NO128652B - - Google Patents
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- Publication number
- NO128652B NO128652B NO01118/70A NO111870A NO128652B NO 128652 B NO128652 B NO 128652B NO 01118/70 A NO01118/70 A NO 01118/70A NO 111870 A NO111870 A NO 111870A NO 128652 B NO128652 B NO 128652B
- Authority
- NO
- Norway
- Prior art keywords
- silicon dioxide
- plasma
- liquid
- hydrocarbon
- silicon
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 71
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 39
- 235000012239 silicon dioxide Nutrition 0.000 claims description 36
- 239000000377 silicon dioxide Substances 0.000 claims description 29
- 238000006243 chemical reaction Methods 0.000 claims description 22
- 239000007788 liquid Substances 0.000 claims description 21
- 229930195733 hydrocarbon Natural products 0.000 claims description 20
- 150000002430 hydrocarbons Chemical class 0.000 claims description 20
- 239000004215 Carbon black (E152) Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000000087 stabilizing effect Effects 0.000 claims description 5
- 239000012159 carrier gas Substances 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 238000010405 reoxidation reaction Methods 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 11
- 239000001257 hydrogen Substances 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000000843 powder Substances 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 229910001868 water Inorganic materials 0.000 description 5
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 4
- 238000005219 brazing Methods 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- 239000001569 carbon dioxide Substances 0.000 description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 239000006004 Quartz sand Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- -1 but also a pure Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000295 fuel oil Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 230000001603 reducing effect Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000004939 coking Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000010779 crude oil Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005087 graphitization Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011872 intimate mixture Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J15/00—Chemical processes in general for reacting gaseous media with non-particulate solids, e.g. sheet material; Apparatus specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/182—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by reduction of a siliceous material, e.g. with a carbonaceous reducing agent and subsequent oxidation of the silicon monoxide formed
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
- C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
- C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
- C22C19/053—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 30% but less than 40%
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3405—Arrangements for stabilising or constricting the arc, e.g. by an additional gas flow
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3452—Supplementary electrodes between cathode and anode, e.g. cascade
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder or liquid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Composite Materials (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Silicon Compounds (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH482669A CH519438A (de) | 1969-03-31 | 1969-03-31 | Verfahren zur Herstellung von feinstteiligem Siliciummonoxid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO128652B true NO128652B (en:Method) | 1973-12-27 |
Family
ID=4283210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO01118/70A NO128652B (en:Method) | 1969-03-31 | 1970-03-24 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US3649189A (en:Method) |
| BE (1) | BE747277A (en:Method) |
| CA (1) | CA930521A (en:Method) |
| CH (2) | CH519438A (en:Method) |
| FR (1) | FR2039121A5 (en:Method) |
| GB (1) | GB1296891A (en:Method) |
| NL (1) | NL7003699A (en:Method) |
| NO (1) | NO128652B (en:Method) |
| SE (1) | SE359076B (en:Method) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3899573A (en) * | 1971-10-18 | 1975-08-12 | Exxon Research Engineering Co | Production of fine powders |
| US3925177A (en) * | 1973-01-30 | 1975-12-09 | Boeing Co | Method and apparatus for heating solid and liquid particulate material to vaporize or disassociate the material |
| US3856918A (en) * | 1973-03-28 | 1974-12-24 | American Cyanamid Co | Process for the beneficiation of titaniferous ores utilizing hot wall continuous plasma reactor |
| US4206190A (en) * | 1974-03-11 | 1980-06-03 | Westinghouse Electric Corp. | Plasma arc production of silicon nitride |
| US4054641A (en) * | 1976-05-07 | 1977-10-18 | John S. Pennish | Method for making vitreous silica |
| US4176166A (en) * | 1977-05-25 | 1979-11-27 | John S. Pennish | Process for producing liquid silicon |
| US4272488A (en) * | 1977-05-25 | 1981-06-09 | John S. Pennish | Apparatus for producing and casting liquid silicon |
| US4335080A (en) | 1977-08-01 | 1982-06-15 | Thermo Electron Corporation | Apparatus for producing selective particle sized oxide |
| US4193851A (en) * | 1978-07-21 | 1980-03-18 | Ppg Industries, Inc. | Silica gels and their formation by electrolysis of silicate solutions |
| GB2116810B (en) * | 1982-02-15 | 1986-01-08 | Ceskoslovenska Akademie Ved | Method for stabilization of low-temperature plasma of an arc burner, and the arc burner for carrying out said method |
| US5647279A (en) * | 1992-09-05 | 1997-07-15 | Heidelberger Druckmaschinen Ag | Printing machine roller and method of production thereof |
| JP3409294B2 (ja) * | 1996-01-25 | 2003-05-26 | 株式会社豊田中央研究所 | 酸化物粉末の製造方法 |
| US6495114B1 (en) | 1999-07-22 | 2002-12-17 | Fina Research, S.A. | Production of silica particles |
| FR2916193B1 (fr) * | 2007-05-18 | 2009-08-07 | Commissariat Energie Atomique | Synthese par pyrolyse laser de nanocristaux de silicium. |
| CN111453737B (zh) * | 2019-01-22 | 2021-08-03 | 成都博达爱福科技有限公司 | 一种由mq硅树脂制备氧化亚硅的方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1180723B (de) * | 1963-06-28 | 1964-11-05 | Degussa | Verfahren und Vorrichtung zur Herstellung von feinteiliger amorpher Kieselsaeure |
-
1969
- 1969-03-31 CH CH482669A patent/CH519438A/de not_active IP Right Cessation
- 1969-03-31 CH CH1468371A patent/CH519439A/de not_active IP Right Cessation
-
1970
- 1970-03-12 BE BE747277D patent/BE747277A/xx unknown
- 1970-03-12 US US18902A patent/US3649189A/en not_active Expired - Lifetime
- 1970-03-13 GB GB1296891D patent/GB1296891A/en not_active Expired
- 1970-03-16 NL NL7003699A patent/NL7003699A/xx unknown
- 1970-03-18 CA CA077713A patent/CA930521A/en not_active Expired
- 1970-03-24 NO NO01118/70A patent/NO128652B/no unknown
- 1970-03-31 SE SE04422/70A patent/SE359076B/xx unknown
- 1970-03-31 FR FR7011496A patent/FR2039121A5/fr not_active Expired
-
1971
- 1971-12-06 US US00205166A patent/US3733387A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| SE359076B (en:Method) | 1973-08-20 |
| BE747277A (fr) | 1970-08-17 |
| CH519439A (de) | 1972-02-29 |
| US3649189A (en) | 1972-03-14 |
| CH519438A (de) | 1972-02-29 |
| NL7003699A (en:Method) | 1970-10-02 |
| FR2039121A5 (en:Method) | 1971-01-15 |
| DE2008029B2 (de) | 1976-12-23 |
| DE2008029A1 (de) | 1970-10-15 |
| CA930521A (en) | 1973-07-24 |
| US3733387A (en) | 1973-05-15 |
| GB1296891A (en:Method) | 1972-11-22 |
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