SE8800380L - Forfarande for slipning med anvendning av ett magnetiskt fluidum och en anordning derfor - Google Patents

Forfarande for slipning med anvendning av ett magnetiskt fluidum och en anordning derfor

Info

Publication number
SE8800380L
SE8800380L SE8800380A SE8800380A SE8800380L SE 8800380 L SE8800380 L SE 8800380L SE 8800380 A SE8800380 A SE 8800380A SE 8800380 A SE8800380 A SE 8800380A SE 8800380 L SE8800380 L SE 8800380L
Authority
SE
Sweden
Prior art keywords
abrasive grains
grinding
work
magnetic fluid
floating pad
Prior art date
Application number
SE8800380A
Other languages
Unknown language ( )
English (en)
Other versions
SE464565B (sv
SE8800380D0 (sv
Inventor
K Kato
N Umehara
S Adachi
S Sato
Original Assignee
Koji Kato
Jgc Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62026443A external-priority patent/JPS63196368A/ja
Priority claimed from JP62287439A external-priority patent/JPH01135466A/ja
Application filed by Koji Kato, Jgc Corp filed Critical Koji Kato
Publication of SE8800380D0 publication Critical patent/SE8800380D0/sv
Publication of SE8800380L publication Critical patent/SE8800380L/sv
Publication of SE464565B publication Critical patent/SE464565B/sv

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/10Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
    • B24B31/112Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/005Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
SE8800380A 1987-02-09 1988-02-05 Foerfarande foer slipning med anvaendning av ett magnetiskt fluidum och anordning daerfoer SE464565B (sv)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62026443A JPS63196368A (ja) 1987-02-09 1987-02-09 磁性流体を用いる研磨方法
JP62287439A JPH01135466A (ja) 1987-11-16 1987-11-16 磁性流体を用いる研磨装置

Publications (3)

Publication Number Publication Date
SE8800380D0 SE8800380D0 (sv) 1988-02-05
SE8800380L true SE8800380L (sv) 1988-08-10
SE464565B SE464565B (sv) 1991-05-13

Family

ID=26364229

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8800380A SE464565B (sv) 1987-02-09 1988-02-05 Foerfarande foer slipning med anvaendning av ett magnetiskt fluidum och anordning daerfoer

Country Status (3)

Country Link
US (1) US4821466A (sv)
DE (1) DE3803773A1 (sv)
SE (1) SE464565B (sv)

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JPH0777704B2 (ja) * 1989-12-04 1995-08-23 松下電器産業株式会社 微小研磨方法
JP2682260B2 (ja) * 1991-05-09 1997-11-26 松下電器産業株式会社 微小研磨方法及び微小研磨工具
US6503414B1 (en) 1992-04-14 2003-01-07 Byelocorp Scientific, Inc. Magnetorheological polishing devices and methods
US5449313A (en) * 1992-04-14 1995-09-12 Byelocorp Scientific, Inc. Magnetorheological polishing devices and methods
WO1994004313A1 (en) * 1992-08-14 1994-03-03 Byelocorp Scientific, Inc. Magnetorheological polishing devices and methods
KR100335219B1 (ko) * 1993-06-04 2002-11-07 바이엘로코프 사이언티픽, 인코퍼레이티드 자기유동학적유체및이를이용한시편표면완성방법,장치및광택방법
JP3098661B2 (ja) * 1993-07-28 2000-10-16 キヤノン株式会社 研磨剤組成物及びそれを用いる研磨方法
US5795212A (en) * 1995-10-16 1998-08-18 Byelocorp Scientific, Inc. Deterministic magnetorheological finishing
US5575706A (en) * 1996-01-11 1996-11-19 Taiwan Semiconductor Manufacturing Company Ltd. Chemical/mechanical planarization (CMP) apparatus and polish method
JP3552427B2 (ja) * 1996-11-18 2004-08-11 株式会社日立製作所 半導体装置の研磨方法
JPH10180611A (ja) * 1996-12-24 1998-07-07 Takahiro Imahashi 複数の交番磁界生成による磁気研摩方法及び装置
US5807165A (en) * 1997-03-26 1998-09-15 International Business Machines Corporation Method of electrochemical mechanical planarization
US5775976A (en) * 1997-03-27 1998-07-07 Scientific Manufacturing Technologies, Inc. Method and device for magnetic-abrasive machining of parts
US5813901A (en) * 1997-03-27 1998-09-29 Scientific Manufacturing Technologies Inc Method and device for magnetic-abrasive machining of parts
US6228231B1 (en) 1997-05-29 2001-05-08 International Business Machines Corporation Electroplating workpiece fixture having liquid gap spacer
US6152805A (en) * 1997-07-17 2000-11-28 Canon Kabushiki Kaisha Polishing machine
US6036580A (en) * 1997-09-03 2000-03-14 Scientific Manufacturing Technologies, Inc. Method and device for magnetic-abrasive machining of parts
US5931718A (en) * 1997-09-30 1999-08-03 The Board Of Regents Of Oklahoma State University Magnetic float polishing processes and materials therefor
US5957753A (en) * 1997-12-30 1999-09-28 The Board Of Regents For Oklahoma State University Magnetic float polishing of magnetic materials
US6267646B1 (en) * 1998-04-10 2001-07-31 Kabushiki Kaisha Toshiba Polishing machine
JPH11291165A (ja) * 1998-04-10 1999-10-26 Toshiba Corp 研磨装置及び研磨方法
US6071388A (en) * 1998-05-29 2000-06-06 International Business Machines Corporation Electroplating workpiece fixture having liquid gap spacer
US6056869A (en) * 1998-06-04 2000-05-02 International Business Machines Corporation Wafer edge deplater for chemical mechanical polishing of substrates
US6273787B1 (en) * 1998-08-26 2001-08-14 Extrude Hone Corp Abrasive polishing method, apparatus and composition
US6227942B1 (en) * 1999-04-21 2001-05-08 H-Semitran Llc Ferrofluidic finishing
US6146245A (en) * 1999-05-06 2000-11-14 Scientific Manufacturing Technologies, Inc. Method of and device for machining flat parts
US6402978B1 (en) 1999-05-06 2002-06-11 Mpm Ltd. Magnetic polishing fluids for polishing metal substrates
US6644929B2 (en) * 2000-08-18 2003-11-11 Flexcon Industries Pressure regulating valve
US20030216109A1 (en) * 2001-11-21 2003-11-20 Alfredo Riviere Electromagnetic cleaning process and device
US6776693B2 (en) * 2001-12-19 2004-08-17 Applied Materials Inc. Method and apparatus for face-up substrate polishing
JP3976581B2 (ja) * 2002-02-14 2007-09-19 Nskワーナー株式会社 ロックアップクラッチ摩擦面の形成方法
DE102004014895A1 (de) * 2004-03-23 2005-10-13 Sergej Dr. Prichodko Bearbeitungsvorrichtung
US7094132B2 (en) * 2004-06-24 2006-08-22 Magnetic Abrasive Technologies, Inc. Method of and apparatus for magnetic-abrasive machining of wafers
US7252576B1 (en) * 2006-02-21 2007-08-07 The Board Of Regents For Oklahoma State University Method and apparatus for magnetic float polishing
CN100500378C (zh) * 2006-12-22 2009-06-17 浙江工业大学 浮力磨粒球抛光方法
CN100486765C (zh) * 2006-12-31 2009-05-13 广东工业大学 基于磁流变效应的研磨抛光方法及其抛光装置
US8915769B2 (en) * 2009-02-17 2014-12-23 Clino Corporation Method of manufacturing tubular structure, and stent
CN101850530A (zh) * 2010-04-06 2010-10-06 重庆大学 微动磨损的齿轮镜面抛光系统
US9102030B2 (en) * 2010-07-09 2015-08-11 Corning Incorporated Edge finishing apparatus
CN102601722A (zh) * 2011-01-20 2012-07-25 中芯国际集成电路制造(上海)有限公司 一种研磨方法和研磨装置
CN102284890A (zh) * 2011-09-26 2011-12-21 厦门大学 面形自适应回转轴对称光学元件抛光装置
CN102632434B (zh) * 2012-05-10 2014-07-02 河南科技大学 柱体工件磁流变抛光系统
CN103042438B (zh) * 2012-12-31 2014-11-05 天津大学 一种恒压式超声波辅助磁流变抛光方法及装置
CN103111917B (zh) * 2013-01-28 2015-11-18 嘉兴纳美精密机械有限公司 一种磁路通断可控的高效磁流变研抛装置
CN103522129B (zh) * 2013-09-28 2016-04-06 浙江科惠医疗器械股份有限公司 医用钛合金微小件超声波磁流变复合抛光机
CN103639903B (zh) * 2013-11-25 2016-09-28 北京理工大学 三向关联调整磁射流体加工装置
US9713865B2 (en) * 2015-06-02 2017-07-25 Apple Inc. Electromechanical surface texturing
CN105397611B (zh) * 2015-11-20 2017-12-08 沈阳黎明航空发动机(集团)有限责任公司 一种精铣曲面自动抛光方法及装置
CN105729250B (zh) * 2015-12-29 2018-01-30 广东工业大学 一种自修整磁流变柔性抛光砂轮及其磨抛方法
CN106217272B (zh) * 2016-07-20 2018-01-02 太原理工大学 液体磁性磨具滑移模型及其应用
CN110039380B (zh) * 2019-04-11 2020-12-01 上海理工大学 一种用于周期性微沟槽结构抛光的磁性复合流体抛光装置
CN110480423B (zh) * 2019-08-13 2021-04-02 武汉光韵达科技有限公司 一种磁力抛光组件
CN113305650B (zh) * 2021-06-17 2022-07-01 广东工业大学 一种超光滑平坦化抛光方法及装置

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US2735232A (en) * 1956-02-21 simjian
US2827740A (en) * 1956-02-29 1958-03-25 Luther E Lee Polishing treatment for article surfaces
US2883809A (en) * 1957-11-21 1959-04-28 Reflectone Corp Polishing apparatus
DE1577331A1 (de) * 1966-11-24 1970-02-05 Eigemeier Kg Leichtmetallgiess Verfahren zur Oberflaechenbearbeitung von Werkstuecken
DE2821783C2 (de) * 1978-05-18 1982-04-15 Fiziko-techničeskij institut Akademii Nauk Belorusskoj SSR, Minsk Verfahren und Einrichtung zum Ändern des Konzentrationsgefälles von ferromagnetischem Schleif- oder Polierpulver
US4306386A (en) * 1978-05-31 1981-12-22 Sakulevich Faddei J Method of finishing ferromagnetic articles by ferromagnetic abrasive powders in magnetic field

Also Published As

Publication number Publication date
SE464565B (sv) 1991-05-13
DE3803773A1 (de) 1988-08-18
SE8800380D0 (sv) 1988-02-05
US4821466A (en) 1989-04-18

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