NO762006L - - Google Patents
Info
- Publication number
- NO762006L NO762006L NO762006A NO762006A NO762006L NO 762006 L NO762006 L NO 762006L NO 762006 A NO762006 A NO 762006A NO 762006 A NO762006 A NO 762006A NO 762006 L NO762006 L NO 762006L
- Authority
- NO
- Norway
- Prior art keywords
- photosensitive
- phase
- structure according
- water
- exposure
- Prior art date
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 33
- 239000011159 matrix material Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 27
- 238000007639 printing Methods 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 23
- 239000002904 solvent Substances 0.000 claims description 19
- 239000000839 emulsion Substances 0.000 claims description 17
- 150000008049 diazo compounds Chemical class 0.000 claims description 14
- 239000006185 dispersion Substances 0.000 claims description 13
- 229920001577 copolymer Polymers 0.000 claims description 11
- 239000002356 single layer Substances 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 6
- 229920002689 polyvinyl acetate Polymers 0.000 claims description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 5
- 239000011118 polyvinyl acetate Substances 0.000 claims description 5
- -1 silver halide Chemical class 0.000 claims description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- 239000010410 layer Substances 0.000 claims description 4
- 108010010803 Gelatin Proteins 0.000 claims description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- 150000001728 carbonyl compounds Chemical class 0.000 claims description 3
- 239000007859 condensation product Substances 0.000 claims description 3
- 229920000159 gelatin Polymers 0.000 claims description 3
- 239000008273 gelatin Substances 0.000 claims description 3
- 235000019322 gelatine Nutrition 0.000 claims description 3
- 235000011852 gelatine desserts Nutrition 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 2
- 239000005977 Ethylene Substances 0.000 claims description 2
- 239000000975 dye Substances 0.000 claims description 2
- 230000005670 electromagnetic radiation Effects 0.000 claims description 2
- 229920001038 ethylene copolymer Polymers 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 150000001242 acetic acid derivatives Chemical class 0.000 claims 1
- 229920006243 acrylic copolymer Polymers 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- 238000009833 condensation Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 239000000047 product Substances 0.000 claims 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 13
- 239000000976 ink Substances 0.000 description 12
- 238000011161 development Methods 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 230000035699 permeability Effects 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000007605 air drying Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000007645 offset printing Methods 0.000 description 5
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 5
- 230000001680 brushing effect Effects 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 229910052724 xenon Inorganic materials 0.000 description 4
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 230000016507 interphase Effects 0.000 description 2
- 238000010409 ironing Methods 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000005201 scrubbing Methods 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical group CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 208000005812 Colloid Cysts Diseases 0.000 description 1
- 235000009161 Espostoa lanata Nutrition 0.000 description 1
- 240000001624 Espostoa lanata Species 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 239000003974 emollient agent Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229910001867 inorganic solvent Inorganic materials 0.000 description 1
- 239000003049 inorganic solvent Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58833475A | 1975-06-19 | 1975-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO762006L true NO762006L (it) | 1976-12-21 |
Family
ID=24353419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO762006A NO762006L (it) | 1975-06-19 | 1976-06-10 |
Country Status (12)
| Country | Link |
|---|---|
| JP (1) | JPS5936731B2 (it) |
| BE (1) | BE841797A (it) |
| CA (1) | CA1091969A (it) |
| CH (1) | CH633893A5 (it) |
| DE (1) | DE2626066A1 (it) |
| DK (1) | DK232276A (it) |
| FR (1) | FR2315110A1 (it) |
| GB (1) | GB1548764A (it) |
| IT (1) | IT1061234B (it) |
| NL (1) | NL7604774A (it) |
| NO (1) | NO762006L (it) |
| SE (1) | SE422847B (it) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52154626A (en) * | 1976-06-18 | 1977-12-22 | Fuji Photo Film Co Ltd | Silver halide light sensitive material |
| JPS52154627A (en) * | 1976-06-18 | 1977-12-22 | Fuji Photo Film Co Ltd | Silver halide light sensitive material |
| JPS5518621A (en) * | 1978-07-26 | 1980-02-08 | Fuji Photo Film Co Ltd | Photosensitive lithographic printing plate |
| DE2834059A1 (de) * | 1978-08-03 | 1980-02-14 | Hoechst Ag | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
| JPS5823026A (ja) * | 1981-08-04 | 1983-02-10 | Nippon Paint Co Ltd | 水現像性平版印刷版材 |
| JPS58174939A (ja) * | 1982-03-18 | 1983-10-14 | Konishiroku Photo Ind Co Ltd | 画像形成材料 |
| US4551415A (en) * | 1982-04-22 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
| US4668604A (en) * | 1982-04-22 | 1987-05-26 | E.I. Du Pont De Nemours And Company | Positive-working photosensitive elements containing crosslinked beads and process of use |
| US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
| DE3328019A1 (de) * | 1982-09-21 | 1984-03-22 | Polychrome Corp., 10702 Yonkers, N.Y. | Mit wasser entwickelbare druckplatte |
| GB2273366B (en) * | 1992-11-18 | 1996-03-27 | Du Pont | Forming images on radiation-sensitive plates |
| US5688627A (en) * | 1996-07-02 | 1997-11-18 | Precision Lithograining Corp. | Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3382069A (en) * | 1964-06-18 | 1968-05-07 | Azoplate Corp | Planographic printing plate |
| GB1469941A (en) * | 1973-04-10 | 1977-04-06 | Andrews Paper & Chem Co Inc | Diazotype reproduction layer |
-
1976
- 1976-04-02 CA CA249,489A patent/CA1091969A/en not_active Expired
- 1976-04-12 GB GB14886/76A patent/GB1548764A/en not_active Expired
- 1976-04-28 CH CH534076A patent/CH633893A5/de not_active IP Right Cessation
- 1976-05-03 FR FR7613143A patent/FR2315110A1/fr active Granted
- 1976-05-03 IT IT49301/76A patent/IT1061234B/it active
- 1976-05-04 SE SE7605083A patent/SE422847B/xx unknown
- 1976-05-05 NL NL7604774A patent/NL7604774A/xx not_active Application Discontinuation
- 1976-05-13 BE BE167002A patent/BE841797A/xx not_active IP Right Cessation
- 1976-05-26 DK DK232276A patent/DK232276A/da not_active Application Discontinuation
- 1976-06-08 JP JP51067029A patent/JPS5936731B2/ja not_active Expired
- 1976-06-10 DE DE19762626066 patent/DE2626066A1/de not_active Withdrawn
- 1976-06-10 NO NO762006A patent/NO762006L/no unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5936731B2 (ja) | 1984-09-05 |
| JPS522520A (en) | 1977-01-10 |
| FR2315110A1 (fr) | 1977-01-14 |
| DE2626066A1 (de) | 1977-01-20 |
| BE841797A (fr) | 1976-09-01 |
| NL7604774A (nl) | 1976-12-21 |
| IT1061234B (it) | 1983-02-28 |
| FR2315110B1 (it) | 1981-11-13 |
| DK232276A (da) | 1976-12-20 |
| CA1091969A (en) | 1980-12-23 |
| SE422847B (sv) | 1982-03-29 |
| GB1548764A (en) | 1979-07-18 |
| SE7605083L (sv) | 1976-12-20 |
| CH633893A5 (en) | 1982-12-31 |
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