SE8800380L - Forfarande for slipning med anvendning av ett magnetiskt fluidum och en anordning derfor - Google Patents
Forfarande for slipning med anvendning av ett magnetiskt fluidum och en anordning derforInfo
- Publication number
- SE8800380L SE8800380L SE8800380A SE8800380A SE8800380L SE 8800380 L SE8800380 L SE 8800380L SE 8800380 A SE8800380 A SE 8800380A SE 8800380 A SE8800380 A SE 8800380A SE 8800380 L SE8800380 L SE 8800380L
- Authority
- SE
- Sweden
- Prior art keywords
- abrasive grains
- grinding
- work
- magnetic fluid
- floating pad
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
- B24B31/112—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62026443A JPS63196368A (ja) | 1987-02-09 | 1987-02-09 | 磁性流体を用いる研磨方法 |
JP62287439A JPH01135466A (ja) | 1987-11-16 | 1987-11-16 | 磁性流体を用いる研磨装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
SE8800380D0 SE8800380D0 (sv) | 1988-02-05 |
SE8800380L true SE8800380L (sv) | 1988-08-10 |
SE464565B SE464565B (sv) | 1991-05-13 |
Family
ID=26364229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE8800380A SE464565B (sv) | 1987-02-09 | 1988-02-05 | Foerfarande foer slipning med anvaendning av ett magnetiskt fluidum och anordning daerfoer |
Country Status (3)
Country | Link |
---|---|
US (1) | US4821466A (sv) |
DE (1) | DE3803773A1 (sv) |
SE (1) | SE464565B (sv) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0777704B2 (ja) * | 1989-12-04 | 1995-08-23 | 松下電器産業株式会社 | 微小研磨方法 |
JP2682260B2 (ja) * | 1991-05-09 | 1997-11-26 | 松下電器産業株式会社 | 微小研磨方法及び微小研磨工具 |
US6503414B1 (en) | 1992-04-14 | 2003-01-07 | Byelocorp Scientific, Inc. | Magnetorheological polishing devices and methods |
US5449313A (en) * | 1992-04-14 | 1995-09-12 | Byelocorp Scientific, Inc. | Magnetorheological polishing devices and methods |
WO1994004313A1 (en) * | 1992-08-14 | 1994-03-03 | Byelocorp Scientific, Inc. | Magnetorheological polishing devices and methods |
KR100335219B1 (ko) * | 1993-06-04 | 2002-11-07 | 바이엘로코프 사이언티픽, 인코퍼레이티드 | 자기유동학적유체및이를이용한시편표면완성방법,장치및광택방법 |
JP3098661B2 (ja) * | 1993-07-28 | 2000-10-16 | キヤノン株式会社 | 研磨剤組成物及びそれを用いる研磨方法 |
US5795212A (en) * | 1995-10-16 | 1998-08-18 | Byelocorp Scientific, Inc. | Deterministic magnetorheological finishing |
US5575706A (en) * | 1996-01-11 | 1996-11-19 | Taiwan Semiconductor Manufacturing Company Ltd. | Chemical/mechanical planarization (CMP) apparatus and polish method |
JP3552427B2 (ja) * | 1996-11-18 | 2004-08-11 | 株式会社日立製作所 | 半導体装置の研磨方法 |
JPH10180611A (ja) * | 1996-12-24 | 1998-07-07 | Takahiro Imahashi | 複数の交番磁界生成による磁気研摩方法及び装置 |
US5807165A (en) * | 1997-03-26 | 1998-09-15 | International Business Machines Corporation | Method of electrochemical mechanical planarization |
US5775976A (en) * | 1997-03-27 | 1998-07-07 | Scientific Manufacturing Technologies, Inc. | Method and device for magnetic-abrasive machining of parts |
US5813901A (en) * | 1997-03-27 | 1998-09-29 | Scientific Manufacturing Technologies Inc | Method and device for magnetic-abrasive machining of parts |
US6228231B1 (en) | 1997-05-29 | 2001-05-08 | International Business Machines Corporation | Electroplating workpiece fixture having liquid gap spacer |
US6152805A (en) * | 1997-07-17 | 2000-11-28 | Canon Kabushiki Kaisha | Polishing machine |
US6036580A (en) * | 1997-09-03 | 2000-03-14 | Scientific Manufacturing Technologies, Inc. | Method and device for magnetic-abrasive machining of parts |
US5931718A (en) * | 1997-09-30 | 1999-08-03 | The Board Of Regents Of Oklahoma State University | Magnetic float polishing processes and materials therefor |
US5957753A (en) * | 1997-12-30 | 1999-09-28 | The Board Of Regents For Oklahoma State University | Magnetic float polishing of magnetic materials |
US6267646B1 (en) * | 1998-04-10 | 2001-07-31 | Kabushiki Kaisha Toshiba | Polishing machine |
JPH11291165A (ja) * | 1998-04-10 | 1999-10-26 | Toshiba Corp | 研磨装置及び研磨方法 |
US6071388A (en) * | 1998-05-29 | 2000-06-06 | International Business Machines Corporation | Electroplating workpiece fixture having liquid gap spacer |
US6056869A (en) * | 1998-06-04 | 2000-05-02 | International Business Machines Corporation | Wafer edge deplater for chemical mechanical polishing of substrates |
US6273787B1 (en) * | 1998-08-26 | 2001-08-14 | Extrude Hone Corp | Abrasive polishing method, apparatus and composition |
US6227942B1 (en) * | 1999-04-21 | 2001-05-08 | H-Semitran Llc | Ferrofluidic finishing |
US6146245A (en) * | 1999-05-06 | 2000-11-14 | Scientific Manufacturing Technologies, Inc. | Method of and device for machining flat parts |
US6402978B1 (en) | 1999-05-06 | 2002-06-11 | Mpm Ltd. | Magnetic polishing fluids for polishing metal substrates |
US6644929B2 (en) * | 2000-08-18 | 2003-11-11 | Flexcon Industries | Pressure regulating valve |
US20030216109A1 (en) * | 2001-11-21 | 2003-11-20 | Alfredo Riviere | Electromagnetic cleaning process and device |
US6776693B2 (en) * | 2001-12-19 | 2004-08-17 | Applied Materials Inc. | Method and apparatus for face-up substrate polishing |
JP3976581B2 (ja) * | 2002-02-14 | 2007-09-19 | Nskワーナー株式会社 | ロックアップクラッチ摩擦面の形成方法 |
DE102004014895A1 (de) * | 2004-03-23 | 2005-10-13 | Sergej Dr. Prichodko | Bearbeitungsvorrichtung |
US7094132B2 (en) * | 2004-06-24 | 2006-08-22 | Magnetic Abrasive Technologies, Inc. | Method of and apparatus for magnetic-abrasive machining of wafers |
US7252576B1 (en) * | 2006-02-21 | 2007-08-07 | The Board Of Regents For Oklahoma State University | Method and apparatus for magnetic float polishing |
CN100500378C (zh) * | 2006-12-22 | 2009-06-17 | 浙江工业大学 | 浮力磨粒球抛光方法 |
CN100486765C (zh) * | 2006-12-31 | 2009-05-13 | 广东工业大学 | 基于磁流变效应的研磨抛光方法及其抛光装置 |
US8915769B2 (en) * | 2009-02-17 | 2014-12-23 | Clino Corporation | Method of manufacturing tubular structure, and stent |
CN101850530A (zh) * | 2010-04-06 | 2010-10-06 | 重庆大学 | 微动磨损的齿轮镜面抛光系统 |
US9102030B2 (en) * | 2010-07-09 | 2015-08-11 | Corning Incorporated | Edge finishing apparatus |
CN102601722A (zh) * | 2011-01-20 | 2012-07-25 | 中芯国际集成电路制造(上海)有限公司 | 一种研磨方法和研磨装置 |
CN102284890A (zh) * | 2011-09-26 | 2011-12-21 | 厦门大学 | 面形自适应回转轴对称光学元件抛光装置 |
CN102632434B (zh) * | 2012-05-10 | 2014-07-02 | 河南科技大学 | 柱体工件磁流变抛光系统 |
CN103042438B (zh) * | 2012-12-31 | 2014-11-05 | 天津大学 | 一种恒压式超声波辅助磁流变抛光方法及装置 |
CN103111917B (zh) * | 2013-01-28 | 2015-11-18 | 嘉兴纳美精密机械有限公司 | 一种磁路通断可控的高效磁流变研抛装置 |
CN103522129B (zh) * | 2013-09-28 | 2016-04-06 | 浙江科惠医疗器械股份有限公司 | 医用钛合金微小件超声波磁流变复合抛光机 |
CN103639903B (zh) * | 2013-11-25 | 2016-09-28 | 北京理工大学 | 三向关联调整磁射流体加工装置 |
US9713865B2 (en) * | 2015-06-02 | 2017-07-25 | Apple Inc. | Electromechanical surface texturing |
CN105397611B (zh) * | 2015-11-20 | 2017-12-08 | 沈阳黎明航空发动机(集团)有限责任公司 | 一种精铣曲面自动抛光方法及装置 |
CN105729250B (zh) * | 2015-12-29 | 2018-01-30 | 广东工业大学 | 一种自修整磁流变柔性抛光砂轮及其磨抛方法 |
CN106217272B (zh) * | 2016-07-20 | 2018-01-02 | 太原理工大学 | 液体磁性磨具滑移模型及其应用 |
CN110039380B (zh) * | 2019-04-11 | 2020-12-01 | 上海理工大学 | 一种用于周期性微沟槽结构抛光的磁性复合流体抛光装置 |
CN110480423B (zh) * | 2019-08-13 | 2021-04-02 | 武汉光韵达科技有限公司 | 一种磁力抛光组件 |
CN113305650B (zh) * | 2021-06-17 | 2022-07-01 | 广东工业大学 | 一种超光滑平坦化抛光方法及装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2735232A (en) * | 1956-02-21 | simjian | ||
US2827740A (en) * | 1956-02-29 | 1958-03-25 | Luther E Lee | Polishing treatment for article surfaces |
US2883809A (en) * | 1957-11-21 | 1959-04-28 | Reflectone Corp | Polishing apparatus |
DE1577331A1 (de) * | 1966-11-24 | 1970-02-05 | Eigemeier Kg Leichtmetallgiess | Verfahren zur Oberflaechenbearbeitung von Werkstuecken |
DE2821783C2 (de) * | 1978-05-18 | 1982-04-15 | Fiziko-techničeskij institut Akademii Nauk Belorusskoj SSR, Minsk | Verfahren und Einrichtung zum Ändern des Konzentrationsgefälles von ferromagnetischem Schleif- oder Polierpulver |
US4306386A (en) * | 1978-05-31 | 1981-12-22 | Sakulevich Faddei J | Method of finishing ferromagnetic articles by ferromagnetic abrasive powders in magnetic field |
-
1988
- 1988-02-05 SE SE8800380A patent/SE464565B/sv not_active IP Right Cessation
- 1988-02-05 US US07/152,937 patent/US4821466A/en not_active Expired - Fee Related
- 1988-02-08 DE DE3803773A patent/DE3803773A1/de not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
SE464565B (sv) | 1991-05-13 |
DE3803773A1 (de) | 1988-08-18 |
SE8800380D0 (sv) | 1988-02-05 |
US4821466A (en) | 1989-04-18 |
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