NO942489L - Plasmareaktor for en avsetnings- eller etsingsprosess - Google Patents

Plasmareaktor for en avsetnings- eller etsingsprosess

Info

Publication number
NO942489L
NO942489L NO942489A NO942489A NO942489L NO 942489 L NO942489 L NO 942489L NO 942489 A NO942489 A NO 942489A NO 942489 A NO942489 A NO 942489A NO 942489 L NO942489 L NO 942489L
Authority
NO
Norway
Prior art keywords
deposition
etching process
plasma reactor
substrate
antenna
Prior art date
Application number
NO942489A
Other languages
English (en)
Other versions
NO942489D0 (no
Inventor
David Pearson
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cit Alcatel filed Critical Cit Alcatel
Publication of NO942489D0 publication Critical patent/NO942489D0/no
Publication of NO942489L publication Critical patent/NO942489L/no

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Plasma Technology (AREA)

Abstract

En plasmareaktor for en avsetnings- eller etsingsprosess omfatter et evakuert kammer (1) beregnet på å motta et substrat (5) for behandling og som har en innretning (3) for innføring av en gass som skal ionieres, idet plasmaet eksite- res ved hjelp av en antenne (8) matet av en effektgenerator (14) for radiofrekvenser og som omfatter en elektrisk leder (9) med utstrekning i et plan parallelt med substratet som skal beahandles. I dette plan felger antennelederen (9) flere og ikke mindre enn tre baner i vekselvis motsatte retninger fremover (10) og bakover (11).
NO942489A 1993-07-05 1994-07-01 Plasmareaktor for en avsetnings- eller etsingsprosess NO942489L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9308204A FR2707449B1 (fr) 1993-07-05 1993-07-05 Réacteur à plasma pour un procédé de dépôt ou de gravure.

Publications (2)

Publication Number Publication Date
NO942489D0 NO942489D0 (no) 1994-07-01
NO942489L true NO942489L (no) 1995-01-06

Family

ID=9448909

Family Applications (1)

Application Number Title Priority Date Filing Date
NO942489A NO942489L (no) 1993-07-05 1994-07-01 Plasmareaktor for en avsetnings- eller etsingsprosess

Country Status (5)

Country Link
EP (1) EP0633713A1 (no)
JP (1) JPH0773996A (no)
FI (1) FI943184A (no)
FR (1) FR2707449B1 (no)
NO (1) NO942489L (no)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0871795B1 (en) * 1995-06-29 2008-12-31 Lam Research Corporation A scalable helicon wave plasma processing device with a non-cylindrical source chamber
DE19606375A1 (de) * 1996-02-21 1997-08-28 Balzers Prozes Systeme Gmbh Plasmaquelle mit eingekoppelten Whistler- oder Helikonwellen
US5868897A (en) * 1996-07-31 1999-02-09 Toyo Technologies, Inc. Device and method for processing a plasma to alter the surface of a substrate using neutrals
US6085688A (en) 1998-03-27 2000-07-11 Applied Materials, Inc. Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor
RU2196395C1 (ru) * 2001-05-30 2003-01-10 Александров Андрей Федорович Плазменный реактор и устройство для генерации плазмы (варианты)
JP4741845B2 (ja) * 2004-01-13 2011-08-10 株式会社 セルバック 誘導結合プラズマ処理装置
WO2024070562A1 (ja) * 2022-09-30 2024-04-04 東京エレクトロン株式会社 プラズマ処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3958883A (en) * 1974-07-10 1976-05-25 Baird-Atomic, Inc. Radio frequency induced plasma excitation of optical emission spectroscopic samples
US4658153A (en) * 1984-06-18 1987-04-14 Amnon Brosh Planar coil apparatus for providing a frequency output vs. position
EP0379828B1 (en) * 1989-01-25 1995-09-27 International Business Machines Corporation Radio frequency induction/multipole plasma processing tool
GB8905075D0 (en) * 1989-03-06 1989-04-19 Nordiko Ltd Electrode assembly and apparatus
US4990229A (en) * 1989-06-13 1991-02-05 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US4948458A (en) * 1989-08-14 1990-08-14 Lam Research Corporation Method and apparatus for producing magnetically-coupled planar plasma
JPH0775226B2 (ja) * 1990-04-10 1995-08-09 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン プラズマ処理方法及び装置

Also Published As

Publication number Publication date
FR2707449A1 (fr) 1995-01-13
FI943184A0 (fi) 1994-07-01
FR2707449B1 (fr) 1995-08-11
NO942489D0 (no) 1994-07-01
FI943184A (fi) 1995-01-06
EP0633713A1 (fr) 1995-01-11
JPH0773996A (ja) 1995-03-17

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