NO743464L - - Google Patents

Info

Publication number
NO743464L
NO743464L NO743464A NO743464A NO743464L NO 743464 L NO743464 L NO 743464L NO 743464 A NO743464 A NO 743464A NO 743464 A NO743464 A NO 743464A NO 743464 L NO743464 L NO 743464L
Authority
NO
Norway
Prior art keywords
mixture
water
plate
stated
soluble
Prior art date
Application number
NO743464A
Other languages
English (en)
Norwegian (no)
Inventor
D Coupe
D L Cohen
J G Allen
Original Assignee
Ici Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ici Ltd filed Critical Ici Ltd
Publication of NO743464L publication Critical patent/NO743464L/no

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
NO743464A 1973-09-26 1974-09-25 NO743464L (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB45090/73A GB1489567A (en) 1973-09-26 1973-09-26 Photopolymerisable compositions

Publications (1)

Publication Number Publication Date
NO743464L true NO743464L (xx) 1975-04-28

Family

ID=10435847

Family Applications (1)

Application Number Title Priority Date Filing Date
NO743464A NO743464L (xx) 1973-09-26 1974-09-25

Country Status (19)

Country Link
JP (1) JPS5077104A (xx)
AT (1) AT344202B (xx)
BE (1) BE820404A (xx)
CA (1) CA1064755A (xx)
DE (1) DE2446056A1 (xx)
DK (1) DK504374A (xx)
ES (1) ES430442A1 (xx)
FI (1) FI277574A (xx)
FR (1) FR2244793B1 (xx)
GB (1) GB1489567A (xx)
IE (1) IE40031B1 (xx)
IT (1) IT1030620B (xx)
LU (1) LU71000A1 (xx)
MC (1) MC1037A1 (xx)
NL (1) NL7412653A (xx)
NO (1) NO743464L (xx)
PL (1) PL102117B1 (xx)
SE (1) SE403913B (xx)
ZA (1) ZA746059B (xx)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54147031A (en) * 1978-05-11 1979-11-16 Toray Industries Photosensitive material
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
DE3441787A1 (de) * 1984-03-17 1985-09-19 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH0760264B2 (ja) * 1984-06-29 1995-06-28 日本合成化学工業株式会社 感光性樹脂組成物
DE3447356A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement

Also Published As

Publication number Publication date
GB1489567A (en) 1977-10-19
DK504374A (xx) 1975-06-09
FR2244793B1 (xx) 1978-07-13
FR2244793A1 (xx) 1975-04-18
DE2446056A1 (de) 1975-04-03
PL102117B1 (pl) 1979-03-31
IE40031L (en) 1975-03-26
MC1037A1 (fr) 1975-05-30
LU71000A1 (xx) 1976-02-04
CA1064755A (en) 1979-10-23
ATA774674A (de) 1977-11-15
IT1030620B (it) 1979-04-10
SE7412063L (xx) 1975-03-27
IE40031B1 (en) 1979-02-28
ES430442A1 (es) 1976-10-16
JPS5077104A (xx) 1975-06-24
AT344202B (de) 1978-07-10
ZA746059B (en) 1976-04-28
NL7412653A (nl) 1975-04-01
AU7368674A (en) 1976-04-01
SE403913B (sv) 1978-09-11
FI277574A (xx) 1975-03-27
BE820404A (fr) 1975-03-26

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