CH519438A - Verfahren zur Herstellung von feinstteiligem Siliciummonoxid - Google Patents

Verfahren zur Herstellung von feinstteiligem Siliciummonoxid

Info

Publication number
CH519438A
CH519438A CH482669A CH482669A CH519438A CH 519438 A CH519438 A CH 519438A CH 482669 A CH482669 A CH 482669A CH 482669 A CH482669 A CH 482669A CH 519438 A CH519438 A CH 519438A
Authority
CH
Switzerland
Prior art keywords
production
finely divided
silicon monoxide
divided silicon
monoxide
Prior art date
Application number
CH482669A
Other languages
English (en)
Inventor
Tibor Dipl Ing Kugler
Jakob Dr Silbiger
Original Assignee
Lonza Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lonza Ag filed Critical Lonza Ag
Priority to CH482669A priority Critical patent/CH519438A/de
Priority to CH1468371A priority patent/CH519439A/de
Priority to DE19702008029 priority patent/DE2008029C3/de
Priority to BE747277D priority patent/BE747277A/xx
Priority to US18902A priority patent/US3649189A/en
Priority to GB1296891D priority patent/GB1296891A/en
Priority to NL7003699A priority patent/NL7003699A/xx
Priority to CA077713A priority patent/CA930521A/en
Priority to NO01118/70A priority patent/NO128652B/no
Priority to SE04422/70A priority patent/SE359076B/xx
Priority to FR7011496A priority patent/FR2039121A5/fr
Priority to US00205250A priority patent/US3817711A/en
Priority to US00205166A priority patent/US3733387A/en
Publication of CH519438A publication Critical patent/CH519438A/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J15/00—Chemical processes in general for reacting gaseous media with non-particulate solids, e.g. sheet material; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/182—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by reduction of a siliceous material, e.g. with a carbonaceous reducing agent and subsequent oxidation of the silicon monoxide formed
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C22C19/05—Alloys based on nickel or cobalt based on nickel with chromium
    • C22C19/051—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W
    • C22C19/053—Alloys based on nickel or cobalt based on nickel with chromium and Mo or W with the maximum Cr content being at least 30% but less than 40%
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3405—Arrangements for stabilising or constricting the arc, e.g. by an additional gas flow
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3452—Supplementary electrodes between cathode and anode, e.g. cascade

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
CH482669A 1969-03-31 1969-03-31 Verfahren zur Herstellung von feinstteiligem Siliciummonoxid CH519438A (de)

Priority Applications (13)

Application Number Priority Date Filing Date Title
CH482669A CH519438A (de) 1969-03-31 1969-03-31 Verfahren zur Herstellung von feinstteiligem Siliciummonoxid
CH1468371A CH519439A (de) 1969-03-31 1969-03-31 Verfahren zur Herstellung von feinstteiligem Siliciumdioxid
DE19702008029 DE2008029C3 (de) 1969-03-31 1970-02-20 Verfahren zur Herstellung von feinstteiligen Siliciumoxiden
BE747277D BE747277A (fr) 1969-03-31 1970-03-12 Procede de preparation d'oxydes de silicium en tres fines particules
US18902A US3649189A (en) 1969-03-31 1970-03-12 Preparation of finely particulate silicon oxides
GB1296891D GB1296891A (de) 1969-03-31 1970-03-13
NL7003699A NL7003699A (de) 1969-03-31 1970-03-16
CA077713A CA930521A (en) 1969-03-31 1970-03-18 Preparation of finely particulate silicon oxides
NO01118/70A NO128652B (de) 1969-03-31 1970-03-24
SE04422/70A SE359076B (de) 1969-03-31 1970-03-31
FR7011496A FR2039121A5 (de) 1969-03-31 1970-03-31
US00205250A US3817711A (en) 1969-03-31 1971-12-06 Apparatus for preparation of finely particulate silicon oxides
US00205166A US3733387A (en) 1969-03-31 1971-12-06 Preparation of finely particulate silicon dioxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH482669A CH519438A (de) 1969-03-31 1969-03-31 Verfahren zur Herstellung von feinstteiligem Siliciummonoxid

Publications (1)

Publication Number Publication Date
CH519438A true CH519438A (de) 1972-02-29

Family

ID=4283210

Family Applications (2)

Application Number Title Priority Date Filing Date
CH482669A CH519438A (de) 1969-03-31 1969-03-31 Verfahren zur Herstellung von feinstteiligem Siliciummonoxid
CH1468371A CH519439A (de) 1969-03-31 1969-03-31 Verfahren zur Herstellung von feinstteiligem Siliciumdioxid

Family Applications After (1)

Application Number Title Priority Date Filing Date
CH1468371A CH519439A (de) 1969-03-31 1969-03-31 Verfahren zur Herstellung von feinstteiligem Siliciumdioxid

Country Status (9)

Country Link
US (2) US3649189A (de)
BE (1) BE747277A (de)
CA (1) CA930521A (de)
CH (2) CH519438A (de)
FR (1) FR2039121A5 (de)
GB (1) GB1296891A (de)
NL (1) NL7003699A (de)
NO (1) NO128652B (de)
SE (1) SE359076B (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3899573A (en) * 1971-10-18 1975-08-12 Exxon Research Engineering Co Production of fine powders
US3925177A (en) * 1973-01-30 1975-12-09 Boeing Co Method and apparatus for heating solid and liquid particulate material to vaporize or disassociate the material
US3856918A (en) * 1973-03-28 1974-12-24 American Cyanamid Co Process for the beneficiation of titaniferous ores utilizing hot wall continuous plasma reactor
US4206190A (en) * 1974-03-11 1980-06-03 Westinghouse Electric Corp. Plasma arc production of silicon nitride
US4054641A (en) * 1976-05-07 1977-10-18 John S. Pennish Method for making vitreous silica
US4176166A (en) * 1977-05-25 1979-11-27 John S. Pennish Process for producing liquid silicon
US4272488A (en) * 1977-05-25 1981-06-09 John S. Pennish Apparatus for producing and casting liquid silicon
US4335080A (en) 1977-08-01 1982-06-15 Thermo Electron Corporation Apparatus for producing selective particle sized oxide
US4193851A (en) * 1978-07-21 1980-03-18 Ppg Industries, Inc. Silica gels and their formation by electrolysis of silicate solutions
DE3304790A1 (de) * 1982-02-15 1983-09-01 Československá akademie věd, Praha Verfahren zur stabilisierung des niedertemperatur-plasmas eines lichtbogenbrenners und lichtbogenbrenner zu seiner durchfuehrung
US5647279A (en) * 1992-09-05 1997-07-15 Heidelberger Druckmaschinen Ag Printing machine roller and method of production thereof
JP3409294B2 (ja) * 1996-01-25 2003-05-26 株式会社豊田中央研究所 酸化物粉末の製造方法
US6495114B1 (en) 1999-07-22 2002-12-17 Fina Research, S.A. Production of silica particles
FR2916193B1 (fr) * 2007-05-18 2009-08-07 Commissariat Energie Atomique Synthese par pyrolyse laser de nanocristaux de silicium.
CN111453737B (zh) * 2019-01-22 2021-08-03 成都博达爱福科技有限公司 一种由mq硅树脂制备氧化亚硅的方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1180723B (de) * 1963-06-28 1964-11-05 Degussa Verfahren und Vorrichtung zur Herstellung von feinteiliger amorpher Kieselsaeure

Also Published As

Publication number Publication date
BE747277A (fr) 1970-08-17
GB1296891A (de) 1972-11-22
CH519439A (de) 1972-02-29
SE359076B (de) 1973-08-20
US3649189A (en) 1972-03-14
NL7003699A (de) 1970-10-02
CA930521A (en) 1973-07-24
US3733387A (en) 1973-05-15
FR2039121A5 (de) 1971-01-15
DE2008029B2 (de) 1976-12-23
NO128652B (de) 1973-12-27
DE2008029A1 (de) 1970-10-15

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