SE0001409D0 - Pattern generation system using an spatial light modulator - Google Patents
Pattern generation system using an spatial light modulatorInfo
- Publication number
- SE0001409D0 SE0001409D0 SE0001409A SE0001409A SE0001409D0 SE 0001409 D0 SE0001409 D0 SE 0001409D0 SE 0001409 A SE0001409 A SE 0001409A SE 0001409 A SE0001409 A SE 0001409A SE 0001409 D0 SE0001409 D0 SE 0001409D0
- Authority
- SE
- Sweden
- Prior art keywords
- pulse
- output
- energy
- individual
- spatial light
- Prior art date
Links
- 230000000903 blocking effect Effects 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0001409A SE517550C2 (sv) | 2000-04-17 | 2000-04-17 | Mönstergenereringssystem användande en spatialljusmodulator |
PCT/SE2001/000793 WO2001079935A1 (en) | 2000-04-17 | 2001-04-10 | Pattern generation system using a spatial light modulator |
KR1020027007382A KR100798535B1 (ko) | 2000-04-17 | 2001-04-10 | 공간 광 변조기를 사용하는 패턴 생성 시스템 |
AU2001248952A AU2001248952A1 (en) | 2000-04-17 | 2001-04-10 | Pattern generation system using a spatial light modulator |
CNB018032133A CN100340923C (zh) | 2000-04-17 | 2001-04-10 | 使用空间光调制器的图形产生系统 |
JP2001576541A JP2004501384A (ja) | 2000-04-17 | 2001-04-10 | 空間光変調器を利用したパターン形成システム |
EP01922177A EP1275033A1 (en) | 2000-04-17 | 2001-04-10 | Pattern generation system using a spatial light modulator |
US10/130,070 US6700095B2 (en) | 2000-04-17 | 2001-04-10 | Pattern generation system using a spatial light modulator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0001409A SE517550C2 (sv) | 2000-04-17 | 2000-04-17 | Mönstergenereringssystem användande en spatialljusmodulator |
Publications (3)
Publication Number | Publication Date |
---|---|
SE0001409D0 true SE0001409D0 (sv) | 2000-04-17 |
SE0001409L SE0001409L (sv) | 2001-10-18 |
SE517550C2 SE517550C2 (sv) | 2002-06-18 |
Family
ID=20279339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0001409A SE517550C2 (sv) | 2000-04-17 | 2000-04-17 | Mönstergenereringssystem användande en spatialljusmodulator |
Country Status (8)
Country | Link |
---|---|
US (1) | US6700095B2 (sv) |
EP (1) | EP1275033A1 (sv) |
JP (1) | JP2004501384A (sv) |
KR (1) | KR100798535B1 (sv) |
CN (1) | CN100340923C (sv) |
AU (1) | AU2001248952A1 (sv) |
SE (1) | SE517550C2 (sv) |
WO (1) | WO2001079935A1 (sv) |
Families Citing this family (52)
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SE9800665D0 (sv) | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
US7330886B2 (en) | 1999-10-27 | 2008-02-12 | American Power Conversion Corporation | Network appliance management |
US7568445B2 (en) | 2000-11-17 | 2009-08-04 | Lockheed Martin Corporation | System and method for the holographic deposition of material |
US8271626B2 (en) | 2001-01-26 | 2012-09-18 | American Power Conversion Corporation | Methods for displaying physical network topology and environmental status by location, organization, or responsible party |
DE10219805B4 (de) * | 2002-04-30 | 2013-03-14 | Xtreme Technologies Gmbh | Verfahren zur Stabilisierung der Strahlungsleistung einer gepuist betriebenen, auf gasentladungserzeugtem Plasma basierenden Strahlungsquelle |
DE60330659D1 (de) | 2002-05-03 | 2010-02-04 | American Power Conv Corp | Verfahren und vorrichtung zum sammeln und anzeigen von netzwerkgeräteinformationen |
GB0213809D0 (en) * | 2002-06-15 | 2002-07-24 | Brocklehurst John R | Dynamic shaping of laser beams |
EP1550004A2 (de) * | 2002-09-30 | 2005-07-06 | Carl Zeiss SMT AG | Beleuchtungssystem mit einer vorrichtung zur einstellung der lichtintensit t |
US7148796B2 (en) | 2003-04-14 | 2006-12-12 | American Power Conversion Corporation | Environmental monitoring device |
EP1489449A1 (en) * | 2003-06-20 | 2004-12-22 | ASML Netherlands B.V. | Spatial light modulator |
US7154587B2 (en) * | 2003-06-30 | 2006-12-26 | Asml Netherlands B.V | Spatial light modulator, lithographic apparatus and device manufacturing method |
EP1664930A2 (en) * | 2003-08-22 | 2006-06-07 | Plex LLC | Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator |
DE10339472A1 (de) * | 2003-08-27 | 2005-03-24 | Ralph Schmid | Verfahren und Vorrichtung zur Laserbeschriftung |
KR101136674B1 (ko) * | 2003-10-16 | 2012-04-18 | 톰슨 라이센싱 | 픽셀 시프트 색 투사 시스템 |
US7627651B2 (en) | 2003-10-27 | 2009-12-01 | American Power Conversion Corporation | System and method for network device communication |
WO2005047955A1 (en) * | 2003-11-12 | 2005-05-26 | Micronic Laser Systems Ab | Method and device for correcting slm stamp image imperfections |
US7670377B2 (en) * | 2003-11-21 | 2010-03-02 | Kyphon Sarl | Laterally insertable artifical vertebral disk replacement implant with curved spacer |
US7161728B2 (en) * | 2003-12-09 | 2007-01-09 | Idc, Llc | Area array modulation and lead reduction in interferometric modulators |
WO2005109023A2 (en) * | 2004-02-04 | 2005-11-17 | E.I. Dupont De Nemours And Company | Nqr rf coil assembly comprising two or more coils which may be made from hts |
DE102004011733A1 (de) * | 2004-03-04 | 2005-09-22 | Carl Zeiss Smt Ag | Transmissionsfiltervorrichtung |
ATE554426T1 (de) | 2004-05-05 | 2012-05-15 | Sign Tronic Ag | Verfahren zur ermöglichung der übertragung von im wesentlichen gleichen energiemengen |
GB2414881A (en) * | 2004-06-01 | 2005-12-07 | Imp College Innovations Ltd | Imaging system capable of reproducing a wide range of intensities |
US7804043B2 (en) * | 2004-06-15 | 2010-09-28 | Laserfacturing Inc. | Method and apparatus for dicing of thin and ultra thin semiconductor wafer using ultrafast pulse laser |
US7432517B2 (en) * | 2004-11-19 | 2008-10-07 | Asml Netherlands B.V. | Pulse modifier, lithographic apparatus, and device manufacturing method |
US7171637B2 (en) * | 2005-01-14 | 2007-01-30 | Intel Corporation | Translation generation for a mask pattern |
JP2006278960A (ja) * | 2005-03-30 | 2006-10-12 | Canon Inc | 露光装置 |
US7480891B2 (en) * | 2005-04-29 | 2009-01-20 | Cadence Design Systems, Inc. | Method and apparatus of model-based photomask synthesis |
US7743358B2 (en) * | 2005-04-29 | 2010-06-22 | Cadence Design Systems, Inc. | Apparatus and method for segmenting edges for optical proximity correction |
US7506300B2 (en) * | 2005-04-29 | 2009-03-17 | Cadence Design Systems, Inc. | Apparatus and method for breaking up and merging polygons |
US7519940B2 (en) * | 2005-05-02 | 2009-04-14 | Cadence Design Systems, Inc. | Apparatus and method for compensating a lithography projection tool |
US7743359B2 (en) * | 2005-05-02 | 2010-06-22 | Cadence Design Systems, Inc. | Apparatus and method for photomask design |
JP2006319140A (ja) * | 2005-05-12 | 2006-11-24 | Sharp Corp | 露光方法、および露光装置 |
US7568174B2 (en) * | 2005-08-19 | 2009-07-28 | Cadence Design Systems, Inc. | Method for checking printability of a lithography target |
US7528932B2 (en) * | 2005-12-21 | 2009-05-05 | Micronic Laser Systems Ab | SLM direct writer |
US7728955B2 (en) * | 2006-03-21 | 2010-06-01 | Asml Netherlands B.V. | Lithographic apparatus, radiation supply and device manufacturing method |
WO2007116000A2 (de) | 2006-04-04 | 2007-10-18 | Tesa Scribos Gmbh | Vorrichtung und verfahren zur mikrostrukturierung eines speichermediums sowie speichermedium mit einem mikrostrukturierten bereich |
WO2008007633A1 (fr) * | 2006-07-12 | 2008-01-17 | Nikon Corporation | Appareil optique d'éclairage, appareil d'exposition, et procédé de fabrication du dispositif |
JPWO2008007632A1 (ja) * | 2006-07-12 | 2009-12-10 | 株式会社ニコン | 照明光学装置、露光装置、およびデバイス製造方法 |
JP5308638B2 (ja) * | 2006-07-14 | 2013-10-09 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置用の照明光学系 |
DE102006032810A1 (de) | 2006-07-14 | 2008-01-17 | Carl Zeiss Smt Ag | Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement |
GB2444962B (en) * | 2006-12-22 | 2010-01-27 | Univ Muenster Wilhelms | Adaptive crystalline X-ray reflecting device |
CN101755495B (zh) | 2007-05-15 | 2013-10-16 | 美国能量变换公司 | 用来管理设施供电和冷却的方法和系统 |
US7714986B2 (en) * | 2007-05-24 | 2010-05-11 | Asml Netherlands B.V. | Laser beam conditioning system comprising multiple optical paths allowing for dose control |
US7768627B2 (en) * | 2007-06-14 | 2010-08-03 | Asml Netherlands B.V. | Illumination of a patterning device based on interference for use in a maskless lithography system |
US20090046750A1 (en) * | 2007-08-15 | 2009-02-19 | Jiping Li | Increased nanosecond laser pulse-to-pulse energy repeatability using active laser pulse energy control |
GB2485985B (en) | 2010-11-30 | 2015-07-22 | Powerphotonic Ltd | Laser pulse generation method and apparatus |
US8990536B2 (en) | 2011-06-01 | 2015-03-24 | Schneider Electric It Corporation | Systems and methods for journaling and executing device control instructions |
US9952103B2 (en) | 2011-12-22 | 2018-04-24 | Schneider Electric It Corporation | Analysis of effect of transient events on temperature in a data center |
US10350705B2 (en) | 2014-07-01 | 2019-07-16 | Qiova | Micromachining method for patterning a material |
KR20180104022A (ko) * | 2016-01-18 | 2018-09-19 | 에이에스엠엘 네델란즈 비.브이. | 빔 측정 시스템, 리소그래피 시스템, 및 방법 |
CN106410573A (zh) * | 2016-11-02 | 2017-02-15 | 国神光电科技(上海)有限公司 | 一种激光器 |
US20220035149A1 (en) * | 2020-07-30 | 2022-02-03 | Raytheon Company | Catoptric focus mechanisms for high-energy laser (hel) systems |
Family Cites Families (14)
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JPS5190829A (sv) * | 1975-02-07 | 1976-08-09 | ||
JPS6310149A (ja) * | 1986-07-02 | 1988-01-16 | Canon Inc | 照射光量制御装置 |
JP2503495B2 (ja) * | 1987-03-30 | 1996-06-05 | 株式会社ニコン | 露光装置及び露光方法 |
DE4022732A1 (de) * | 1990-07-17 | 1992-02-20 | Micronic Laser Systems Ab | Auf einem lichtempfindlich beschichteten substrat durch fokussierte laserstrahlung hergestellte struktur sowie verfahren und vorrichtung zu ihrer herstellung |
US5155778A (en) * | 1991-06-28 | 1992-10-13 | Texas Instruments Incorporated | Optical switch using spatial light modulators |
AU669721B2 (en) | 1992-06-11 | 1996-06-20 | Luscher Zed Flexo Limited | Engraving head |
US5448417A (en) * | 1993-03-16 | 1995-09-05 | Adams; Jeff C. | Laser pulse synthesizer |
US5636052A (en) * | 1994-07-29 | 1997-06-03 | Lucent Technologies Inc. | Direct view display based on a micromechanical modulation |
JPH08274399A (ja) * | 1995-04-03 | 1996-10-18 | Komatsu Ltd | パルスレーザ装置のパルスエネルギ制御装置と方法 |
DE69620731T2 (de) * | 1995-12-15 | 2002-10-17 | Texas Instruments Inc | Verbesserungen für räumliche Lichtmodulatoren |
US5912758A (en) * | 1996-09-11 | 1999-06-15 | Texas Instruments Incorporated | Bipolar reset for spatial light modulators |
JPH10142529A (ja) * | 1996-11-13 | 1998-05-29 | Nikon Corp | 空間光変調器 |
US5852621A (en) * | 1997-07-21 | 1998-12-22 | Cymer, Inc. | Pulse laser with pulse energy trimmer |
SE9800665D0 (sv) * | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
-
2000
- 2000-04-17 SE SE0001409A patent/SE517550C2/sv not_active IP Right Cessation
-
2001
- 2001-04-10 AU AU2001248952A patent/AU2001248952A1/en not_active Abandoned
- 2001-04-10 KR KR1020027007382A patent/KR100798535B1/ko not_active IP Right Cessation
- 2001-04-10 JP JP2001576541A patent/JP2004501384A/ja active Pending
- 2001-04-10 EP EP01922177A patent/EP1275033A1/en not_active Withdrawn
- 2001-04-10 CN CNB018032133A patent/CN100340923C/zh not_active Expired - Fee Related
- 2001-04-10 WO PCT/SE2001/000793 patent/WO2001079935A1/en active Application Filing
- 2001-04-10 US US10/130,070 patent/US6700095B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
SE0001409L (sv) | 2001-10-18 |
KR100798535B1 (ko) | 2008-01-28 |
CN1394297A (zh) | 2003-01-29 |
KR20030023605A (ko) | 2003-03-19 |
SE517550C2 (sv) | 2002-06-18 |
US20020153362A1 (en) | 2002-10-24 |
CN100340923C (zh) | 2007-10-03 |
WO2001079935A1 (en) | 2001-10-25 |
AU2001248952A1 (en) | 2001-10-30 |
US6700095B2 (en) | 2004-03-02 |
JP2004501384A (ja) | 2004-01-15 |
EP1275033A1 (en) | 2003-01-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |