SE0001409L - Mönster genererings system användande en spatialljusmodulator - Google Patents

Mönster genererings system användande en spatialljusmodulator

Info

Publication number
SE0001409L
SE0001409L SE0001409A SE0001409A SE0001409L SE 0001409 L SE0001409 L SE 0001409L SE 0001409 A SE0001409 A SE 0001409A SE 0001409 A SE0001409 A SE 0001409A SE 0001409 L SE0001409 L SE 0001409L
Authority
SE
Sweden
Prior art keywords
pulse
output
energy
individual
spatial light
Prior art date
Application number
SE0001409A
Other languages
English (en)
Other versions
SE517550C2 (sv
SE0001409D0 (sv
Inventor
Torbjoern Sandstroem
Anna-Karin Holmer
Ulric Ljungblad
Dag Hanstorp
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE0001409A priority Critical patent/SE517550C2/sv
Publication of SE0001409D0 publication Critical patent/SE0001409D0/sv
Priority to AU2001248952A priority patent/AU2001248952A1/en
Priority to EP01922177A priority patent/EP1275033A1/en
Priority to JP2001576541A priority patent/JP2004501384A/ja
Priority to US10/130,070 priority patent/US6700095B2/en
Priority to KR1020027007382A priority patent/KR100798535B1/ko
Priority to CNB018032133A priority patent/CN100340923C/zh
Priority to PCT/SE2001/000793 priority patent/WO2001079935A1/en
Publication of SE0001409L publication Critical patent/SE0001409L/sv
Publication of SE517550C2 publication Critical patent/SE517550C2/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SE0001409A 2000-04-17 2000-04-17 Mönstergenereringssystem användande en spatialljusmodulator SE517550C2 (sv)

Priority Applications (8)

Application Number Priority Date Filing Date Title
SE0001409A SE517550C2 (sv) 2000-04-17 2000-04-17 Mönstergenereringssystem användande en spatialljusmodulator
AU2001248952A AU2001248952A1 (en) 2000-04-17 2001-04-10 Pattern generation system using a spatial light modulator
EP01922177A EP1275033A1 (en) 2000-04-17 2001-04-10 Pattern generation system using a spatial light modulator
JP2001576541A JP2004501384A (ja) 2000-04-17 2001-04-10 空間光変調器を利用したパターン形成システム
US10/130,070 US6700095B2 (en) 2000-04-17 2001-04-10 Pattern generation system using a spatial light modulator
KR1020027007382A KR100798535B1 (ko) 2000-04-17 2001-04-10 공간 광 변조기를 사용하는 패턴 생성 시스템
CNB018032133A CN100340923C (zh) 2000-04-17 2001-04-10 使用空间光调制器的图形产生系统
PCT/SE2001/000793 WO2001079935A1 (en) 2000-04-17 2001-04-10 Pattern generation system using a spatial light modulator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0001409A SE517550C2 (sv) 2000-04-17 2000-04-17 Mönstergenereringssystem användande en spatialljusmodulator

Publications (3)

Publication Number Publication Date
SE0001409D0 SE0001409D0 (sv) 2000-04-17
SE0001409L true SE0001409L (sv) 2001-10-18
SE517550C2 SE517550C2 (sv) 2002-06-18

Family

ID=20279339

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0001409A SE517550C2 (sv) 2000-04-17 2000-04-17 Mönstergenereringssystem användande en spatialljusmodulator

Country Status (8)

Country Link
US (1) US6700095B2 (sv)
EP (1) EP1275033A1 (sv)
JP (1) JP2004501384A (sv)
KR (1) KR100798535B1 (sv)
CN (1) CN100340923C (sv)
AU (1) AU2001248952A1 (sv)
SE (1) SE517550C2 (sv)
WO (1) WO2001079935A1 (sv)

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Also Published As

Publication number Publication date
WO2001079935A1 (en) 2001-10-25
SE517550C2 (sv) 2002-06-18
US6700095B2 (en) 2004-03-02
EP1275033A1 (en) 2003-01-15
CN100340923C (zh) 2007-10-03
US20020153362A1 (en) 2002-10-24
JP2004501384A (ja) 2004-01-15
AU2001248952A1 (en) 2001-10-30
CN1394297A (zh) 2003-01-29
SE0001409D0 (sv) 2000-04-17
KR100798535B1 (ko) 2008-01-28
KR20030023605A (ko) 2003-03-19

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