PL373839A1 - Stabilizowana, wodna dyspersja dwutlenku krzemu - Google Patents

Stabilizowana, wodna dyspersja dwutlenku krzemu

Info

Publication number
PL373839A1
PL373839A1 PL03373839A PL37383903A PL373839A1 PL 373839 A1 PL373839 A1 PL 373839A1 PL 03373839 A PL03373839 A PL 03373839A PL 37383903 A PL37383903 A PL 37383903A PL 373839 A1 PL373839 A1 PL 373839A1
Authority
PL
Poland
Prior art keywords
stabilized
silicon dioxide
dioxide dispersion
aqueous silicon
aqueous
Prior art date
Application number
PL03373839A
Other languages
English (en)
Other versions
PL203972B1 (pl
Inventor
Wolfgang Lortz
Christoph Batz-Sohn
Gabriele Perlet
Werner Will
Gerrit Schneider
Peter Neugebauer
Original Assignee
Degussa Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa Ag filed Critical Degussa Ag
Publication of PL373839A1 publication Critical patent/PL373839A1/pl
Publication of PL203972B1 publication Critical patent/PL203972B1/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3045—Treatment with inorganic compounds
    • C09C1/3054—Coating
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/149—Coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
PL373839A 2002-08-22 2003-07-29 Wodna dyspersja proszkowego dwutlenku krzemu, sposób wytwarzania wodnej dyspersji, proszek i zastosowanie dyspersji PL203972B1 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10238463A DE10238463A1 (de) 2002-08-22 2002-08-22 Stabilisierte, wässerige Siliciumdioxid-Dispersion

Publications (2)

Publication Number Publication Date
PL373839A1 true PL373839A1 (pl) 2005-09-19
PL203972B1 PL203972B1 (pl) 2009-11-30

Family

ID=31197230

Family Applications (1)

Application Number Title Priority Date Filing Date
PL373839A PL203972B1 (pl) 2002-08-22 2003-07-29 Wodna dyspersja proszkowego dwutlenku krzemu, sposób wytwarzania wodnej dyspersji, proszek i zastosowanie dyspersji

Country Status (10)

Country Link
EP (1) EP1529014A1 (pl)
JP (1) JP4448030B2 (pl)
KR (1) KR100772258B1 (pl)
CN (1) CN100447082C (pl)
AU (1) AU2003250188A1 (pl)
CA (1) CA2496467C (pl)
DE (1) DE10238463A1 (pl)
NO (1) NO20051492L (pl)
PL (1) PL203972B1 (pl)
WO (1) WO2004018359A1 (pl)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200613485A (en) * 2004-03-22 2006-05-01 Kao Corp Polishing composition
DE102004021092A1 (de) 2004-04-29 2005-11-24 Degussa Ag Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel
AT500776B1 (de) * 2004-08-18 2008-12-15 Wagner Friedrich Verwendung einer zusammensetzung zum aufbringen einer rutschhemmenden, höhenaufbauenden strukturbeschichtung
AT502282B1 (de) * 2005-07-26 2008-12-15 Friedrich Wagner Rutschhemmender sprühauftrag für bewegliche bodenbeläge
WO2006046463A1 (ja) * 2004-10-28 2006-05-04 Konica Minolta Photo Imaging, Inc. カチオン性微粒子分散体及びインクジェット記録用紙
DE102005012409A1 (de) 2005-03-17 2006-09-21 Wacker Chemie Ag Wäßrige Dispersionen teilhydrophober Kieselsäuren
DE102005062606A1 (de) * 2005-12-23 2007-07-05 Deutsche Institute Für Textil- Und Faserforschung Denkendorf Nanoskalige Teilchen auf der Basis von SiO2 und Mischoxiden hiervon, deren Herstellung und Verwendung zur Behandlung textiler Materialien
JP2007258606A (ja) * 2006-03-24 2007-10-04 Fujifilm Corp 化学的機械的研磨用研磨液
SG173361A1 (en) * 2006-07-12 2011-08-29 Cabot Microelectronics Corp Cmp method for metal-containing substrates
DE102006049526A1 (de) * 2006-10-20 2008-04-24 Evonik Degussa Gmbh Stabile wässrige Dispersionen von Siliciumdioxid
AR069375A1 (es) * 2007-11-19 2010-01-20 Grace Gmbh & Co Kg Particulas anticorrosivas submicronicas
DE102007059861A1 (de) * 2007-12-12 2009-06-18 Evonik Degussa Gmbh Verfahren zur Herstellung von Siliciumdioxid-Dispersionen
DE102008041466A1 (de) 2008-08-22 2010-02-25 Wacker Chemie Ag Wäßrige Dispersionen hydrophober Kieselsäuren
CN101838479B (zh) * 2010-03-19 2013-11-20 福建师范大学 一种可分散超细二氧化硅的制备方法
EP3009398B1 (en) * 2013-06-10 2022-07-27 Nissan Chemical Corporation Silica sol and method for producing silica sol
CN105778775B (zh) * 2014-12-23 2021-03-02 安集微电子（上海）有限公司 一种中性胶体二氧化硅的制备方法
CN104830300A (zh) * 2015-04-30 2015-08-12 河南大学 一种小粒径纳米聚硅乳液及其制备方法
CN108751204A (zh) * 2018-05-14 2018-11-06 江苏联瑞新材料股份有限公司 一种亚微米二氧化硅分散液的制备方法
CN111777949A (zh) * 2020-07-13 2020-10-16 长沙金硅地环保科技有限公司 一种高分子纳米硅与水溶胶聚合物及其应用
JP2022067800A (ja) * 2020-10-21 2022-05-09 山口精研工業株式会社 シリカ分散液、及び研磨剤組成物
CN114044520A (zh) * 2021-11-29 2022-02-15 苏州西丽卡电子材料有限公司 一种高铝超纯合成石英砂的制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892797A (en) * 1956-02-17 1959-06-30 Du Pont Process for modifying the properties of a silica sol and product thereof
US3007878A (en) * 1956-11-01 1961-11-07 Du Pont Aquasols of positively-charged coated silica particles and their production
SE501214C2 (sv) * 1992-08-31 1994-12-12 Eka Nobel Ab Silikasol samt förfarande för framställning av papper under användande av solen
JP4704564B2 (ja) * 1998-10-02 2011-06-15 キャボット コーポレイション シリカ分散体、コーティング組成物、及び記録媒体

Also Published As

Publication number Publication date
KR20050050646A (ko) 2005-05-31
JP4448030B2 (ja) 2010-04-07
CA2496467C (en) 2008-12-09
NO20051492L (no) 2005-05-13
KR100772258B1 (ko) 2007-11-01
CA2496467A1 (en) 2004-03-04
EP1529014A1 (en) 2005-05-11
CN1675128A (zh) 2005-09-28
CN100447082C (zh) 2008-12-31
JP2005536426A (ja) 2005-12-02
PL203972B1 (pl) 2009-11-30
AU2003250188A1 (en) 2004-03-11
WO2004018359A1 (en) 2004-03-04
DE10238463A1 (de) 2004-03-04

Similar Documents

Publication Publication Date Title
PL373839A1 (pl) Stabilizowana, wodna dyspersja dwutlenku krzemu
HK1070049A1 (en) Substituted cyclohexane-1,4-diamine derivatives
AU2003276260A1 (en) Surface-modified, aerogel-type, structured silica
MX272846B (es) Dispersion acuosa, metodo de produccion y su uso.
AU2002312883A1 (en) Substituted cyclohexane-1,4-diamine derivatives
ZA200306530B (en) Foamer.
AU2003301769A1 (en) Stabilized semiconductor nanocrystals
AP2004002969A0 (en) Stabilized oral suspension formulation.
HK1051639A1 (en) Buckle.
NO20033613D0 (no) Vandig polyuretandispersjon
MXPA03005286A (es) METODO Y APARATO PARA SUPERVISAR PULSACION DE INSTALACION DE ORDEnA.
HK1080096B (zh) 穩定化的交聯劑水分散體
AU2002367987A1 (en) Shoulder adjuster
EP1477543A4 (en) AQUEOUS HYDRO AND OLEOPHOBY DISPERSION
AU2003210216A8 (en) Aqueous dispersion containing polyethylene
AU2002349384A1 (en) Thermally responsive aqueous silicate mixture
AU2002311024A1 (en) Silicon dioxide dispersion
GB0212528D0 (en) Dispersion
MXPA03004831A (es) Preparacion de locion capilar.
GB0115971D0 (en) Aqueous polyurethane dispersion
GB0217712D0 (en) Aqueous polyurethane dispersion
ZA200208901B (en) Prop head.
ZA200108199B (en) Stabilized secure algorithms.
GB0112516D0 (en) V.i.s.c
GB0120987D0 (en) V.p.c.o