LT3262728T - Diodinis lazeris ir diodinio lazerio gamybos būdas - Google Patents

Diodinis lazeris ir diodinio lazerio gamybos būdas

Info

Publication number
LT3262728T
LT3262728T LTEPPCT/EP2016/053802T LT16053802T LT3262728T LT 3262728 T LT3262728 T LT 3262728T LT 16053802 T LT16053802 T LT 16053802T LT 3262728 T LT3262728 T LT 3262728T
Authority
LT
Lithuania
Prior art keywords
diode laser
producing
diode
laser
Prior art date
Application number
LTEPPCT/EP2016/053802T
Other languages
English (en)
Inventor
Ralf HÜLSEWEDE
Matthias Schröder
Valentin Loyo-Maldonado
Original Assignee
Jenoptik Optical Systems Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jenoptik Optical Systems Gmbh filed Critical Jenoptik Optical Systems Gmbh
Publication of LT3262728T publication Critical patent/LT3262728T/lt

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0233Mounting configuration of laser chips
    • H01S5/0234Up-side down mountings, e.g. Flip-chip, epi-side down mountings or junction down mountings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0235Method for mounting laser chips
    • H01S5/02355Fixing laser chips on mounts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0235Method for mounting laser chips
    • H01S5/02355Fixing laser chips on mounts
    • H01S5/0236Fixing laser chips on mounts using an adhesive
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0235Method for mounting laser chips
    • H01S5/02355Fixing laser chips on mounts
    • H01S5/02365Fixing laser chips on mounts by clamping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/024Arrangements for thermal management
    • H01S5/02476Heat spreaders, i.e. improving heat flow between laser chip and heat dissipating elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • H01S5/4031Edge-emitting structures

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Couplings Of Light Guides (AREA)
LTEPPCT/EP2016/053802T 2015-02-24 2016-02-24 Diodinis lazeris ir diodinio lazerio gamybos būdas LT3262728T (lt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015002176.1A DE102015002176A1 (de) 2015-02-24 2015-02-24 Verfahren zum Herstellen eines Diodenlasers und Diodenlaser
PCT/EP2016/053802 WO2016135160A1 (de) 2015-02-24 2016-02-24 Verfahren zum herstellen eines diodenlasers und diodenlaser

Publications (1)

Publication Number Publication Date
LT3262728T true LT3262728T (lt) 2023-03-10

Family

ID=55442785

Family Applications (1)

Application Number Title Priority Date Filing Date
LTEPPCT/EP2016/053802T LT3262728T (lt) 2015-02-24 2016-02-24 Diodinis lazeris ir diodinio lazerio gamybos būdas

Country Status (9)

Country Link
US (1) US11552453B2 (lt)
EP (1) EP3262728B1 (lt)
JP (1) JP6764415B2 (lt)
CN (1) CN107210581B (lt)
DE (1) DE102015002176A1 (lt)
ES (1) ES2939633T3 (lt)
FI (1) FI3262728T3 (lt)
LT (1) LT3262728T (lt)
WO (1) WO2016135160A1 (lt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018113377A (ja) * 2017-01-12 2018-07-19 三菱電機株式会社 レーザー光源装置
US11557881B2 (en) * 2017-11-03 2023-01-17 Jenoptik Optical Systems Gmbh Diode laser
DE102018210142A1 (de) * 2018-06-21 2019-12-24 Trumpf Photonics, Inc. Diodenlaseranordnung und Verfahren zum Herstellen einer Diodenlaseranordnung
DE102018210135B4 (de) 2018-06-21 2023-06-29 Trumpf Photonics, Inc. Diodenlaseranordnung und Verfahren zur Montage einer Diodenlaseranordnung
JP7323527B2 (ja) * 2018-07-30 2023-08-08 パナソニックホールディングス株式会社 半導体発光装置及び外部共振型レーザ装置
DE102018121857B4 (de) 2018-09-07 2023-05-11 Jenoptik Optical Systems Gmbh Vorrichtung zum Betreiben eines lichtemittierenden Halbleiterbauelements
JP7275894B2 (ja) * 2019-06-20 2023-05-18 株式会社デンソー 半導体レーザ光源モジュール、半導体レーザ装置
DE102019124993A1 (de) * 2019-09-16 2021-03-18 Jenoptik Optical Systems Gmbh Verfahren zum Herstellen einer Halbleiteranordnung und Diodenlaser
JP2022163245A (ja) * 2019-09-27 2022-10-26 パナソニックIpマネジメント株式会社 レーザ発光素子およびレーザ発光装置
US11557874B2 (en) * 2021-05-18 2023-01-17 Trumpf Photonics, Inc. Double-sided cooling of laser diodes
US11876343B2 (en) 2021-05-18 2024-01-16 Trumpf Photonics, Inc. Laser diode packaging platforms
DE102021133671A1 (de) 2021-12-17 2023-06-22 Jenoptik Optical Systems Gmbh Verfahren zum Herstellen eines Diodenlasers und Diodenlaser

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5220782A (en) * 1975-08-11 1977-02-16 Nippon Telegr & Teleph Corp <Ntt> Semi-conductor element mounting method
JPS53118475U (lt) * 1977-02-28 1978-09-20
US4716568A (en) 1985-05-07 1987-12-29 Spectra Diode Laboratories, Inc. Stacked diode laser array assembly
US5105429A (en) 1990-07-06 1992-04-14 The United States Of America As Represented By The Department Of Energy Modular package for cooling a laser diode array
DE10113943B4 (de) 2001-03-21 2009-01-22 Jenoptik Laserdiode Gmbh Diodenlaserbauelement
US6888167B2 (en) * 2001-07-23 2005-05-03 Cree, Inc. Flip-chip bonding of light emitting devices and light emitting devices suitable for flip-chip bonding
JP2003086883A (ja) 2001-09-10 2003-03-20 Sony Corp 半導体レーザ装置
DE10245631B4 (de) * 2002-09-30 2022-01-20 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterbauelement
JP2004140098A (ja) * 2002-10-16 2004-05-13 Hamamatsu Photonics Kk 半導体レーザバーの固定方法
DE10258745A1 (de) * 2002-12-13 2004-07-08 Hentze-Lissotschenko Patentverwaltungs Gmbh & Co.Kg Halbleiterlaservorrichtung, Halbleiterlaserbaustein für eine derartige Halbleiterlaservorrichtung sowie ein Verfahren zur Herstellung einer derartigen Halbleiterlaservorrichtung
US7215690B2 (en) * 2004-08-04 2007-05-08 Monocrom, S.L. Laser module
EP2191546B1 (en) * 2007-09-20 2018-01-17 II-VI Laser Enterprise GmbH High power semiconductor laser diodes
EP2053709B1 (de) * 2007-10-22 2012-08-01 TRUMPF Laser GmbH + Co. KG Lager für optische Bauteile
DE102008026229B4 (de) 2008-05-29 2012-12-27 Jenoptik Laser Gmbh Wärmeübertragungsvorrichtung zur doppelseitigen Kühlung eines Halbleiterbauelementes
DE102008026801B4 (de) 2008-06-02 2012-05-31 Jenoptik Laser Gmbh Wärmeübertragungsvorrichtung zur doppelseitigen Kühlung eines Halbleiterbauelementes und Verfahren zu seiner Montage
DE102009040835A1 (de) * 2009-09-09 2011-03-10 Jenoptik Laserdiode Gmbh Verfahren zum thermischen Kontaktieren einander gegenüberliegender elektrischer Anschlüsse einer Halbleiterbauelement-Anordnung
JP2011109002A (ja) * 2009-11-20 2011-06-02 Citizen Holdings Co Ltd 集積デバイスおよび集積デバイスの製造方法
JP5765619B2 (ja) * 2010-04-19 2015-08-19 東芝ライテック株式会社 発光装置
TWI407536B (zh) * 2010-12-10 2013-09-01 Univ Nat Cheng Kung 半導體元件之散熱座的製作方法
JP5636319B2 (ja) * 2011-03-18 2014-12-03 シチズンホールディングス株式会社 光モジュールの製造方法
JP5834461B2 (ja) * 2011-04-14 2015-12-24 日本電気株式会社 半導体レーザモジュール及びその製造方法
EP2779332A4 (en) 2011-11-10 2015-11-25 Citizen Holdings Co Ltd OPTICAL INTEGRATED DEVICE
JP2014027179A (ja) * 2012-07-27 2014-02-06 Harison Toshiba Lighting Corp 発光装置およびその製造方法、並びにパッケージ部材

Also Published As

Publication number Publication date
EP3262728B1 (de) 2023-01-25
ES2939633T3 (es) 2023-04-25
CN107210581B (zh) 2020-04-03
US11552453B2 (en) 2023-01-10
DE102015002176A1 (de) 2016-08-25
JP2018507552A (ja) 2018-03-15
JP6764415B2 (ja) 2020-09-30
US20180138664A1 (en) 2018-05-17
WO2016135160A1 (de) 2016-09-01
CN107210581A (zh) 2017-09-26
FI3262728T3 (en) 2023-03-23
EP3262728A1 (de) 2018-01-03

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