JPS5077104A - - Google Patents

Info

Publication number
JPS5077104A
JPS5077104A JP49111395A JP11139574A JPS5077104A JP S5077104 A JPS5077104 A JP S5077104A JP 49111395 A JP49111395 A JP 49111395A JP 11139574 A JP11139574 A JP 11139574A JP S5077104 A JPS5077104 A JP S5077104A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49111395A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5077104A publication Critical patent/JPS5077104A/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
JP49111395A 1973-09-26 1974-09-26 Pending JPS5077104A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB45090/73A GB1489567A (en) 1973-09-26 1973-09-26 Photopolymerisable compositions

Publications (1)

Publication Number Publication Date
JPS5077104A true JPS5077104A (xx) 1975-06-24

Family

ID=10435847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49111395A Pending JPS5077104A (xx) 1973-09-26 1974-09-26

Country Status (19)

Country Link
JP (1) JPS5077104A (xx)
AT (1) AT344202B (xx)
BE (1) BE820404A (xx)
CA (1) CA1064755A (xx)
DE (1) DE2446056A1 (xx)
DK (1) DK504374A (xx)
ES (1) ES430442A1 (xx)
FI (1) FI277574A (xx)
FR (1) FR2244793B1 (xx)
GB (1) GB1489567A (xx)
IE (1) IE40031B1 (xx)
IT (1) IT1030620B (xx)
LU (1) LU71000A1 (xx)
MC (1) MC1037A1 (xx)
NL (1) NL7412653A (xx)
NO (1) NO743464L (xx)
PL (1) PL102117B1 (xx)
SE (1) SE403913B (xx)
ZA (1) ZA746059B (xx)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54147031A (en) * 1978-05-11 1979-11-16 Toray Industries Photosensitive material
JPS6114631A (ja) * 1984-06-29 1986-01-22 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
DE3441787A1 (de) * 1984-03-17 1985-09-19 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3447356A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54147031A (en) * 1978-05-11 1979-11-16 Toray Industries Photosensitive material
JPS6249612B2 (xx) * 1978-05-11 1987-10-20 Toray Industries
JPS6114631A (ja) * 1984-06-29 1986-01-22 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物

Also Published As

Publication number Publication date
GB1489567A (en) 1977-10-19
DK504374A (xx) 1975-06-09
FR2244793B1 (xx) 1978-07-13
FR2244793A1 (xx) 1975-04-18
DE2446056A1 (de) 1975-04-03
PL102117B1 (pl) 1979-03-31
IE40031L (en) 1975-03-26
MC1037A1 (fr) 1975-05-30
NO743464L (xx) 1975-04-28
LU71000A1 (xx) 1976-02-04
CA1064755A (en) 1979-10-23
ATA774674A (de) 1977-11-15
IT1030620B (it) 1979-04-10
SE7412063L (xx) 1975-03-27
IE40031B1 (en) 1979-02-28
ES430442A1 (es) 1976-10-16
AT344202B (de) 1978-07-10
ZA746059B (en) 1976-04-28
NL7412653A (nl) 1975-04-01
AU7368674A (en) 1976-04-01
SE403913B (sv) 1978-09-11
FI277574A (xx) 1975-03-27
BE820404A (fr) 1975-03-26

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