NL8004005A - Werkwijze voor het vervaardigen van een halfgeleiderinrichting. - Google Patents

Werkwijze voor het vervaardigen van een halfgeleiderinrichting. Download PDF

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Publication number
NL8004005A
NL8004005A NL8004005A NL8004005A NL8004005A NL 8004005 A NL8004005 A NL 8004005A NL 8004005 A NL8004005 A NL 8004005A NL 8004005 A NL8004005 A NL 8004005A NL 8004005 A NL8004005 A NL 8004005A
Authority
NL
Netherlands
Prior art keywords
plasma
gas mixture
layer
fluorine
compound
Prior art date
Application number
NL8004005A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8004005A priority Critical patent/NL8004005A/nl
Priority to DE19813125054 priority patent/DE3125054A1/de
Priority to CA000381333A priority patent/CA1169587A/fr
Priority to GB8121033A priority patent/GB2081159B/en
Priority to IE1531/81A priority patent/IE52046B1/en
Priority to JP56105744A priority patent/JPS5749235A/ja
Priority to FR8113547A priority patent/FR2493601A1/fr
Priority to US06/281,757 priority patent/US4374698A/en
Publication of NL8004005A publication Critical patent/NL8004005A/nl

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H01L21/31116—Etching inorganic layers by chemical means by dry-etching

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Element Separation (AREA)
  • Local Oxidation Of Silicon (AREA)
NL8004005A 1980-07-11 1980-07-11 Werkwijze voor het vervaardigen van een halfgeleiderinrichting. NL8004005A (nl)

Priority Applications (8)

Application Number Priority Date Filing Date Title
NL8004005A NL8004005A (nl) 1980-07-11 1980-07-11 Werkwijze voor het vervaardigen van een halfgeleiderinrichting.
DE19813125054 DE3125054A1 (de) 1980-07-11 1981-06-26 "verfahren zur herstellung einer halbleiteranordnung"
CA000381333A CA1169587A (fr) 1980-07-11 1981-07-08 Methode de fabrication d'un dispositif a semiconducteur par gravure au gaz
GB8121033A GB2081159B (en) 1980-07-11 1981-07-08 Method of manufacturing a semiconductor device
IE1531/81A IE52046B1 (en) 1980-07-11 1981-07-08 Method of manufacturing a semiconductor device
JP56105744A JPS5749235A (en) 1980-07-11 1981-07-08 Method of producing semiconductor device
FR8113547A FR2493601A1 (fr) 1980-07-11 1981-07-09 Procede de realisation d'un dispositif semiconducteur
US06/281,757 US4374698A (en) 1980-07-11 1981-07-09 Method of manufacturing a semiconductor device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8004005 1980-07-11
NL8004005A NL8004005A (nl) 1980-07-11 1980-07-11 Werkwijze voor het vervaardigen van een halfgeleiderinrichting.

Publications (1)

Publication Number Publication Date
NL8004005A true NL8004005A (nl) 1982-02-01

Family

ID=19835608

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8004005A NL8004005A (nl) 1980-07-11 1980-07-11 Werkwijze voor het vervaardigen van een halfgeleiderinrichting.

Country Status (8)

Country Link
US (1) US4374698A (fr)
JP (1) JPS5749235A (fr)
CA (1) CA1169587A (fr)
DE (1) DE3125054A1 (fr)
FR (1) FR2493601A1 (fr)
GB (1) GB2081159B (fr)
IE (1) IE52046B1 (fr)
NL (1) NL8004005A (fr)

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GB2081159B (en) 1984-08-15
FR2493601A1 (fr) 1982-05-07
GB2081159A (en) 1982-02-17
DE3125054C2 (fr) 1989-01-26
JPH0345532B2 (fr) 1991-07-11
IE52046B1 (en) 1987-05-27
CA1169587A (fr) 1984-06-19
IE811531L (en) 1982-01-11
DE3125054A1 (de) 1982-03-18
US4374698A (en) 1983-02-22
JPS5749235A (en) 1982-03-23
FR2493601B1 (fr) 1985-02-15

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