SE7412194L - - Google Patents
Info
- Publication number
- SE7412194L SE7412194L SE7412194A SE7412194A SE7412194L SE 7412194 L SE7412194 L SE 7412194L SE 7412194 A SE7412194 A SE 7412194A SE 7412194 A SE7412194 A SE 7412194A SE 7412194 L SE7412194 L SE 7412194L
- Authority
- SE
- Sweden
- Prior art keywords
- tetrazolium
- cathodic
- etch
- deposits
- sites
- Prior art date
Links
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 229910052809 inorganic oxide Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- VMGAPWLDMVPYIA-HIDZBRGKSA-N n'-amino-n-iminomethanimidamide Chemical compound N\N=C\N=N VMGAPWLDMVPYIA-HIDZBRGKSA-N 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 239000007800 oxidant agent Substances 0.000 abstract 1
- BOLDJAUMGUJJKM-LSDHHAIUSA-N renifolin D Natural products CC(=C)[C@@H]1Cc2c(O)c(O)ccc2[C@H]1CC(=O)c3ccc(O)cc3O BOLDJAUMGUJJKM-LSDHHAIUSA-N 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- -1 tetrazolium cations Chemical class 0.000 abstract 1
- 125000003831 tetrazolyl group Chemical group 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/04—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in markedly acid liquids
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Silicon Compounds (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US405564A US3860464A (en) | 1973-10-11 | 1973-10-11 | Oxide etchant |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| SE7412194L true SE7412194L (fr) | 1975-04-14 |
| SE401526B SE401526B (sv) | 1978-05-16 |
Family
ID=23604211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE7412194A SE401526B (sv) | 1973-10-11 | 1974-09-27 | Forfarande for selektiv etsning |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US3860464A (fr) |
| JP (1) | JPS528676B2 (fr) |
| BE (1) | BE820808A (fr) |
| CA (1) | CA1035258A (fr) |
| DE (1) | DE2447670C3 (fr) |
| FR (1) | FR2247280B1 (fr) |
| GB (1) | GB1474294A (fr) |
| IT (1) | IT1020975B (fr) |
| NL (1) | NL162124C (fr) |
| SE (1) | SE401526B (fr) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3992235A (en) * | 1975-05-21 | 1976-11-16 | Bell Telephone Laboratories, Incorporated | Etching of thin layers of reactive metals |
| JP2581268B2 (ja) * | 1990-05-22 | 1997-02-12 | 日本電気株式会社 | 半導体基板の処理方法 |
| US5695661A (en) | 1995-06-07 | 1997-12-09 | Micron Display Technology, Inc. | Silicon dioxide etch process which protects metal |
| KR0175009B1 (ko) * | 1995-07-28 | 1999-04-01 | 김광호 | 식각용액 및 이를 이용한 반도체 장치의 식각방법 |
| KR100234541B1 (ko) * | 1997-03-07 | 1999-12-15 | 윤종용 | 반도체장치 제조용 웨이퍼의 세정을 위한 세정조성물 및 그를 이용한 세정방법 |
| US5838055A (en) * | 1997-05-29 | 1998-11-17 | International Business Machines Corporation | Trench sidewall patterned by vapor phase etching |
| US6074951A (en) * | 1997-05-29 | 2000-06-13 | International Business Machines Corporation | Vapor phase etching of oxide masked by resist or masking material |
| US5876879A (en) * | 1997-05-29 | 1999-03-02 | International Business Machines Corporation | Oxide layer patterned by vapor phase etching |
| US6117796A (en) * | 1998-08-13 | 2000-09-12 | International Business Machines Corporation | Removal of silicon oxide |
| US6585933B1 (en) | 1999-05-03 | 2003-07-01 | Betzdearborn, Inc. | Method and composition for inhibiting corrosion in aqueous systems |
| US6187262B1 (en) | 1998-08-19 | 2001-02-13 | Betzdearborn Inc. | Inhibition of corrosion in aqueous systems |
| US6379587B1 (en) | 1999-05-03 | 2002-04-30 | Betzdearborn Inc. | Inhibition of corrosion in aqueous systems |
| CN103980216A (zh) * | 2014-06-05 | 2014-08-13 | 湖北百诺捷生物科技有限公司 | 一种氯化-2,3,5-三苯基四氮唑的合成方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3421985A (en) * | 1965-10-19 | 1969-01-14 | Sylvania Electric Prod | Method of producing semiconductor devices having connecting leads attached thereto |
| US3560280A (en) * | 1965-11-17 | 1971-02-02 | Hitachi Ltd | Method of selective removal of oxide coatings in the manufacture of semiconductor devices |
-
1973
- 1973-10-11 US US405564A patent/US3860464A/en not_active Expired - Lifetime
-
1974
- 1974-07-17 CA CA204,953A patent/CA1035258A/fr not_active Expired
- 1974-09-27 SE SE7412194A patent/SE401526B/xx not_active IP Right Cessation
- 1974-10-05 DE DE2447670A patent/DE2447670C3/de not_active Expired
- 1974-10-07 FR FR747433660A patent/FR2247280B1/fr not_active Expired
- 1974-10-08 BE BE149303A patent/BE820808A/fr unknown
- 1974-10-10 IT IT70032/74A patent/IT1020975B/it active
- 1974-10-10 NL NL7413345.A patent/NL162124C/xx not_active IP Right Cessation
- 1974-10-11 GB GB4406774A patent/GB1474294A/en not_active Expired
- 1974-10-11 JP JP49116999A patent/JPS528676B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL162124C (nl) | 1980-04-15 |
| NL7413345A (nl) | 1975-04-15 |
| NL162124B (nl) | 1979-11-15 |
| FR2247280A1 (fr) | 1975-05-09 |
| IT1020975B (it) | 1977-12-30 |
| GB1474294A (en) | 1977-05-18 |
| FR2247280B1 (fr) | 1979-02-09 |
| DE2447670C3 (de) | 1978-06-08 |
| JPS528676B2 (fr) | 1977-03-10 |
| CA1035258A (fr) | 1978-07-25 |
| SE401526B (sv) | 1978-05-16 |
| DE2447670A1 (de) | 1975-04-24 |
| BE820808A (fr) | 1975-02-03 |
| DE2447670B2 (de) | 1977-09-22 |
| JPS5067581A (fr) | 1975-06-06 |
| US3860464A (en) | 1975-01-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NUG | Patent has lapsed |
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