NO931912L - Anordning og fremgangsm}te til m}ling av tykkelsen p} et lag av materiale - Google Patents
Anordning og fremgangsm}te til m}ling av tykkelsen p} et lag av materialeInfo
- Publication number
- NO931912L NO931912L NO931912A NO931912A NO931912L NO 931912 L NO931912 L NO 931912L NO 931912 A NO931912 A NO 931912A NO 931912 A NO931912 A NO 931912A NO 931912 L NO931912 L NO 931912L
- Authority
- NO
- Norway
- Prior art keywords
- layer
- thickness
- material layer
- measuring
- deformed
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Abstract
Anordning til måling av tykkelsen av et materiallag med forside og bakside der laget slipper gjennom stråling, omfattende en innretning (70) til deformasjon av materiallaget til en reflekterende kondensator (24) slik at når forsiden av det deformerte materiallag belyses med monokromatisk lys, reflekteres dette fra forside og bakside av det deformerte lag (24) på en måte som tilsvarer materiallagets tykkelse. En innretning (30, 31) mottar den reflekterte monokro- matiske stråling og angir dens egenskaper som deretter sammenlignes med et sett referanseegenskaper svarende til kjente tykkelser slik at en utgang tilsvarer tykkelsen av det målte lag av materiale.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/891,344 US5293214A (en) | 1991-12-06 | 1992-05-29 | Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser |
Publications (2)
Publication Number | Publication Date |
---|---|
NO931912D0 NO931912D0 (no) | 1993-05-26 |
NO931912L true NO931912L (no) | 1993-11-30 |
Family
ID=25398026
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO931912A NO931912L (no) | 1992-05-29 | 1993-05-26 | Anordning og fremgangsm}te til m}ling av tykkelsen p} et lag av materiale |
Country Status (6)
Country | Link |
---|---|
US (1) | US5293214A (no) |
EP (1) | EP0572144A3 (no) |
JP (1) | JPH0723843B2 (no) |
IL (1) | IL105612A (no) |
NO (1) | NO931912L (no) |
TW (1) | TW241335B (no) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5089041A (en) * | 1990-03-22 | 1992-02-18 | The O.M. Scott & Sons Company | Encapsulated slow release fertilizers |
US5291269A (en) * | 1991-12-06 | 1994-03-01 | Hughes Aircraft Company | Apparatus and method for performing thin film layer thickness metrology on a thin film layer having shape deformations and local slope variations |
IL109589A0 (en) * | 1993-05-14 | 1994-08-26 | Hughes Aircraft Co | Apparatus and method for performing high spatial resolution thin film layer thickness metrology |
US5452953A (en) * | 1993-10-12 | 1995-09-26 | Hughes Aircraft Company | Film thickness measurement of structures containing a scattering surface |
US5436725A (en) * | 1993-10-12 | 1995-07-25 | Hughes Aircraft Company | Cofocal optical system for thickness measurements of patterned wafers |
US5555472A (en) * | 1993-12-22 | 1996-09-10 | Integrated Process Equipment Corp. | Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures |
US5555474A (en) * | 1994-12-21 | 1996-09-10 | Integrated Process Equipment Corp. | Automatic rejection of diffraction effects in thin film metrology |
US5619371A (en) * | 1995-03-02 | 1997-04-08 | Southern Research Institute | Confocal optical microscopy system for multi-layer data storage and retrieval |
US5724121A (en) * | 1995-05-12 | 1998-03-03 | Hughes Danbury Optical Systems, Inc. | Mounting member method and apparatus with variable length supports |
FR2736286B1 (fr) * | 1995-07-07 | 1997-08-22 | Kodak Pathe | Dispositif et procede pour optimiser un parametre donne d'un processus d'enduction d'une composition liquide sur un support |
US5619548A (en) * | 1995-08-11 | 1997-04-08 | Oryx Instruments And Materials Corp. | X-ray thickness gauge |
US5729343A (en) * | 1995-11-16 | 1998-03-17 | Nikon Precision Inc. | Film thickness measurement apparatus with tilting stage and method of operation |
US5924058A (en) * | 1997-02-14 | 1999-07-13 | Applied Materials, Inc. | Permanently mounted reference sample for a substrate measurement tool |
US5936254A (en) * | 1997-03-11 | 1999-08-10 | Nikon Research Corporation Of America | Thin film detection method and apparatus |
US7304744B1 (en) | 1998-12-24 | 2007-12-04 | Sharp Kabushiki Kaisha | Apparatus and method for measuring the thickness of a thin film via the intensity of reflected light |
JP3717340B2 (ja) * | 1999-07-27 | 2005-11-16 | シャープ株式会社 | 電子部品製造装置 |
US6822745B2 (en) * | 2000-01-25 | 2004-11-23 | Zygo Corporation | Optical systems for measuring form and geometric dimensions of precision engineered parts |
US6714307B2 (en) | 2001-10-16 | 2004-03-30 | Zygo Corporation | Measurement of complex surface shapes using a spherical wavefront |
JP3928478B2 (ja) * | 2002-05-22 | 2007-06-13 | 株式会社島津製作所 | 膜厚測定方法及び膜厚測定装置 |
US7212291B2 (en) * | 2003-12-18 | 2007-05-01 | Zygo Corporation | Interferometric microscopy using reflective optics for complex surface shapes |
JP4843272B2 (ja) * | 2004-07-31 | 2011-12-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の光学システム |
KR101373511B1 (ko) * | 2006-03-30 | 2014-03-12 | 오르보테크 엘티디. | 연속 범위 각도에 대해 선택가능한 조명을 이용하는 검사 시스템 및 방법 |
KR101011491B1 (ko) * | 2006-11-02 | 2011-01-31 | 도쿄엘렉트론가부시키가이샤 | 미소 구조체의 검사 장치, 미소 구조체의 검사 방법 및 기판 유지 장치 |
US7751064B2 (en) | 2008-01-22 | 2010-07-06 | Zygo Corporation | Interference objective for annular test surfaces |
JP2009258022A (ja) * | 2008-04-18 | 2009-11-05 | Sony Corp | 変位検出装置 |
US9618369B2 (en) * | 2008-08-26 | 2017-04-11 | The University Court Of The University Of Glasgow | Uses of electromagnetic interference patterns |
US20100114532A1 (en) * | 2008-11-03 | 2010-05-06 | Applied Materials, Inc. | Weighted spectrographic monitoring of a substrate during processing |
TWI585880B (zh) * | 2011-11-10 | 2017-06-01 | 應用材料股份有限公司 | 透過雷射繞射測量3d半導體結構之溫度的設備及方法 |
CN104819776B (zh) * | 2015-05-04 | 2017-04-12 | 中国科学院国家天文台南京天文光学技术研究所 | 用于天文观测光谱仪的定标灯系统 |
US10563973B2 (en) * | 2016-03-28 | 2020-02-18 | Kla-Tencor Corporation | All surface film metrology system |
US10923371B2 (en) * | 2016-03-30 | 2021-02-16 | Applied Materials, Inc. | Metrology system for substrate deformation measurement |
EP3346229B1 (en) * | 2017-01-09 | 2022-03-30 | Unity Semiconductor GmbH | Method and assembly for determining the thickness of layers in a sample stack |
CN112129249A (zh) * | 2019-06-25 | 2020-12-25 | 宝山钢铁股份有限公司 | 含有环保涂层的无取向硅钢的膜厚测量方法及测量设备 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5535214A (en) * | 1978-09-04 | 1980-03-12 | Asahi Chem Ind Co Ltd | Method and device for film-thickness measurement making use of infrared-ray interference |
US4932781A (en) * | 1983-11-04 | 1990-06-12 | Canon Kabushiki Kaisha | Gap measuring apparatus using interference fringes of reflected light |
US4787749A (en) * | 1985-11-28 | 1988-11-29 | Canon Kabushiki Kaisha | Method and apparatus for measuring the thickness of a thin film using the spectral reflection factor of the film |
US4725144A (en) * | 1986-02-25 | 1988-02-16 | R & D Associates | Optic element testing method and apparatus |
SU1672213A1 (ru) * | 1988-07-05 | 1991-08-23 | Каунасский Политехнический Институт Им.А.Снечкуса | Способ контрол плоскостности поверхности твердотельной пластины в процессе ее радиационной модификации |
DE3836564A1 (de) * | 1988-10-27 | 1990-05-03 | Zeiss Carl Fa | Verfahren zur pruefung von optischen elementen |
US5042949A (en) * | 1989-03-17 | 1991-08-27 | Greenberg Jeffrey S | Optical profiler for films and substrates |
JPH0351707A (ja) * | 1989-07-19 | 1991-03-06 | Toyota Motor Corp | 曲面液晶セル用ガラス基板の品質判定方法 |
-
1992
- 1992-05-29 US US07/891,344 patent/US5293214A/en not_active Expired - Lifetime
-
1993
- 1993-05-05 IL IL10561293A patent/IL105612A/en not_active IP Right Cessation
- 1993-05-13 EP EP93303721A patent/EP0572144A3/en not_active Withdrawn
- 1993-05-26 NO NO931912A patent/NO931912L/no unknown
- 1993-05-31 JP JP5129704A patent/JPH0723843B2/ja not_active Expired - Fee Related
- 1993-06-10 TW TW082104618A patent/TW241335B/zh active
Also Published As
Publication number | Publication date |
---|---|
EP0572144A2 (en) | 1993-12-01 |
IL105612A0 (en) | 1993-09-22 |
IL105612A (en) | 1995-07-31 |
US5293214A (en) | 1994-03-08 |
JPH0723843B2 (ja) | 1995-03-15 |
TW241335B (no) | 1995-02-21 |
NO931912D0 (no) | 1993-05-26 |
JPH0642923A (ja) | 1994-02-18 |
EP0572144A3 (en) | 1995-05-10 |
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