SG10201804964TA - Target and process sensitivity analysis to requirements - Google Patents
Target and process sensitivity analysis to requirementsInfo
- Publication number
- SG10201804964TA SG10201804964TA SG10201804964TA SG10201804964TA SG10201804964TA SG 10201804964T A SG10201804964T A SG 10201804964TA SG 10201804964T A SG10201804964T A SG 10201804964TA SG 10201804964T A SG10201804964T A SG 10201804964TA SG 10201804964T A SG10201804964T A SG 10201804964TA
- Authority
- SG
- Singapore
- Prior art keywords
- target
- metrology
- parameters
- data
- module
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/20—Design optimisation, verification or simulation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Computer Hardware Design (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361914950P | 2013-12-11 | 2013-12-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201804964TA true SG10201804964TA (en) | 2018-07-30 |
Family
ID=53371817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201804964TA SG10201804964TA (en) | 2013-12-11 | 2014-12-10 | Target and process sensitivity analysis to requirements |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10726169B2 (enExample) |
| JP (1) | JP6509225B2 (enExample) |
| KR (1) | KR102265868B1 (enExample) |
| CN (1) | CN105830069B (enExample) |
| SG (1) | SG10201804964TA (enExample) |
| TW (1) | TWI661324B (enExample) |
| WO (1) | WO2015089231A1 (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101906289B1 (ko) * | 2014-02-21 | 2018-10-10 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피를 수반하는 제조 공정을 위한 공정 파라미터의 측정 |
| CN112698551B (zh) * | 2014-11-25 | 2024-04-23 | 科磊股份有限公司 | 分析及利用景观 |
| US9903711B2 (en) * | 2015-04-06 | 2018-02-27 | KLA—Tencor Corporation | Feed forward of metrology data in a metrology system |
| WO2017114662A1 (en) * | 2015-12-31 | 2017-07-06 | Asml Netherlands B.V. | Selection of measurement locations for patterning processes |
| CN112255892B (zh) * | 2016-02-22 | 2023-07-18 | Asml荷兰有限公司 | 对量测数据的贡献的分离 |
| CN109923476B (zh) * | 2016-09-01 | 2021-11-19 | Asml荷兰有限公司 | 量测目标测量选配方案的自动选择 |
| EA037650B1 (ru) * | 2016-10-18 | 2021-04-27 | Райфенхойзер Гмбх Унд Ко. Кг Машиненфабрик | Способ контроля производственного процесса, способ косвенного выведения систематической зависимости, способ адаптации качества, способ запуска производственного процесса, способ и установка для изготовления экструзионного продукта |
| US10527952B2 (en) * | 2016-10-25 | 2020-01-07 | Kla-Tencor Corporation | Fault discrimination and calibration of scatterometry overlay targets |
| JP6798263B2 (ja) * | 2016-11-14 | 2020-12-09 | 富士通株式会社 | シミュレーション支援装置、シミュレーション支援方法、およびシミュレーション支援プログラム |
| CN110249268B (zh) | 2017-02-02 | 2021-08-24 | Asml荷兰有限公司 | 量测方法和设备以及关联的计算机产品 |
| US20230214690A1 (en) * | 2017-06-12 | 2023-07-06 | Palantir Technologies Inc. | Database systems and user interfaces for processing discrete data items with statistical models associated with continuous processes |
| JP7097757B2 (ja) | 2017-06-18 | 2022-07-08 | コベンター・インコーポレーテッド | 仮想半導体デバイス製作環境におけるキーパラメータ識別、プロセスモデル較正、及び変動性解析のためのシステムと方法 |
| US10699969B2 (en) * | 2017-08-30 | 2020-06-30 | Kla-Tencor Corporation | Quick adjustment of metrology measurement parameters according to process variation |
| KR102327116B1 (ko) * | 2017-08-30 | 2021-11-16 | 케이엘에이 코포레이션 | 프로세스 변동에 따른 계측 측정 파라미터들의 신속한 조정 |
| EP3624068A1 (en) * | 2018-09-14 | 2020-03-18 | Covestro Deutschland AG | Method for improving prediction relating to the production of a polymer-ic produc |
| DE102018128254A1 (de) * | 2018-11-12 | 2020-05-14 | Endress+Hauser SE+Co. KG | Verfahren zur Verbesserung derMessperformance eines zu konfigurierenden Feldgeräts der Automatisierungstechnik |
| CN109933854B (zh) * | 2019-02-15 | 2023-07-07 | 中国北方车辆研究所 | 一种基于情境需求的移动机器人设计方法 |
| TWI831968B (zh) * | 2019-05-10 | 2024-02-11 | 美商科文特股份有限公司 | 虛擬半導體裝置製造環境中之製程窗的最佳化系統及方法 |
| DE102019207059A1 (de) * | 2019-05-15 | 2020-11-19 | Siemens Aktiengesellschaft | Verfahren zur Validierung von Systemparametern eines Energiesystems, Verfahren zum Betrieb eines Energiesystems sowie Energiemanagementsystem für ein Energiesystem |
| US11727159B2 (en) * | 2019-05-15 | 2023-08-15 | Lawrence Livermore National Security, Llc | Mission-driven design methodology for optical systems |
| US11360397B2 (en) | 2019-09-17 | 2022-06-14 | Kla Corporation | System and method for application of harmonic detectivity as a quality indicator for imaging-based overlay measurements |
| CN110991101B (zh) * | 2019-11-15 | 2022-08-02 | 湖南城市学院 | 一种压缩式压电加速度计结构优化设计方法 |
| CN111160489A (zh) * | 2020-01-02 | 2020-05-15 | 中冶赛迪重庆信息技术有限公司 | 基于大数据的多维对标分析服务器、系统、方法及电子终端 |
| US11686576B2 (en) | 2020-06-04 | 2023-06-27 | Kla Corporation | Metrology target for one-dimensional measurement of periodic misregistration |
| CN111863652B (zh) * | 2020-07-31 | 2024-05-03 | 华天科技（西安）有限公司 | 一种弹坑超敏感产品生产参数优化方法 |
| JP2023550904A (ja) | 2020-11-27 | 2023-12-06 | エーエスエムエル ネザーランズ ビー．ブイ． | メトロロジ方法並びに関連付けられたメトロロジ及びリソグラフィ装置 |
| US12530183B2 (en) | 2022-08-30 | 2026-01-20 | T-Mobile Usa, Inc. | Framework for automated productization in telecommunications networks |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06332976A (ja) * | 1993-05-25 | 1994-12-02 | Mitsubishi Electric Corp | モデルパラメータ抽出装置 |
| US6411373B1 (en) * | 1999-10-08 | 2002-06-25 | Instrumentation Metrics, Inc. | Fiber optic illumination and detection patterns, shapes, and locations for use in spectroscopic analysis |
| US6853942B2 (en) * | 2002-03-26 | 2005-02-08 | Timbre Technologies, Inc. | Metrology hardware adaptation with universal library |
| US7330279B2 (en) * | 2002-07-25 | 2008-02-12 | Timbre Technologies, Inc. | Model and parameter selection for optical metrology |
| US6834213B1 (en) * | 2003-01-06 | 2004-12-21 | Advanced Micro Devices, Inc. | Process control based upon a metrology delay |
| US7171284B2 (en) * | 2004-09-21 | 2007-01-30 | Timbre Technologies, Inc. | Optical metrology model optimization based on goals |
| US7355728B2 (en) * | 2005-06-16 | 2008-04-08 | Timbre Technologies, Inc. | Optical metrology model optimization for repetitive structures |
| US7925486B2 (en) * | 2006-03-14 | 2011-04-12 | Kla-Tencor Technologies Corp. | Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout |
| US8214771B2 (en) * | 2009-01-08 | 2012-07-03 | Kla-Tencor Corporation | Scatterometry metrology target design optimization |
| EP3779598B1 (en) * | 2011-04-06 | 2022-12-21 | Kla-Tencor Corporation | Method for providing a set of process tool correctables |
| US10255385B2 (en) * | 2012-03-28 | 2019-04-09 | Kla-Tencor Corporation | Model optimization approach based on spectral sensitivity |
| SG11201604641PA (en) * | 2013-12-30 | 2016-07-28 | Asml Netherlands Bv | Method and apparatus for design of a metrology target |
-
2014
- 2014-12-10 CN CN201480067806.0A patent/CN105830069B/zh active Active
- 2014-12-10 SG SG10201804964TA patent/SG10201804964TA/en unknown
- 2014-12-10 JP JP2016538764A patent/JP6509225B2/ja active Active
- 2014-12-10 KR KR1020167017463A patent/KR102265868B1/ko active Active
- 2014-12-10 WO PCT/US2014/069617 patent/WO2015089231A1/en not_active Ceased
- 2014-12-11 TW TW103143368A patent/TWI661324B/zh active
-
2015
- 2015-10-22 US US14/919,954 patent/US10726169B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP6509225B2 (ja) | 2019-05-08 |
| KR20160096118A (ko) | 2016-08-12 |
| US10726169B2 (en) | 2020-07-28 |
| TWI661324B (zh) | 2019-06-01 |
| CN105830069B (zh) | 2021-04-20 |
| CN105830069A (zh) | 2016-08-03 |
| TW201535137A (zh) | 2015-09-16 |
| WO2015089231A1 (en) | 2015-06-18 |
| KR102265868B1 (ko) | 2021-06-16 |
| US20160042105A1 (en) | 2016-02-11 |
| JP2017508273A (ja) | 2017-03-23 |
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