SG11201400767WA - Methods of continuously wet etching a patterned substrate - Google Patents

Methods of continuously wet etching a patterned substrate

Info

Publication number
SG11201400767WA
SG11201400767WA SG11201400767WA SG11201400767WA SG11201400767WA SG 11201400767W A SG11201400767W A SG 11201400767WA SG 11201400767W A SG11201400767W A SG 11201400767WA SG 11201400767W A SG11201400767W A SG 11201400767WA SG 11201400767W A SG11201400767W A SG 11201400767WA
Authority
SG
Singapore
Prior art keywords
methods
wet etching
patterned substrate
continuously wet
continuously
Prior art date
Application number
SG11201400767WA
Other languages
English (en)
Inventor
Jeffrey H Tokie
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of SG11201400767WA publication Critical patent/SG11201400767WA/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
    • C02F1/10—Treatment of water, waste water, or sewage by heating by distillation or evaporation by direct contact with a particulate solid or with a fluid, as a heat transfer medium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/30—Acidic compositions for etching other metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/46—Regeneration of etching compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/068—Apparatus for etching printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Hydrology & Water Resources (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
SG11201400767WA 2011-09-30 2012-09-19 Methods of continuously wet etching a patterned substrate SG11201400767WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161541553P 2011-09-30 2011-09-30
PCT/US2012/055997 WO2013048834A1 (en) 2011-09-30 2012-09-19 Methods of continuously wet etching a patterned substrate

Publications (1)

Publication Number Publication Date
SG11201400767WA true SG11201400767WA (en) 2014-04-28

Family

ID=46982953

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201400767WA SG11201400767WA (en) 2011-09-30 2012-09-19 Methods of continuously wet etching a patterned substrate

Country Status (8)

Country Link
US (1) US9301397B2 (zh)
EP (1) EP2761059A1 (zh)
KR (1) KR101999871B1 (zh)
CN (1) CN103842553B (zh)
BR (1) BR112014007582A2 (zh)
SG (1) SG11201400767WA (zh)
TW (1) TWI560765B (zh)
WO (1) WO2013048834A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI611490B (zh) * 2017-01-20 2018-01-11 濕式蝕刻處理系統及蝕刻速率變化之偵測方法
CN112271135B (zh) * 2020-09-25 2023-02-28 华东光电集成器件研究所 一种晶圆级Au金属膜层湿法腐蚀图形化的方法
CN113802119B (zh) * 2021-08-31 2022-08-30 煤炭科学研究总院有限公司 通用的pdms柔性传感器高精度金属微电极制备工艺

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3287191A (en) 1963-07-23 1966-11-22 Photo Engravers Res Inc Etching of printed circuit components
US3340195A (en) 1964-11-16 1967-09-05 Photo Engravers Res Inc Process of etching
US3475242A (en) 1966-12-19 1969-10-28 Fmc Corp Process and apparatus for controlling metal etching operation
US3905827A (en) * 1971-10-18 1975-09-16 Chemcut Corp Etchant rinse method
GB1400510A (en) 1972-07-26 1975-07-16 Southern California Chem Co Continuous redox process for dissolving copper
US3844857A (en) 1972-10-30 1974-10-29 Fmc Corp Automatic process of etching copper circuits with an aqueous ammoniacal solution containing a salt of a chloroxy acid
NL7414149A (nl) 1974-10-29 1976-05-04 Leuven Res & Dev Vzw Werkwijze voor het terugwinnen van zilver uit oplossingen.
DE4015141A1 (de) 1990-05-11 1991-11-14 Lpw Anlagen Gmbh Verfahren zum betreiben einer galvanotechnischen anlage
CA2041062C (en) 1991-02-14 2000-11-28 D. Gregory Beckett Demetallizing procedure
US5221421A (en) * 1992-03-25 1993-06-22 Hewlett-Packard Company Controlled etching process for forming fine-geometry circuit lines on a substrate
DE19600857A1 (de) 1996-01-12 1997-07-17 Atotech Deutschland Gmbh Verfahren zur Dosierung von Prozeßbädern
US8092707B2 (en) * 1997-04-30 2012-01-10 3M Innovative Properties Company Compositions and methods for modifying a surface suited for semiconductor fabrication
US6150279A (en) 1998-06-23 2000-11-21 Ku; Amy Reverse current gold etch
US6841084B2 (en) 2002-02-11 2005-01-11 Nikko Materials Usa, Inc. Etching solution for forming an embedded resistor
JP4098669B2 (ja) 2003-05-27 2008-06-11 日本パーカライジング株式会社 りん酸塩化成処理液の回収再利用方法
EP1834011A2 (en) * 2004-12-06 2007-09-19 Koninklijke Philips Electronics N.V. Etchant solutions and additives therefor
ATE482303T1 (de) * 2005-10-25 2010-10-15 Atotech Deutschland Gmbh Zusammensetzung und verfahren zur haftfähigkeitsverbesserung der polymerischen materialien auf kupfer- oder kupferlegierungsoberflächen
US7677198B2 (en) * 2005-11-28 2010-03-16 Industrial Technology Research Institute Method and apparatus for growing a composite metal sulphide photocatalyst thin film
US20070269750A1 (en) * 2006-05-19 2007-11-22 Eastman Kodak Company Colored masking for forming transparent structures
JP2009210972A (ja) * 2008-03-06 2009-09-17 Jsr Corp 転写フィルムおよびパターンの形成方法
JP6128847B2 (ja) 2009-06-25 2017-05-17 スリーエム イノベイティブ プロパティズ カンパニー 自己組織化単層パターン化基材の湿式エッチング方法、及び金属パターン化物品

Also Published As

Publication number Publication date
TW201320180A (zh) 2013-05-16
EP2761059A1 (en) 2014-08-06
US20140231381A1 (en) 2014-08-21
KR101999871B1 (ko) 2019-10-01
BR112014007582A2 (pt) 2017-04-11
WO2013048834A1 (en) 2013-04-04
TWI560765B (en) 2016-12-01
KR20140074364A (ko) 2014-06-17
US9301397B2 (en) 2016-03-29
CN103842553A (zh) 2014-06-04
CN103842553B (zh) 2016-04-27

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