RU2013139230A - Фотодетектор и устройство преобразования с повышением частоты и усилением (эп) - Google Patents
Фотодетектор и устройство преобразования с повышением частоты и усилением (эп) Download PDFInfo
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- RU2013139230A RU2013139230A RU2013139230/28A RU2013139230A RU2013139230A RU 2013139230 A RU2013139230 A RU 2013139230A RU 2013139230/28 A RU2013139230/28 A RU 2013139230/28A RU 2013139230 A RU2013139230 A RU 2013139230A RU 2013139230 A RU2013139230 A RU 2013139230A
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- 230000003321 amplification Effects 0.000 title claims abstract 20
- 238000003199 nucleic acid amplification method Methods 0.000 title claims abstract 20
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract 16
- 229910003437 indium oxide Inorganic materials 0.000 claims abstract 12
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims abstract 12
- 239000000463 material Substances 0.000 claims abstract 10
- DHDHJYNTEFLIHY-UHFFFAOYSA-N 4,7-diphenyl-1,10-phenanthroline Chemical compound C1=CC=CC=C1C1=CC=NC2=C1C=CC1=C(C=3C=CC=CC=3)C=CN=C21 DHDHJYNTEFLIHY-UHFFFAOYSA-N 0.000 claims abstract 8
- ZMKRXXDBXFWSQZ-UHFFFAOYSA-N tris(2,4,6-trimethyl-6-pyridin-3-ylcyclohexa-2,4-dien-1-yl)borane Chemical compound CC1=CC(C)=CC(C)(C=2C=NC=CC=2)C1B(C1C(C=C(C)C=C1C)(C)C=1C=NC=CC=1)C1C(C)=CC(C)=CC1(C)C1=CC=CN=C1 ZMKRXXDBXFWSQZ-UHFFFAOYSA-N 0.000 claims abstract 8
- 239000011787 zinc oxide Substances 0.000 claims abstract 8
- 230000005855 radiation Effects 0.000 claims abstract 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract 6
- 229910021393 carbon nanotube Inorganic materials 0.000 claims abstract 6
- 239000002041 carbon nanotube Substances 0.000 claims abstract 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract 6
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract 6
- YBNMDCCMCLUHBL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-pyren-1-ylbutanoate Chemical compound C=1C=C(C2=C34)C=CC3=CC=CC4=CC=C2C=1CCCC(=O)ON1C(=O)CCC1=O YBNMDCCMCLUHBL-UHFFFAOYSA-N 0.000 claims abstract 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract 5
- 239000002042 Silver nanowire Substances 0.000 claims abstract 5
- 229910052949 galena Inorganic materials 0.000 claims abstract 5
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 claims abstract 5
- STTGYIUESPWXOW-UHFFFAOYSA-N 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline Chemical compound C=12C=CC3=C(C=4C=CC=CC=4)C=C(C)N=C3C2=NC(C)=CC=1C1=CC=CC=C1 STTGYIUESPWXOW-UHFFFAOYSA-N 0.000 claims abstract 4
- WXDJHDMIIZKXSK-UHFFFAOYSA-N iodine dioxide Chemical compound O=I=O WXDJHDMIIZKXSK-UHFFFAOYSA-N 0.000 claims abstract 4
- -1 naphthalene tetracarboxylic anhydride Chemical class 0.000 claims abstract 3
- JLAVCPKULITDHO-UHFFFAOYSA-N tetraphenylsilane Chemical compound C1=CC=CC=C1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 JLAVCPKULITDHO-UHFFFAOYSA-N 0.000 claims abstract 3
- DETFWTCLAIIJRZ-UHFFFAOYSA-N triphenyl-(4-triphenylsilylphenyl)silane Chemical compound C1=CC=CC=C1[Si](C=1C=CC(=CC=1)[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 DETFWTCLAIIJRZ-UHFFFAOYSA-N 0.000 claims abstract 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims abstract 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims abstract 2
- 229910000673 Indium arsenide Inorganic materials 0.000 claims abstract 2
- 229910052732 germanium Inorganic materials 0.000 claims abstract 2
- 238000004770 highest occupied molecular orbital Methods 0.000 claims abstract 2
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 claims abstract 2
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 claims abstract 2
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910052710 silicon Inorganic materials 0.000 claims abstract 2
- 239000010410 layer Substances 0.000 claims 19
- 238000006243 chemical reaction Methods 0.000 claims 11
- 229910052782 aluminium Inorganic materials 0.000 claims 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- 239000012044 organic layer Substances 0.000 claims 4
- 229910052725 zinc Inorganic materials 0.000 claims 4
- 239000011701 zinc Substances 0.000 claims 4
- 239000011269 tar Substances 0.000 claims 3
- DHBXNPKRAUYBTH-UHFFFAOYSA-N 1,1-ethanedithiol Chemical compound CC(S)S DHBXNPKRAUYBTH-UHFFFAOYSA-N 0.000 claims 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 claims 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- UEEXRMUCXBPYOV-UHFFFAOYSA-N iridium;2-phenylpyridine Chemical compound [Ir].C1=CC=CC=C1C1=CC=CC=N1.C1=CC=CC=C1C1=CC=CC=N1.C1=CC=CC=C1C1=CC=CC=N1 UEEXRMUCXBPYOV-UHFFFAOYSA-N 0.000 claims 2
- 229910052709 silver Inorganic materials 0.000 claims 2
- JRNVQLOKVMWBFR-UHFFFAOYSA-N 1,2-benzenedithiol Chemical compound SC1=CC=CC=C1S JRNVQLOKVMWBFR-UHFFFAOYSA-N 0.000 claims 1
- RIKNNBBGYSDYAX-UHFFFAOYSA-N 2-[1-[2-(4-methyl-n-(4-methylphenyl)anilino)phenyl]cyclohexyl]-n,n-bis(4-methylphenyl)aniline Chemical compound C1=CC(C)=CC=C1N(C=1C(=CC=CC=1)C1(CCCCC1)C=1C(=CC=CC=1)N(C=1C=CC(C)=CC=1)C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 RIKNNBBGYSDYAX-UHFFFAOYSA-N 0.000 claims 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 claims 1
- OGGKVJMNFFSDEV-UHFFFAOYSA-N 3-methyl-n-[4-[4-(n-(3-methylphenyl)anilino)phenyl]phenyl]-n-phenylaniline Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 OGGKVJMNFFSDEV-UHFFFAOYSA-N 0.000 claims 1
- 229920000109 alkoxy-substituted poly(p-phenylene vinylene) Polymers 0.000 claims 1
- 230000005525 hole transport Effects 0.000 claims 1
- AOZVYCYMTUWJHJ-UHFFFAOYSA-K iridium(3+) pyridine-2-carboxylate Chemical compound [Ir+3].[O-]C(=O)C1=CC=CC=N1.[O-]C(=O)C1=CC=CC=N1.[O-]C(=O)C1=CC=CC=N1 AOZVYCYMTUWJHJ-UHFFFAOYSA-K 0.000 claims 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 claims 1
- 230000027756 respiratory electron transport chain Effects 0.000 claims 1
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- H10K59/65—OLEDs integrated with inorganic image sensors
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- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B23/00—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
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- H01L31/02—Details
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/028—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
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- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035209—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures
- H01L31/035218—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures the quantum structure being quantum dots
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- Solid State Image Pick-Up Elements (AREA)
Abstract
1. Инфракрасный фотодетектор с усилением, содержащий катод, слой активируемого ИК-излучением материала, слой умножения заряда (СУЗ) и анод, отличающийся тем, что СУЗ отделяет слой активируемого ИК-излучением материала от катода и характеризуется уровнем НСМО на ≥0,5 эВ выше, чем уровень Ферми катода в отсутствие ИК-излучения, или СУЗ отделяет слой активируемого ИК-излучением материала от анода и характеризуется уровнем ВЗМО на ≥0,5 эВ ниже, чем уровень Ферми анода в отсутствие ИК-излучения.2. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что катод содержит Ag, Ca, Mg, легированный оловом оксид индия (ОИО), легированный цинком оксид индия (ОИЦ), легированный алюминием оксид олова (ОАО), легированный алюминием оксид цинка (ОАЦ), LiF/Al/ОИО, Ag/ОИО, CsCO/ОИО, углеродные нанотрубки или серебряные нанопроволоки.3. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что слой активируемого ИК-излучением материала содержит PCTDA, SnPc, SnPc:C, AlPcCl, AlPcCl:C, TiOPc, TiOPc:C, КП PbSe, КП PbS, PbSe, PbS, InAs, InGaAs, Si, Ge или GaAs.4. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что СУЗ содержит нафталинтетракарбоновый ангидрид (NTCDA), 2,9-диметил-4,7-дифенил-1,10-фенантролин (ВСР), n-бис(трифенилсилил)бензол (UGH2), 4,7-дифенил-1,10-фенантролин (BPhen), трис-(8-нидроксихинолин)алюминий (Alq), 3,5′-N,N′-дикарбазолбензол (mCP), C, трис[3-(3-пиридил)мезитил]боран (3TPYMB), ZnO или TiO.5. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что анод содержит Ag, Ca, Mg, легированный оловом оксид индия (ОИО), легированный цинком оксид индия (ОИЦ), легированный алюминием оксид олова (ОАО), легированный алюминием оксид цинка (ОАЦ), LiF/Al/ОИО, Ag/ОИО, CsCO/ОИО, углеродные нанотрубки или
Claims (19)
1. Инфракрасный фотодетектор с усилением, содержащий катод, слой активируемого ИК-излучением материала, слой умножения заряда (СУЗ) и анод, отличающийся тем, что СУЗ отделяет слой активируемого ИК-излучением материала от катода и характеризуется уровнем НСМО на ≥0,5 эВ выше, чем уровень Ферми катода в отсутствие ИК-излучения, или СУЗ отделяет слой активируемого ИК-излучением материала от анода и характеризуется уровнем ВЗМО на ≥0,5 эВ ниже, чем уровень Ферми анода в отсутствие ИК-излучения.
2. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что катод содержит Ag, Ca, Mg, легированный оловом оксид индия (ОИО), легированный цинком оксид индия (ОИЦ), легированный алюминием оксид олова (ОАО), легированный алюминием оксид цинка (ОАЦ), LiF/Al/ОИО, Ag/ОИО, CsCO3/ОИО, углеродные нанотрубки или серебряные нанопроволоки.
3. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что слой активируемого ИК-излучением материала содержит PCTDA, SnPc, SnPc:C60, AlPcCl, AlPcCl:C60, TiOPc, TiOPc:C60, КП PbSe, КП PbS, PbSe, PbS, InAs, InGaAs, Si, Ge или GaAs.
4. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что СУЗ содержит нафталинтетракарбоновый ангидрид (NTCDA), 2,9-диметил-4,7-дифенил-1,10-фенантролин (ВСР), n-бис(трифенилсилил)бензол (UGH2), 4,7-дифенил-1,10-фенантролин (BPhen), трис-(8-нидроксихинолин)алюминий (Alq3), 3,5′-N,N′-дикарбазолбензол (mCP), C60, трис[3-(3-пиридил)мезитил]боран (3TPYMB), ZnO или TiO2.
5. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что анод содержит Ag, Ca, Mg, легированный оловом оксид индия (ОИО), легированный цинком оксид индия (ОИЦ), легированный алюминием оксид олова (ОАО), легированный алюминием оксид цинка (ОАЦ), LiF/Al/ОИО, Ag/ОИО, CsCO3/ОИО, углеродные нанотрубки или серебряные нанопроволоки.
6. Инфракрасный фотодетектор с усилением по п.1, отличающийся тем, что слой активируемого ИК-излучением материала содержит КП PbSe или КП PbS, и СУЗ содержит масляную кислоту, октиламин, этантиол, этандитиол (EDT) или бензолдитиол (BTD).
7. Инфракрасный фотодетектор с усилением по п.1, дополнительно содержащий блокирующий дырки слой, который отделяет слой активируемого ИК-излучением материала от анода.
8. Инфракрасный фотодетектор с усилением по п.7, отличающийся тем, что блокирующий дырки слой содержит 2,9-диметил-4,7-дифенил-1,10-фенантролин (ВСР), n-бис(трифенилсилил)бензол (UGH2), 4,7-дифенил-1,10-фенантролин (BPhen), трис-(8-нидроксихинолин)алюминий (Alq3), 3,5′-N,N′-дикарбазолбензол (mCP), C60, трис[3-(3-пиридил)мезитил]боран (3TPYMB), ZnO или TiO2.
9. Устройство преобразования с повышением частоты и усилением, содержащее инфракрасный фотодетектор с усилением по п.1 и органический светоизлучающий диод (ОСИД).
10. Устройство преобразования с повышением частоты и усилением по п.9, отличающееся тем, что ОСИД содержит катод, слой переноса электронов (СПЭ), светоизлучающий слой (СИС), обеспечивающий транспорт дырок слой (СТД) и анод.
11. Устройство преобразования с повышением частоты и усилением по п.10, отличающееся тем, что катод содержит Ag, Ca, Mg, легированный оловом оксид индия (ОИО), легированный цинком оксид индия (ОИЦ), легированный алюминием оксид олова (ОАО), легированный алюминием оксид цинка (ОАЦ), LiF/Al/ОИО, Ag/ОИО, CsCO3/ОИО, углеродные нанотрубки или серебряные нанопроволоки.
12. Устройство преобразования с повышением частоты и усилением по п.10, отличающееся тем, что СПЭ содержит трис[3-(3-пиридил)мезитил]боран (3TPYMB), 2,9-диметил-4,7-дифенил-1,10-фенантролин (ВСР), 4,7-дифенил-1,10-фенантролин (BPhen) или трис-(8-нидроксихинолин)алюминий (Alq3).
13. Устройство преобразования с повышением частоты и усилением по п.10, отличающееся тем, что светоизлучающий слой (СИС) содержит трис-(2-фенилпиридин)иридий, Ir(ppy)3, поли-[2-метокси-5-(2′-этил-гексилокси)фениленвинилен] (MEH-PPV), трис-(8-нидроксихинолин)алюминий (Alg3) или бис-[(4,6-дифторфенил)пиридинат-N,C2`]пиколинат иридия (III) (FIrpic).
14. Устройство преобразования с повышением частоты и усилением по п.10, отличающееся тем, что СТД содержит 1,1-бис[(ди-4-толиламино)фенил]циклогексан (ТАРС), N,N′-дифенил-N,N′(2-нафтил)-(1,1′-фенил)-4,4′-диамин (NPB) или N,N′-дифенил-N,N′-ди(м-толил)бензидин (TPD).
15. Устройство преобразования с повышением частоты и усилением по п.10, отличающееся тем, что анод содержит легированный оловом оксид индия (ОИО), легированный цинком оксид индия (ОИЦ), легированный алюминием оксид олова (ОАО), легированный алюминием оксид цинка (ОАЦ), углеродные нанотрубки или серебряные нанопроволоки.
16. Устройство преобразования с повышением частоты и усилением по п.9, дополнительно содержащее коммутационный слой, отделяющий инфракрасный фото детектор с усилением по п.1 от ОСИД.
17. Устройство преобразования с повышением частоты и усилением по п.16, отличающееся тем, что коммутационный слой содержит тонкий металл или многослойный соединительный слой.
18. Устройство преобразования с повышением частоты и усилением по п.17, отличающееся тем, что тонкий металл содержит Al, Ag и Au и имеет толщину от 0,1 до 3 нм.
19. Устройство преобразования с повышением частоты и усилением по п.17, отличающееся тем, что многослойный соединительный слой содержит легированный органический слой n-типа, тонкий металлический слой и легированный органический слой p-типа, где: легированный органический слой n-типа содержит Bphen, легированный Cs2CO3, BCP, легированный Cs2CO3, ZnO, легированный Cs2CO3, Bphen, легированный Li, BCP, легированный Li, Bphen, легированный LiF, или ВСР, легированный LiF; тонкий металл содержит слой толщиной от 0,1 до 3 нм из Al, Ag или Au; и легированный органический слой p-типа содержит ТАРС, легированный MoO3, NPB, легированный MoO3, ТАРС, легированный HAT CN, или NPB, легированный HAT CN.
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WO2013028232A1 (en) | 2013-02-28 |
KR20140025359A (ko) | 2014-03-04 |
SG192277A1 (en) | 2013-09-30 |
US20140217365A1 (en) | 2014-08-07 |
US9196661B2 (en) | 2015-11-24 |
JP2014514730A (ja) | 2014-06-19 |
CA2828364A1 (en) | 2013-02-28 |
CN103443935B (zh) | 2016-03-16 |
EP2666191A1 (en) | 2013-11-27 |
US9214502B2 (en) | 2015-12-15 |
WO2013028232A8 (en) | 2013-09-19 |
JP6219172B2 (ja) | 2017-10-25 |
AU2012299422A1 (en) | 2013-09-12 |
US20150171149A1 (en) | 2015-06-18 |
CN105742395A (zh) | 2016-07-06 |
US20140353502A1 (en) | 2014-12-04 |
CN105742395B (zh) | 2019-02-15 |
US8829498B2 (en) | 2014-09-09 |
CN103443935A (zh) | 2013-12-11 |
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