PL2942848T3 - Laser półprzewodnikowy i sposób wytwarzania lasera półprzewodnikowego zawierającego element sprzężenia zwrotnego - Google Patents

Laser półprzewodnikowy i sposób wytwarzania lasera półprzewodnikowego zawierającego element sprzężenia zwrotnego

Info

Publication number
PL2942848T3
PL2942848T3 PL15165212.0T PL15165212T PL2942848T3 PL 2942848 T3 PL2942848 T3 PL 2942848T3 PL 15165212 T PL15165212 T PL 15165212T PL 2942848 T3 PL2942848 T3 PL 2942848T3
Authority
PL
Poland
Prior art keywords
semiconductor laser
making
feedback element
feedback
laser
Prior art date
Application number
PL15165212.0T
Other languages
English (en)
Inventor
Johannes Koeth
Lars Nähle
Original Assignee
Advanced Photonics Applications Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Photonics Applications Gmbh filed Critical Advanced Photonics Applications Gmbh
Publication of PL2942848T3 publication Critical patent/PL2942848T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/3401—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having no PN junction, e.g. unipolar lasers, intersubband lasers, quantum cascade lasers
    • H01S5/3402—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having no PN junction, e.g. unipolar lasers, intersubband lasers, quantum cascade lasers intersubband lasers, e.g. transitions within the conduction or valence bands
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/065—Mode locking; Mode suppression; Mode selection ; Self pulsating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/1237—Lateral grating, i.e. grating only adjacent ridge or mesa
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004—Confining in the direction perpendicular to the layer structure
    • H01S5/2018—Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00—Functional characteristics
    • H01S2301/17—Semiconductor lasers comprising special layers
    • H01S2301/176—Specific passivation layers on surfaces other than the emission facet
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/1231—Grating growth or overgrowth details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
    • H01S5/2214—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides
    • H01S5/2215—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides using native oxidation of semiconductor layers

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Semiconductor Lasers (AREA)
PL15165212.0T 2014-05-05 2015-04-27 Laser półprzewodnikowy i sposób wytwarzania lasera półprzewodnikowego zawierającego element sprzężenia zwrotnego PL2942848T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102014106209.4A DE102014106209B3 (de) 2014-05-05 2014-05-05 Interbandkaskadenlaser sowie Verfahren zur Herstellung eines Interbandkaskadenlasers umfassend ein Rückkopplungselement

Publications (1)

Publication Number Publication Date
PL2942848T3 true PL2942848T3 (pl) 2025-04-07

Family

ID=53002598

Family Applications (1)

Application Number Title Priority Date Filing Date
PL15165212.0T PL2942848T3 (pl) 2014-05-05 2015-04-27 Laser półprzewodnikowy i sposób wytwarzania lasera półprzewodnikowego zawierającego element sprzężenia zwrotnego

Country Status (5)

Country Link
US (1) US9397480B2 (pl)
EP (1) EP2942848B1 (pl)
JP (1) JP6795287B2 (pl)
DE (1) DE102014106209B3 (pl)
PL (1) PL2942848T3 (pl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6669611B2 (ja) * 2016-08-25 2020-03-18 日本電信電話株式会社 ナノワイヤレーザ
US11031753B1 (en) * 2017-11-13 2021-06-08 The Government Of The United States Of America As Represented By The Secretary Of The Air Force Extracting the fundamental mode in broad area quantum cascade lasers
DE102018123019A1 (de) * 2018-09-19 2020-03-19 Osram Opto Semiconductors Gmbh Gewinngeführter halbleiterlaser und herstellungsverfahren hierfür
CN113991422B (zh) * 2021-09-15 2023-09-19 中山大学 一种基于介质侧壁光栅的确定性光栅耦合系数的dfb激光器制作方法
US20230231364A1 (en) * 2022-01-04 2023-07-20 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Weak Index Guiding of Interband Cascade Lasers

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62295480A (ja) * 1986-06-16 1987-12-22 Mitsubishi Electric Corp 半導体レ−ザ装置
JPH1098235A (ja) * 1996-08-01 1998-04-14 Pioneer Electron Corp 無再成長分布帰還リッジ型半導体レーザ及びその製造方法
JPH11274637A (ja) * 1998-03-20 1999-10-08 Pioneer Electron Corp 横結合分布帰還リッジ型半導体レーザ及びその製造方法
US6501783B1 (en) * 2000-02-24 2002-12-31 Lucent Technologies Inc. Distributed feedback surface plasmon laser
JP4008180B2 (ja) * 2000-03-29 2007-11-14 パイオニア株式会社 分布帰還リッジ型半導体レーザ
US6463088B1 (en) * 2000-07-07 2002-10-08 Lucent Technologies Inc. Mesa geometry semiconductor light emitter having chalcogenide dielectric coating
JP2003152273A (ja) * 2001-11-08 2003-05-23 Furukawa Electric Co Ltd:The 半導体レーザ素子
WO2003073570A1 (fr) * 2002-02-27 2003-09-04 National Institute Of Advanced Industrial Science And Technology Laser a semi-conducteurs nanocomposite quantique et reseau nanocomposite quantique
DE10254190B4 (de) * 2002-11-20 2005-12-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Infrarothalbleiterlaser
US7301977B2 (en) * 2004-06-10 2007-11-27 Nanoplus Gmbh Tuneable unipolar lasers
GB2416427A (en) * 2004-06-18 2006-01-25 Univ Sheffield DFB laser
JP4721924B2 (ja) * 2005-12-09 2011-07-13 富士通株式会社 光導波路を伝搬する光と回折格子とを結合させた光素子
US8125706B2 (en) * 2008-10-20 2012-02-28 The United States Of America As Represented By The Secretary Of The Navy High-temperature interband cascade lasers
DE102009019996B4 (de) * 2009-05-05 2011-09-15 Nanoplus Gmbh Nanosystems And Technologies DFB Laserdiode mit lateraler Kopplung für große Ausgangsleistungen
US8929417B2 (en) * 2009-12-21 2015-01-06 The Board Of Regents Of The University Of Oklahoma Semiconductor interband lasers and method of forming
US8290011B2 (en) * 2010-11-22 2012-10-16 The United States Of America, As Represented By The Secretary Of The Navy Interband cascade lasers
WO2012145103A1 (en) * 2011-04-20 2012-10-26 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Interband cascade lasers with engineered carrier densities
JP5638483B2 (ja) * 2011-08-03 2014-12-10 株式会社東芝 半導体レーザ装置
JP5874610B2 (ja) * 2012-11-12 2016-03-02 トヨタ紡織株式会社 車両用内装材
DE102013111770A1 (de) * 2013-10-25 2015-04-30 Nanoplus Nanosystems And Technologies Gmbh Halbleiterlaserdiode mit einstellbarer Emissionswellenlänge
CN103579904B (zh) * 2013-11-08 2015-11-18 中国科学院半导体研究所 带间级联激光器及其制备方法
JP2015222811A (ja) * 2014-05-01 2015-12-10 住友電気工業株式会社 量子カスケード半導体レーザ、量子カスケード半導体レーザを作製する方法

Also Published As

Publication number Publication date
EP2942848B1 (de) 2024-12-04
US9397480B2 (en) 2016-07-19
JP2015228494A (ja) 2015-12-17
EP2942848A1 (de) 2015-11-11
JP6795287B2 (ja) 2020-12-02
US20150318669A1 (en) 2015-11-05
DE102014106209B3 (de) 2015-08-27
EP2942848C0 (de) 2024-12-04

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