NL8204450A - Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat. - Google Patents

Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat. Download PDF

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Publication number
NL8204450A
NL8204450A NL8204450A NL8204450A NL8204450A NL 8204450 A NL8204450 A NL 8204450A NL 8204450 A NL8204450 A NL 8204450A NL 8204450 A NL8204450 A NL 8204450A NL 8204450 A NL8204450 A NL 8204450A
Authority
NL
Netherlands
Prior art keywords
carriage
driving
housing
slide
holder
Prior art date
Application number
NL8204450A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8204450A priority Critical patent/NL8204450A/nl
Priority to CA000440621A priority patent/CA1217088A/en
Priority to JP58212641A priority patent/JPS59101835A/ja
Priority to DE8383201632T priority patent/DE3367287D1/de
Priority to EP83201632A priority patent/EP0109718B1/en
Publication of NL8204450A publication Critical patent/NL8204450A/nl
Priority to US06/838,894 priority patent/US4655594A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Position Or Direction (AREA)
  • Automatic Control Of Machine Tools (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL8204450A 1982-11-17 1982-11-17 Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat. NL8204450A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL8204450A NL8204450A (nl) 1982-11-17 1982-11-17 Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat.
CA000440621A CA1217088A (en) 1982-11-17 1983-11-08 Displacement device, particularly for the photolithographic treatment of a substrate
JP58212641A JPS59101835A (ja) 1982-11-17 1983-11-14 変位装置
DE8383201632T DE3367287D1 (en) 1982-11-17 1983-11-15 Displacement device, particularly for the photolithographic treatment of a substrate
EP83201632A EP0109718B1 (en) 1982-11-17 1983-11-15 Displacement device, particularly for the photolithographic treatment of a substrate
US06/838,894 US4655594A (en) 1982-11-17 1986-03-11 Displacement device, particularly for the photolithographic treatment of a substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8204450 1982-11-17
NL8204450A NL8204450A (nl) 1982-11-17 1982-11-17 Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat.

Publications (1)

Publication Number Publication Date
NL8204450A true NL8204450A (nl) 1984-06-18

Family

ID=19840602

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8204450A NL8204450A (nl) 1982-11-17 1982-11-17 Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat.

Country Status (6)

Country Link
US (1) US4655594A (cg-RX-API-DMAC7.html)
EP (1) EP0109718B1 (cg-RX-API-DMAC7.html)
JP (1) JPS59101835A (cg-RX-API-DMAC7.html)
CA (1) CA1217088A (cg-RX-API-DMAC7.html)
DE (1) DE3367287D1 (cg-RX-API-DMAC7.html)
NL (1) NL8204450A (cg-RX-API-DMAC7.html)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4742286A (en) * 1985-10-29 1988-05-03 Micro-Stage, Inc. Gas bearing X-Y-θ stage assembly
JPS62152645A (ja) * 1985-12-25 1987-07-07 Hitachi Seiki Co Ltd 工作機械の座標修正装置
NL8601095A (nl) * 1986-04-29 1987-11-16 Philips Nv Positioneerinrichting.
US4758091A (en) * 1986-11-20 1988-07-19 Ateo Corporation Pattern generator part holder
JP2573502B2 (ja) * 1987-09-22 1997-01-22 日本電信電話株式会社 二軸移動装置
US5191465A (en) * 1990-03-28 1993-03-02 Matsushita Electric Industrial Co., Ltd. Optical apparatus for alignment of reticle and wafer in exposure apparatus
US5287166A (en) * 1990-07-20 1994-02-15 Konica Corporation Displacement meter with stared displacement values
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
US5438419A (en) * 1991-12-23 1995-08-01 Electronics And Telecommunications Research Institute Precision wafer driving device by utilizing solid type actuator
US5363196A (en) * 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
DE4304912C2 (de) * 1993-02-18 2003-03-06 Klaus Siebert Verfahren und Vorrichtung zur durchgehend automatischen Chipherstellung unter Vakuum
JPH07142336A (ja) * 1993-06-30 1995-06-02 Canon Inc 露光装置
JPH07260472A (ja) * 1994-03-22 1995-10-13 Nikon Corp ステージ装置の直交度測定方法
JPH10144596A (ja) * 1996-11-05 1998-05-29 Canon Inc 露光装置およびデバイス製造方法
US6189875B1 (en) 1997-11-12 2001-02-20 U.S. Philips Corporation Positioning device with H-drive having spring coupling between beams
JP3483452B2 (ja) 1998-02-04 2004-01-06 キヤノン株式会社 ステージ装置および露光装置、ならびにデバイス製造方法
JP3869938B2 (ja) 1998-06-05 2007-01-17 キヤノン株式会社 ステージ装置、露光装置、およびデバイス製造方法
DE19948797C2 (de) * 1999-10-11 2001-11-08 Leica Microsystems Substrathalter und Verwendung des Substrathalters in einem hochgenauen Messgerät
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
EP1107067B1 (en) * 1999-12-01 2006-12-27 ASML Netherlands B.V. Positioning apparatus and lithographic apparatus comprising the same
EP1111470B1 (en) * 1999-12-21 2007-03-07 ASML Netherlands B.V. Lithographic apparatus with a balanced positioning system
US6486941B1 (en) 2000-04-24 2002-11-26 Nikon Corporation Guideless stage
WO2001095995A2 (en) * 2000-05-12 2001-12-20 Pall Corporation Filters
DE60117260T2 (de) 2000-05-12 2006-10-05 Pall Corp. Filtrationssysteme
US6963821B2 (en) * 2003-02-11 2005-11-08 Nikon Corporation Stage counter mass system
CN102290365B (zh) 2004-06-09 2015-01-21 尼康股份有限公司 基板保持装置、具备其之曝光装置及方法、元件制造方法
KR100573771B1 (ko) * 2004-06-25 2006-04-25 삼성전자주식회사 갠트리장치
SG155927A1 (en) 2004-09-17 2009-10-29 Nikon Corp Substrate holding device, exposure apparatus, and device manufacturing method
US7298495B2 (en) * 2005-06-23 2007-11-20 Lewis George C System and method for positioning an object through use of a rotating laser metrology system
US8109395B2 (en) * 2006-01-24 2012-02-07 Asm Technology Singapore Pte Ltd Gantry positioning system
US8973768B1 (en) * 2009-10-09 2015-03-10 Par Systems, Inc. Gantry robot system
JP6761279B2 (ja) * 2016-05-16 2020-09-23 キヤノン株式会社 位置決め装置、リソグラフィー装置および物品製造方法
CN114126842A (zh) * 2019-05-28 2022-03-01 伏尔肯模型公司 用于增材制造的重涂器系统

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522287A1 (de) * 1966-07-01 1969-08-07 Telefunken Patent Einrichtung zur Feinjustierung von Fotomasken
US3550276A (en) * 1968-04-25 1970-12-29 Baldwin Kongsberg Co Multiple-pen automatic drafting machine
FR1587573A (cg-RX-API-DMAC7.html) * 1968-10-25 1970-03-20
US3622244A (en) * 1970-01-29 1971-11-23 Optomechanisms Inc Dual axes interferometer
JPS4859279A (cg-RX-API-DMAC7.html) * 1971-11-26 1973-08-20
US3884580A (en) * 1973-09-07 1975-05-20 Gerber Scientific Instr Co Apparatus for measuring and positioning by interferometry
US3934949A (en) * 1973-12-27 1976-01-27 Bell Telephone Laboratories, Incorporated Method for reducing rotation components in table translation
US3941480A (en) * 1974-02-08 1976-03-02 The Gerber Scientific Instrument Company Work locating system and method with temperature and other compensation capabilities
US3969004A (en) * 1974-08-02 1976-07-13 The Computervision Corporation Air bearing piston assembly for semiconductor mask-to-wafer aligner
US4226526A (en) * 1976-10-04 1980-10-07 Harry Arthur Hele Spence-Bate Transport and positioning mechanism
JPS5485678A (en) * 1977-12-20 1979-07-07 Canon Inc High accuracy alignment method for air bearing guide system xy stage
US4311390A (en) * 1979-02-27 1982-01-19 Optimetrix Corporation Interferometrically controlled stage with precisely orthogonal axes of motion
US4345836A (en) * 1979-10-22 1982-08-24 Optimetrix Corporation Two-stage wafer prealignment system for an optical alignment and exposure machine
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system

Also Published As

Publication number Publication date
CA1217088A (en) 1987-01-27
US4655594A (en) 1987-04-07
JPH0314223B2 (cg-RX-API-DMAC7.html) 1991-02-26
DE3367287D1 (en) 1986-12-04
JPS59101835A (ja) 1984-06-12
EP0109718B1 (en) 1986-10-29
EP0109718A1 (en) 1984-05-30

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Legal Events

Date Code Title Description
A1B A search report has been drawn up
A85 Still pending on 85-01-01
BV The patent application has lapsed