NL8500310A - Kruisvelddiode spettertrefplaatsamenstel en werkwijze. - Google Patents

Kruisvelddiode spettertrefplaatsamenstel en werkwijze. Download PDF

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Publication number
NL8500310A
NL8500310A NL8500310A NL8500310A NL8500310A NL 8500310 A NL8500310 A NL 8500310A NL 8500310 A NL8500310 A NL 8500310A NL 8500310 A NL8500310 A NL 8500310A NL 8500310 A NL8500310 A NL 8500310A
Authority
NL
Netherlands
Prior art keywords
target
selected surface
walls
field
ion
Prior art date
Application number
NL8500310A
Other languages
English (en)
Dutch (nl)
Original Assignee
Fournier Paul R
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fournier Paul R filed Critical Fournier Paul R
Publication of NL8500310A publication Critical patent/NL8500310A/nl

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3452—Magnet distribution
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
NL8500310A 1984-02-06 1985-02-05 Kruisvelddiode spettertrefplaatsamenstel en werkwijze. NL8500310A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57701684 1984-02-06
US06/577,016 US4486287A (en) 1984-02-06 1984-02-06 Cross-field diode sputtering target assembly

Publications (1)

Publication Number Publication Date
NL8500310A true NL8500310A (nl) 1985-09-02

Family

ID=24306937

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8500310A NL8500310A (nl) 1984-02-06 1985-02-05 Kruisvelddiode spettertrefplaatsamenstel en werkwijze.

Country Status (5)

Country Link
US (1) US4486287A (ja)
JP (1) JPS60194072A (ja)
DE (1) DE3503693A1 (ja)
GB (1) GB2153853B (ja)
NL (1) NL8500310A (ja)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3527626A1 (de) * 1985-08-01 1987-02-05 Leybold Heraeus Gmbh & Co Kg Zerstaeubungskatode nach dem magnetronprinzip
CA1308060C (en) * 1986-04-04 1992-09-29 Tokyo Electron Limited Cathode and target design for a sputter coating apparatus
US4855033A (en) * 1986-04-04 1989-08-08 Materials Research Corporation Cathode and target design for a sputter coating apparatus
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
US4842707A (en) * 1986-06-23 1989-06-27 Oki Electric Industry Co., Ltd. Dry process apparatus
US5215619A (en) * 1986-12-19 1993-06-01 Applied Materials, Inc. Magnetic field-enhanced plasma etch reactor
US4865708A (en) * 1988-11-14 1989-09-12 Vac-Tec Systems, Inc. Magnetron sputtering cathode
US4892633A (en) * 1988-11-14 1990-01-09 Vac-Tec Systems, Inc. Magnetron sputtering cathode
JPH03247761A (ja) * 1990-02-23 1991-11-05 Yoshihisa Nakamura スパッタターゲット装置
DE4025077A1 (de) * 1990-08-08 1992-02-20 Leybold Ag Magnetronkathode
DE4042286C1 (ja) * 1990-12-31 1992-02-06 Leybold Ag, 6450 Hanau, De
DE4107711C2 (de) * 1991-03-09 1999-11-11 Leybold Ag Verfahren und Vorrichtung zur Abscheidung dotierter Schichten oder chemischer Verbindungen oder Legierungen mittels einer Magnetronkathode
US5174880A (en) * 1991-08-05 1992-12-29 Hmt Technology Corporation Magnetron sputter gun target assembly with distributed magnetic field
US5366607A (en) * 1991-08-05 1994-11-22 Hmt Technology Corporation Sputtering target and assembly
US5744017A (en) * 1993-12-17 1998-04-28 Kabushiki Kaisha Kobe Seiko Sho Vacuum arc deposition apparatus
US5597459A (en) * 1995-02-08 1997-01-28 Nobler Technologies, Inc. Magnetron cathode sputtering method and apparatus
US6235170B1 (en) 1998-06-10 2001-05-22 David A. Glocker Conical sputtering target
US6432286B1 (en) 1998-06-10 2002-08-13 David A. Glocker Conical sputtering target
US6066242A (en) * 1998-06-10 2000-05-23 David A. Glocker Conical sputtering target
KR101303447B1 (ko) * 2009-01-21 2013-09-05 엘지디스플레이 주식회사 유기전계발광표시장치의 증착장치
RU2186151C2 (ru) * 1999-12-29 2002-07-27 Закрытое акционерное общество "Патинор Коутингс Лимитед" Устройство для нанесения покрытий в вакууме
US6783638B2 (en) * 2001-09-07 2004-08-31 Sputtered Films, Inc. Flat magnetron
US20080083611A1 (en) * 2006-10-06 2008-04-10 Tegal Corporation High-adhesive backside metallization
US20090246385A1 (en) * 2008-03-25 2009-10-01 Tegal Corporation Control of crystal orientation and stress in sputter deposited thin films
US8691057B2 (en) * 2008-03-25 2014-04-08 Oem Group Stress adjustment in reactive sputtering
US8482375B2 (en) * 2009-05-24 2013-07-09 Oem Group, Inc. Sputter deposition of cermet resistor films with low temperature coefficient of resistance

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4046659A (en) * 1974-05-10 1977-09-06 Airco, Inc. Method for coating a substrate
US4006073A (en) * 1975-04-03 1977-02-01 The United States Of America As Represented By The United States Energy Research And Development Administration Thin film deposition by electric and magnetic crossed-field diode sputtering
US4209552A (en) * 1975-04-03 1980-06-24 The United States Of America As Represented By The United States Department Of Energy Thin film deposition by electric and magnetic crossed-field diode sputtering
US4155825A (en) * 1977-05-02 1979-05-22 Fournier Paul R Integrated sputtering apparatus and method
US4265729A (en) * 1978-09-27 1981-05-05 Vac-Tec Systems, Inc. Magnetically enhanced sputtering device
US4404077A (en) * 1981-04-07 1983-09-13 Fournier Paul R Integrated sputtering apparatus and method
US4422896A (en) * 1982-01-26 1983-12-27 Materials Research Corporation Magnetically enhanced plasma process and apparatus
JPS5976875A (ja) * 1982-10-22 1984-05-02 Hitachi Ltd マグネトロン型スパッタ装置とそれに用いるターゲット

Also Published As

Publication number Publication date
DE3503693A1 (de) 1985-10-03
JPS60194072A (ja) 1985-10-02
US4486287A (en) 1984-12-04
GB2153853B (en) 1987-11-18
GB8502920D0 (en) 1985-03-06
GB2153853A (en) 1985-08-29

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