PL1998366T3 - Urządzenie do obróbki substratu i sposób pozycjonowania substratu - Google Patents

Urządzenie do obróbki substratu i sposób pozycjonowania substratu

Info

Publication number
PL1998366T3
PL1998366T3 PL07107164T PL07107164T PL1998366T3 PL 1998366 T3 PL1998366 T3 PL 1998366T3 PL 07107164 T PL07107164 T PL 07107164T PL 07107164 T PL07107164 T PL 07107164T PL 1998366 T3 PL1998366 T3 PL 1998366T3
Authority
PL
Poland
Prior art keywords
substrate
fastening means
frame
edge
attached
Prior art date
Application number
PL07107164T
Other languages
English (en)
Inventor
Thomas Berger
Simon Lau
Dieter Haas
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of PL1998366T3 publication Critical patent/PL1998366T3/pl

Links

Classifications

    • H10P72/70—
    • H10P72/7604—
    • H10P72/50—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49998—Work holding

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
PL07107164T 2007-04-27 2007-04-27 Urządzenie do obróbki substratu i sposób pozycjonowania substratu PL1998366T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP07107164A EP1998366B1 (en) 2007-04-27 2007-04-27 Substrate processing device and method of placing a substrate

Publications (1)

Publication Number Publication Date
PL1998366T3 true PL1998366T3 (pl) 2010-12-31

Family

ID=38327074

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07107164T PL1998366T3 (pl) 2007-04-27 2007-04-27 Urządzenie do obróbki substratu i sposób pozycjonowania substratu

Country Status (9)

Country Link
US (2) US8323412B2 (pl)
EP (1) EP1998366B1 (pl)
JP (1) JP5068216B2 (pl)
KR (1) KR100957885B1 (pl)
CN (1) CN101299416B (pl)
AT (1) ATE469437T1 (pl)
DE (1) DE602007006772D1 (pl)
PL (1) PL1998366T3 (pl)
TW (1) TWI371078B (pl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL1998366T3 (pl) 2007-04-27 2010-12-31 Applied Materials Inc Urządzenie do obróbki substratu i sposób pozycjonowania substratu
JP5359698B2 (ja) * 2009-08-31 2013-12-04 豊田合成株式会社 化合物半導体の製造装置、化合物半導体の製造方法及び化合物半導体
JP2014522914A (ja) 2011-08-09 2014-09-08 アプライド マテリアルズ インコーポレイテッド 調整可能なマスク
CN105189812B (zh) * 2013-03-15 2017-10-20 应用材料公司 用于基板的载具
EP2971225B1 (en) * 2013-03-15 2017-02-22 Applied Materials, Inc. Carrier for a substrate and method for carrying a substrate
KR102219198B1 (ko) * 2013-08-02 2021-02-22 어플라이드 머티어리얼스, 인코포레이티드 기판들을 위한 유지 배열, 및 이를 사용하는 장치 및 방법
CN107109619A (zh) * 2014-12-29 2017-08-29 应用材料公司 用于沉积处理期间掩蔽基板的掩蔽布置、用于在基板上的层沉积的沉积设备、和用于清洁掩蔽布置的方法
CN109300835B (zh) * 2017-07-25 2021-04-09 北京北方华创微电子装备有限公司 一种晶片支撑结构、预热腔室和半导体处理设备
CN109338335B (zh) * 2018-10-16 2020-09-08 深圳市华星光电技术有限公司 一种用于化学气相沉淀的暗影框结构
CN112981372B (zh) * 2019-12-12 2024-02-13 Asm Ip私人控股有限公司 衬底支撑板、包括它的衬底处理设备以及衬底处理方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684502A (en) * 1979-12-13 1981-07-09 Fujitsu Ltd Positioning device for plate
JPS6111222Y2 (pl) * 1980-12-19 1986-04-09
US4986007A (en) * 1987-03-25 1991-01-22 Svg Lithography Systems, Inc. Reticle frame assembly
JP2919158B2 (ja) 1992-02-10 1999-07-12 キヤノン株式会社 基板保持装置
US6033480A (en) * 1994-02-23 2000-03-07 Applied Materials, Inc. Wafer edge deposition elimination
US5957651A (en) * 1995-06-08 1999-09-28 Kokusai Electric Co., Ltd. Substrate carrying apparatus
JPH09213772A (ja) * 1996-01-30 1997-08-15 Dainippon Screen Mfg Co Ltd 基板保持装置
JP3386986B2 (ja) * 1997-10-16 2003-03-17 シャープ株式会社 プラズマ処理装置
US6773562B1 (en) 1998-02-20 2004-08-10 Applied Materials, Inc. Shadow frame for substrate processing
JP4101966B2 (ja) 1999-03-24 2008-06-18 三菱電機株式会社 薄膜の成膜装置
JP4416892B2 (ja) 2000-01-04 2010-02-17 株式会社アルバック マスク及び真空処理装置
US6583858B2 (en) * 2000-03-16 2003-06-24 Asml Netherlands B.V. Substrate holder for lithographic apparatus
US7927424B2 (en) * 2002-04-22 2011-04-19 Stmicroelectronics, Inc. Padded clamp ring with edge exclusion for deposition of thick AlCu/AlSiCu/Cu metal alloy layers
US7236233B2 (en) * 2003-10-27 2007-06-26 Asml Netherlands B.V. Assembly of a reticle holder and a reticle
JP2005223217A (ja) 2004-02-06 2005-08-18 Ulvac Japan Ltd 基板位置決め機構および同機構を備えたインライン式真空処理装置
JP4549697B2 (ja) 2004-03-04 2010-09-22 株式会社アルバック 成膜装置及び成膜方法
JP4494832B2 (ja) 2004-03-11 2010-06-30 株式会社アルバック アライメント装置及び成膜装置
PL1998366T3 (pl) 2007-04-27 2010-12-31 Applied Materials Inc Urządzenie do obróbki substratu i sposób pozycjonowania substratu

Also Published As

Publication number Publication date
EP1998366B1 (en) 2010-05-26
KR20080096357A (ko) 2008-10-30
TW200843024A (en) 2008-11-01
US20130055953A1 (en) 2013-03-07
ATE469437T1 (de) 2010-06-15
KR100957885B1 (ko) 2010-05-13
DE602007006772D1 (de) 2010-07-08
JP2008291361A (ja) 2008-12-04
US8323412B2 (en) 2012-12-04
CN101299416A (zh) 2008-11-05
CN101299416B (zh) 2010-09-29
TWI371078B (en) 2012-08-21
US20080295773A1 (en) 2008-12-04
EP1998366A1 (en) 2008-12-03
JP5068216B2 (ja) 2012-11-07

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