NO20073032L - Fremgangsmate for rensing av silisium samt silisium - Google Patents

Fremgangsmate for rensing av silisium samt silisium

Info

Publication number
NO20073032L
NO20073032L NO20073032A NO20073032A NO20073032L NO 20073032 L NO20073032 L NO 20073032L NO 20073032 A NO20073032 A NO 20073032A NO 20073032 A NO20073032 A NO 20073032A NO 20073032 L NO20073032 L NO 20073032L
Authority
NO
Norway
Prior art keywords
silicon
well
procedure
cleaning
gas
Prior art date
Application number
NO20073032A
Other languages
English (en)
Inventor
Toshiaki Fukuyama
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Publication of NO20073032L publication Critical patent/NO20073032L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

Det tilveiebringes en fremgangsmåte for rensing av silisium omfattende blåsing av en behandlingsgass generert ved omsetning av karbon (20,21) med en oksidert gass inn i et smeltet silisium (8), såvel som det silisium som fremstilles ved metoden. Karbon (20,21) kan holdes i beholderen (14), den oksiderte gass kan føres gjennom beholderen (14) og oksidasjonsgassen kan inneholde minst én av vanndamp og hydrogen.
NO20073032A 2004-12-09 2007-06-14 Fremgangsmate for rensing av silisium samt silisium NO20073032L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004357055A JP4632769B2 (ja) 2004-12-09 2004-12-09 シリコンの精製方法
PCT/JP2005/018423 WO2006061944A1 (ja) 2004-12-09 2005-10-05 シリコンの精製方法およびシリコン

Publications (1)

Publication Number Publication Date
NO20073032L true NO20073032L (no) 2007-08-28

Family

ID=36577774

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20073032A NO20073032L (no) 2004-12-09 2007-06-14 Fremgangsmate for rensing av silisium samt silisium

Country Status (5)

Country Link
US (1) US7625541B2 (no)
JP (1) JP4632769B2 (no)
CN (1) CN101076494B (no)
NO (1) NO20073032L (no)
WO (1) WO2006061944A1 (no)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4671871B2 (ja) * 2006-01-18 2011-04-20 新日鉄マテリアルズ株式会社 シリコンの精錬方法
US7682585B2 (en) 2006-04-25 2010-03-23 The Arizona Board Of Regents On Behalf Of The University Of Arizona Silicon refining process
EP2072464A4 (en) * 2006-09-29 2010-09-01 Shinetsu Chemical Co PROCESS FOR CLEANING SILICON, SILICON AND SOLAR CELL
CN100595352C (zh) * 2007-07-17 2010-03-24 佳科太阳能硅(龙岩)有限公司 太阳能级多晶硅大锭的制备方法
JP4900600B2 (ja) * 2007-08-31 2012-03-21 信越化学工業株式会社 高純度シリコンの製造方法
KR101136929B1 (ko) * 2009-09-30 2012-04-20 주식회사 인솔텍 다결정 실리콘 잉곳 제조용 가스 주입장치
KR20130040795A (ko) * 2010-03-01 2013-04-24 다우 코닝 실리시오 두 브라질 인더스티리아 에 코메르시오 엘티디에이. 알루미늄-함유 규소를 정련시키는 방법
CN103154288A (zh) 2010-05-20 2013-06-12 道康宁公司 制备铝-硅合金的方法和系统
TWI498282B (zh) * 2012-06-25 2015-09-01 Silicor Materials Inc 適用在用於純化矽之定向凝固之助熔劑組合物及其方法
CN103014853B (zh) * 2013-01-11 2015-08-26 天津英利新能源有限公司 多晶硅铸锭装置
FR3021407B1 (fr) * 2014-05-23 2016-07-01 Commissariat Energie Atomique Dispositif d'analyse d'un metal en fusion oxydable par technique libs
RU2766149C2 (ru) 2015-10-09 2022-02-08 МИЛУОКИ СИЛИКОН, ЭлЭлСи Очищенный кремний, а также устройства и системы для его производства
CN105540593B (zh) * 2015-12-31 2017-12-19 厦门大学 一种活化渣剂除硼的方法及其装置
AU2020404693B2 (en) * 2019-12-19 2024-01-11 Ebara Environmental Plant Co., Ltd. Gasification furnace operating method and gasification furnace
CN117088713A (zh) * 2021-08-10 2023-11-21 希科半导体科技(苏州)有限公司 一种修复碳化硅衬底的装置和方法
CN115196642B (zh) * 2022-07-04 2023-09-26 柯瑞林 一种二氧化硅的提纯方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3201312C2 (de) * 1982-01-18 1983-12-22 Skw Trostberg Ag, 8223 Trostberg Verfahren zur Reinigung von Silicium
JP3205352B2 (ja) 1990-05-30 2001-09-04 川崎製鉄株式会社 シリコン精製方法及び装置
JP2905353B2 (ja) 1993-02-04 1999-06-14 川崎製鉄株式会社 金属シリコンの精製方法
NO180532C (no) 1994-09-01 1997-05-07 Elkem Materials Fremgangsmåte for fjerning av forurensninger fra smeltet silisium
US5972107A (en) 1997-08-28 1999-10-26 Crystal Systems, Inc. Method for purifying silicon
JP4264166B2 (ja) * 1999-08-20 2009-05-13 昭和電工株式会社 ケイ素の精製方法
AU2003208106A1 (en) * 2002-02-04 2003-09-02 Sharp Kabushiki Kaisha Silicon purifying method, slag for purifying silicon, and purified silicon
JP4073864B2 (ja) * 2003-02-10 2008-04-09 シャープ株式会社 シリコンの精製方法およびシリコン

Also Published As

Publication number Publication date
WO2006061944A1 (ja) 2006-06-15
US7625541B2 (en) 2009-12-01
CN101076494B (zh) 2011-07-27
CN101076494A (zh) 2007-11-21
US20070297968A1 (en) 2007-12-27
JP2006160575A (ja) 2006-06-22
JP4632769B2 (ja) 2011-02-16

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