

Family Applications (1)

Application Number Title Priority Date Filing Date
HK15108444.8A HK1207891A1 (en) 2012-11-09 2015-08-31 Electrolytic cell equipped with microelectrodes

Country Status (19)

Country Link
US (2) US11421332B2 (ko)
EP (1) EP2917385B1 (ko)
JP (1) JP6441225B2 (ko)
KR (1) KR102161431B1 (ko)
CN (1) CN104769161B (ko)
AR (1) AR093389A1 (ko)
AU (1) AU2013343480B2 (ko)
BR (1) BR112015010179B1 (ko)
CA (1) CA2885291C (ko)
ES (1) ES2606682T3 (ko)
HK (1) HK1207891A1 (ko)
IL (1) IL237860A (ko)
IT (1) ITMI20121909A1 (ko)
MX (1) MX362479B (ko)
RU (1) RU2632901C2 (ko)
SG (1) SG11201502043XA (ko)
TW (1) TWI595117B (ko)
WO (1) WO2014072458A1 (ko)
ZA (1) ZA201502733B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3551784A4 (en) 2016-12-09 2020-12-16 Manufacturing Systems Limited APPARATUS AND METHODS FOR MODIFYING A REGULATED ELECTROCHEMICAL SURFACE
WO2019166999A1 (en) 2018-02-28 2019-09-06 Manufacturing Systems Limited Apparatus and method of catalysis
AU2019385031B2 (en) * 2018-11-19 2022-08-04 Asahi Kasei Kabushiki Kaisha Hydrogen production method
CN116370684A (zh) * 2023-04-11 2023-07-04 菱王电梯有限公司 消杀除味系统、载人电梯系统及其控制方法

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US3914164A (en) * 1972-08-23 1975-10-21 John W Clark System and process for bacterial reduction of wastes
SU1113427A1 (ru) * 1983-03-02 1984-09-15 Казахский Ордена Трудового Красного Знамени Государственный Университет Им.С.М.Кирова Способ получени триселенида натри
US5403680A (en) * 1988-08-30 1995-04-04 Osaka Gas Company, Ltd. Photolithographic and electron beam lithographic fabrication of micron and submicron three-dimensional arrays of electronically conductive polymers
KR920003216B1 (en) * 1990-03-03 1992-04-24 Samsung Electronic Apparatus for the production of ozone
DE19506242C2 (de) * 1995-02-23 1998-05-20 Metallgesellschaft Ag Verfahren zur direkten elektrochemischen Oxidation von sulfithaltigen Lösungen, insbesondere Abwässern aus Gasreinigungsanlagen
US6093302A (en) * 1998-01-05 2000-07-25 Combimatrix Corporation Electrochemical solid phase synthesis
JP4116726B2 (ja) * 1999-02-04 2008-07-09 ペルメレック電極株式会社 電気化学的処理方法及び装置
EP1630257B1 (en) * 2003-05-26 2013-11-06 Sumitomo Electric Industries, Ltd. Diamond-coated electrode and method for producing same
GB0318215D0 (en) 2003-08-04 2003-09-03 Element Six Ltd Diamond microelectrodes
JP4877641B2 (ja) 2004-08-31 2012-02-15 住友電気工業株式会社 ダイヤモンド局所配線電極
EP1868251A4 (en) * 2005-04-08 2009-05-27 Mitsubishi Chem Corp SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING THE SAME
US20070193886A1 (en) * 2006-02-02 2007-08-23 Ian Acworth Detection methods and devices
EP2002248A1 (en) * 2006-03-17 2008-12-17 Element Six Limited Microelectrode array
CA2547373A1 (en) 2006-05-18 2007-11-18 Ozomax Inc. Miniature ozone generator with internal or external power supply for purifiying water
ES2638115T3 (es) * 2006-09-05 2017-10-18 Element Six Technologies Limited Electrodo de diamante sólido
WO2008153829A1 (en) * 2007-05-29 2008-12-18 Transphorm, Inc. Electrolysis transistor
JP5207529B2 (ja) * 2008-06-30 2013-06-12 クロリンエンジニアズ株式会社 硫酸電解槽及び硫酸電解槽を用いた硫酸リサイクル型洗浄システム
KR100862923B1 (ko) 2008-07-14 2008-10-13 황부성 수소산소 혼합가스 발생시스템
ES2636664T3 (es) * 2008-09-02 2017-10-06 The Governing Council Of The University Of Toronto Microelectrodos nanoestructurados y dispositivos de biodetección que los incorporan
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Also Published As

Publication number Publication date
US20150308003A1 (en) 2015-10-29
AR093389A1 (es) 2015-06-03
EP2917385A1 (en) 2015-09-16
ES2606682T3 (es) 2017-03-27
BR112015010179B1 (pt) 2021-06-22
AU2013343480B2 (en) 2017-07-20
ZA201502733B (en) 2016-11-30
SG11201502043XA (en) 2015-05-28
US20220356589A1 (en) 2022-11-10
MX2015005608A (es) 2015-09-04
BR112015010179A2 (pt) 2017-07-11
MX362479B (es) 2019-01-18
US11421332B2 (en) 2022-08-23
JP6441225B2 (ja) 2018-12-19
JP2016502600A (ja) 2016-01-28
EP2917385B1 (en) 2016-09-07
RU2015120786A (ru) 2016-12-27
TWI595117B (zh) 2017-08-11
TW201418523A (zh) 2014-05-16
AU2013343480A1 (en) 2015-04-09
RU2632901C2 (ru) 2017-10-11
CN104769161B (zh) 2017-05-10
IL237860A (en) 2016-12-29
CN104769161A (zh) 2015-07-08
KR20150084928A (ko) 2015-07-22
WO2014072458A1 (en) 2014-05-15
ITMI20121909A1 (it) 2014-05-10
CA2885291C (en) 2020-08-25
KR102161431B1 (ko) 2020-10-07
CA2885291A1 (en) 2014-05-15

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