SG10201803307SA - Method of processing workpiece - Google Patents
Method of processing workpieceInfo
- Publication number
- SG10201803307SA SG10201803307SA SG10201803307SA SG10201803307SA SG10201803307SA SG 10201803307S A SG10201803307S A SG 10201803307SA SG 10201803307S A SG10201803307S A SG 10201803307SA SG 10201803307S A SG10201803307S A SG 10201803307SA SG 10201803307S A SG10201803307S A SG 10201803307SA
- Authority
- SG
- Singapore
- Prior art keywords
- cutting blade
- metal
- workpiece
- removing step
- burr removing
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000002184 metal Substances 0.000 abstract 7
- 239000007788 liquid Substances 0.000 abstract 1
- 150000007524 organic acids Chemical class 0.000 abstract 1
- 239000007800 oxidant agent Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Dicing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Milling Processes (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
METHOD OF PROCESSING WORKPIECE A method of processing a workpiece with a cutting blade, the workpiece having a body of metal disposed in superposed relation to projected dicing lines, including: a first metal burr removing step of moving the cutting blade through first cut grooves while the cutting blade is positioned at such a height that a lowermost end of the cutting blade is lower than an upper end of the body of metal; and a second metal burr removing step of moving the cutting blade through the second cut grooves while the cutting blade is positioned at such a height that the lowermost end of the cutting blade is lower than the upper end of the body of metal. A liquid containing an organic acid and an oxidizing agent is supplied to the workpiece in the first metal burr removing step and the second metal burr removing step. (Figure 3A)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017092985A JP6949421B2 (en) | 2017-05-09 | 2017-05-09 | Processing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201803307SA true SG10201803307SA (en) | 2018-12-28 |
Family
ID=63962734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201803307SA SG10201803307SA (en) | 2017-05-09 | 2018-04-19 | Method of processing workpiece |
Country Status (7)
Country | Link |
---|---|
US (1) | US10283410B2 (en) |
JP (1) | JP6949421B2 (en) |
KR (1) | KR102448221B1 (en) |
CN (1) | CN108878355B (en) |
DE (1) | DE102018207131A1 (en) |
SG (1) | SG10201803307SA (en) |
TW (1) | TWI751324B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7005281B2 (en) * | 2017-10-31 | 2022-01-21 | 株式会社ディスコ | Processing method of work piece |
CN114101784A (en) * | 2021-12-21 | 2022-03-01 | 新疆八一钢铁股份有限公司 | Elastic flat fixed-length shearing method for stepped shear blades |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4394210B2 (en) * | 1999-09-08 | 2010-01-06 | 株式会社ディスコ | Cutting method |
TWI228780B (en) * | 2000-05-11 | 2005-03-01 | Disco Corp | Semiconductor wafer dividing method |
US20030188685A1 (en) * | 2002-04-08 | 2003-10-09 | Applied Materials, Inc. | Laser drilled surfaces for substrate processing chambers |
JP4405719B2 (en) * | 2002-10-17 | 2010-01-27 | 株式会社ルネサステクノロジ | Semiconductor wafer |
JP2004288962A (en) * | 2003-03-24 | 2004-10-14 | Tokyo Seimitsu Co Ltd | Method for dicing |
JP2005039088A (en) * | 2003-07-16 | 2005-02-10 | Sanyo Electric Co Ltd | Cutting method, cutter and process for manufacturing semiconductor device |
JP4540421B2 (en) * | 2004-07-28 | 2010-09-08 | 株式会社ディスコ | Dicing method |
KR100737610B1 (en) * | 2005-04-28 | 2007-07-10 | 엘에스전선 주식회사 | A dicing die adhesive film for semi-conductor |
JP2008130929A (en) * | 2006-11-22 | 2008-06-05 | Matsushita Electric Ind Co Ltd | Semiconductor device and manufacturing method of same |
JP5133660B2 (en) * | 2007-11-27 | 2013-01-30 | 株式会社ディスコ | Breaking method of adhesive film mounted on backside of wafer |
JP5226472B2 (en) * | 2008-11-17 | 2013-07-03 | 株式会社ディスコ | Cutting method |
JP5659033B2 (en) * | 2011-02-04 | 2015-01-28 | 株式会社東芝 | Manufacturing method of semiconductor device |
JP2014007229A (en) * | 2012-06-22 | 2014-01-16 | Hitachi Chemical Co Ltd | Semiconductor device manufacturing method |
JP2015126022A (en) * | 2013-12-25 | 2015-07-06 | 株式会社ディスコ | Processing method |
JP2015123514A (en) * | 2013-12-25 | 2015-07-06 | 株式会社ディスコ | Processing method |
JP6274926B2 (en) * | 2014-03-17 | 2018-02-07 | 株式会社ディスコ | Cutting method |
US10071566B2 (en) * | 2015-04-03 | 2018-09-11 | Canon Finetech Nisca Inc. | Transfer material, recorded matter, method of manufacturing recorded matter, image-recording apparatus, and apparatus for manufacturing recorded matter |
-
2017
- 2017-05-09 JP JP2017092985A patent/JP6949421B2/en active Active
-
2018
- 2018-04-10 TW TW107112254A patent/TWI751324B/en active
- 2018-04-19 SG SG10201803307SA patent/SG10201803307SA/en unknown
- 2018-04-28 CN CN201810399315.6A patent/CN108878355B/en active Active
- 2018-05-04 US US15/971,592 patent/US10283410B2/en active Active
- 2018-05-08 DE DE102018207131.4A patent/DE102018207131A1/en active Pending
- 2018-05-08 KR KR1020180052594A patent/KR102448221B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20180123637A (en) | 2018-11-19 |
CN108878355B (en) | 2023-12-15 |
JP6949421B2 (en) | 2021-10-13 |
CN108878355A (en) | 2018-11-23 |
KR102448221B1 (en) | 2022-09-27 |
TW201901782A (en) | 2019-01-01 |
DE102018207131A1 (en) | 2018-11-15 |
TWI751324B (en) | 2022-01-01 |
JP2018190852A (en) | 2018-11-29 |
US20180330990A1 (en) | 2018-11-15 |
US10283410B2 (en) | 2019-05-07 |
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