JP4741845B2 - 誘導結合プラズマ処理装置 - Google Patents
誘導結合プラズマ処理装置 Download PDFInfo
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- JP4741845B2 JP4741845B2 JP2005005662A JP2005005662A JP4741845B2 JP 4741845 B2 JP4741845 B2 JP 4741845B2 JP 2005005662 A JP2005005662 A JP 2005005662A JP 2005005662 A JP2005005662 A JP 2005005662A JP 4741845 B2 JP4741845 B2 JP 4741845B2
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- magnetic field
- forming member
- plasma processing
- inductively coupled
- winding
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- 238000009616 inductively coupled plasma Methods 0.000 title claims description 25
- 238000004804 winding Methods 0.000 claims description 40
- 239000004020 conductor Substances 0.000 claims description 2
- 238000005520 cutting process Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 16
- 238000009826 distribution Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 7
- 230000004907 flux Effects 0.000 description 7
- 238000005530 etching Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Description
図1は本発明の基本構成における誘導結合プラズマ処理装置を模式的に示す正面図であり、図2は前記基本構成における誘導結合プラズマ処理装置の要部を示す斜視図である。なお、図1及び図2において、図15、図18、図21及び図24と同一部分には同一番号を付している。
図5は本発明の実施形態に係る誘導結合プラズマ処理装置の要部を示す斜視図であり、図6はその誘導結合プラズマ処理装置を構成する磁場形成部材の平面図である。なお、図5において図1と同一部分には同一番号を付している。
図12は他の基本構成における誘導結合プラズマ処理装置の要部を示す斜視図であり、図13はその誘導結合プラズマ処理装置を構成する磁場形成部材の平面図である。なお、図12において図1と同一部分には同一番号を付している。
2 整合器
3a、3b、3c 磁場形成部材
4 基板
5 基板支持板
6 チャンバー
9 プラズマ
10、11 巻回部
Claims (1)
- 真空チャンバーと、前記真空チャンバーの外側に設けられた磁場形成部材と、前記磁場形成部材に高周波電力を供給する高周波電源と、前記高周波電源と前記磁場形成部材とに接続された配線の途中に設けられた整合器とを備えた誘導結合プラズマ処理装置であって、
前記磁場形成部材は、長方形の巻回部がその短辺方向に複数並べられるとともに各巻回部における同じ短辺方向側の長辺部分の中間部に分断部を備えた線状導電部を有し、隣り合う巻回部どうしの各巻回部における前記分断部で分断されている両端の片方に、前記隣合う巻回部どうしに逆方向回りに電流が供給されるとともに、前記両端のもう片方を接地端とし、前記隣合う巻回部どうしが発生する磁場の方向を逆にした構成となっていることを特徴とする誘導結合プラズマ処理装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005005662A JP4741845B2 (ja) | 2004-01-13 | 2005-01-12 | 誘導結合プラズマ処理装置 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004004882 | 2004-01-13 | ||
JP2004004882 | 2004-01-13 | ||
JP2005005662A JP4741845B2 (ja) | 2004-01-13 | 2005-01-12 | 誘導結合プラズマ処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005228738A JP2005228738A (ja) | 2005-08-25 |
JP4741845B2 true JP4741845B2 (ja) | 2011-08-10 |
Family
ID=35003252
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2005005662A Active JP4741845B2 (ja) | 2004-01-13 | 2005-01-12 | 誘導結合プラズマ処理装置 |
Country Status (1)
Country | Link |
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JP (1) | JP4741845B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101989524B (zh) * | 2009-08-03 | 2012-09-05 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种阻抗匹配器及等离子体处理设备 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6457600A (en) * | 1987-08-27 | 1989-03-03 | Mitsubishi Electric Corp | Plasma generating device |
FR2707449B1 (fr) * | 1993-07-05 | 1995-08-11 | Cit Alcatel | Réacteur à plasma pour un procédé de dépôt ou de gravure. |
US5589737A (en) * | 1994-12-06 | 1996-12-31 | Lam Research Corporation | Plasma processor for large workpieces |
JP2933507B2 (ja) * | 1995-05-24 | 1999-08-16 | 九州日本電気株式会社 | プラズマエッチング装置 |
JPH10149896A (ja) * | 1996-11-19 | 1998-06-02 | Kokusai Electric Co Ltd | プラズマ処理装置 |
JP2000355771A (ja) * | 1999-06-14 | 2000-12-26 | Canon Inc | 堆積膜形成方法および堆積膜形成装置 |
JP2001271169A (ja) * | 2000-03-27 | 2001-10-02 | Mitsubishi Heavy Ind Ltd | フォーク型電極を有するプラズマ化学蒸着装置 |
JP4867124B2 (ja) * | 2000-05-17 | 2012-02-01 | 株式会社Ihi | プラズマcvd装置及び方法 |
JP5017762B2 (ja) * | 2001-09-27 | 2012-09-05 | 株式会社Ihi | 放電装置、プラズマ処理方法 |
-
2005
- 2005-01-12 JP JP2005005662A patent/JP4741845B2/ja active Active
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Publication number | Publication date |
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JP2005228738A (ja) | 2005-08-25 |
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