SE7900083L - Halvledaranordning - Google Patents

Halvledaranordning

Info

Publication number
SE7900083L
SE7900083L SE7900083A SE7900083A SE7900083L SE 7900083 L SE7900083 L SE 7900083L SE 7900083 A SE7900083 A SE 7900083A SE 7900083 A SE7900083 A SE 7900083A SE 7900083 L SE7900083 L SE 7900083L
Authority
SE
Sweden
Prior art keywords
semiconductor device
semiconductor
Prior art date
Application number
SE7900083A
Other languages
English (en)
Inventor
Jr H C Casey
A Y Cho
E H Nicollian
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of SE7900083L publication Critical patent/SE7900083L/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/432—Heterojunction gate for field effect devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/207—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds further characterised by the doping material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/47—Schottky barrier electrodes
    • H01L29/475—Schottky barrier electrodes on AIII-BV compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/495—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo
    • H01L29/4958—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo with a multiple layer structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/802—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with heterojunction gate, e.g. transistors with semiconductor layer acting as gate insulating layer, MIS-like transistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/914—Doping
    • Y10S438/917—Deep level dopants, e.g. gold, chromium, iron or nickel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thin Film Transistor (AREA)
SE7900083A 1978-01-13 1979-01-04 Halvledaranordning SE7900083L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/869,369 US4160261A (en) 1978-01-13 1978-01-13 Mis heterojunction structures

Publications (1)

Publication Number Publication Date
SE7900083L true SE7900083L (sv) 1979-07-14

Family

ID=25353428

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7900083A SE7900083L (sv) 1978-01-13 1979-01-04 Halvledaranordning

Country Status (10)

Country Link
US (1) US4160261A (sv)
JP (1) JPS54129886A (sv)
BE (1) BE873428A (sv)
CA (1) CA1125922A (sv)
DE (1) DE2901094A1 (sv)
FR (1) FR2414796A1 (sv)
GB (1) GB2013028B (sv)
IT (1) IT1111954B (sv)
NL (1) NL7900274A (sv)
SE (1) SE7900083L (sv)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4291327A (en) * 1978-08-28 1981-09-22 Bell Telephone Laboratories, Incorporated MOS Devices
US4297783A (en) * 1979-01-30 1981-11-03 Bell Telephone Laboratories, Incorporated Method of fabricating GaAs devices utilizing a semi-insulating layer of AlGaAs in combination with an overlying masking layer
US4231050A (en) * 1979-01-30 1980-10-28 Bell Telephone Laboratories, Incorporated Reduction of surface recombination current in GaAs devices
FR2465317A2 (fr) * 1979-03-28 1981-03-20 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
FR2469002A1 (fr) * 1979-10-26 1981-05-08 Thomson Csf Dispositif semiconducteur a effet de champ pour hautes frequences et transistor et dispositif a transfert de charges utilisant un tel semiconducteur
FR2489045A1 (fr) * 1980-08-20 1982-02-26 Thomson Csf Transistor a effet de champ gaas a memoire non volatile
FR2492167A1 (fr) * 1980-10-14 1982-04-16 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
GB2089119A (en) * 1980-12-10 1982-06-16 Philips Electronic Associated High voltage semiconductor devices
FR2497603A1 (fr) * 1981-01-06 1982-07-09 Thomson Csf Transistor a faible temps de commutation, de type normalement bloquant
US4605912A (en) * 1981-12-03 1986-08-12 General Electric Company Continuously variable phase shifting element comprised of interdigitated electrode MESFET
US4468851A (en) * 1981-12-14 1984-09-04 The United States Of America As Represented By The Secretary Of The Navy Process for making a heterojunction source-drain insulated gate field-effect transistors utilizing diffusion to form the lattice
US4482906A (en) * 1982-06-30 1984-11-13 International Business Machines Corporation Gallium aluminum arsenide integrated circuit structure using germanium
US4532695A (en) * 1982-07-02 1985-08-06 The United States Of America As Represented By The Secretary Of The Air Force Method of making self-aligned IGFET
US4672423A (en) * 1982-09-30 1987-06-09 International Business Machines Corporation Voltage controlled resonant transmission semiconductor device
GB2133928B (en) * 1982-12-04 1986-07-30 Plessey Co Plc Coatings for semiconductor devices
JPS59127839A (ja) * 1983-01-11 1984-07-23 Nec Corp ３―５族化合物半導体表面の不活性化法
US4578126A (en) * 1983-06-22 1986-03-25 Trw Inc. Liquid phase epitaxial growth process
US4568958A (en) * 1984-01-03 1986-02-04 General Electric Company Inversion-mode insulated-gate gallium arsenide field-effect transistors
GB2163002B (en) * 1984-08-08 1989-01-05 Japan Res Dev Corp Tunnel injection static induction transistor and its integrated circuit
JPS61100968A (ja) * 1984-10-22 1986-05-19 Seiko Epson Corp 電界効果型トランジスタ
JPS63144580A (ja) * 1986-12-09 1988-06-16 Nec Corp 電界効果トランジスタ
KR880010509A (ko) * 1987-02-11 1988-10-10 오레그 이. 앨버 전계효과 트랜지스터
US5196907A (en) * 1990-08-20 1993-03-23 Siemens Aktiengesellschaft Metal insulator semiconductor field effect transistor
EP0526646B1 (en) * 1991-02-19 1997-04-23 Fujitsu Limited Semiconductor device having an isolation region enriched in oxygen and a fabrication process thereof
JP2616287B2 (ja) * 1991-07-08 1997-06-04 株式会社村田製作所 半導体装置
GB9116341D0 (en) * 1991-07-29 1991-09-11 Hitachi Europ Ltd Lt-gaas semiconductor device
DE69202554T2 (de) * 1991-12-25 1995-10-19 Nippon Electric Co Tunneltransistor und dessen Herstellungsverfahren.
TW319916B (sv) * 1995-06-05 1997-11-11 Hewlett Packard Co

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4062035A (en) * 1975-02-05 1977-12-06 Siemens Aktiengesellschaft Luminescent diode

Also Published As

Publication number Publication date
IT7919260A0 (it) 1979-01-12
JPS54129886A (en) 1979-10-08
IT1111954B (it) 1986-01-13
DE2901094A1 (de) 1979-07-19
US4160261A (en) 1979-07-03
FR2414796A1 (fr) 1979-08-10
BE873428A (fr) 1979-05-02
NL7900274A (nl) 1979-07-17
CA1125922A (en) 1982-06-15
GB2013028A (en) 1979-08-01
GB2013028B (en) 1982-03-03

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