NL7902963A - Detektor voor elektronenmikroskoop. - Google Patents
Detektor voor elektronenmikroskoop. Download PDFInfo
- Publication number
- NL7902963A NL7902963A NL7902963A NL7902963A NL7902963A NL 7902963 A NL7902963 A NL 7902963A NL 7902963 A NL7902963 A NL 7902963A NL 7902963 A NL7902963 A NL 7902963A NL 7902963 A NL7902963 A NL 7902963A
- Authority
- NL
- Netherlands
- Prior art keywords
- electron microscope
- light
- microscope according
- preparation
- electron
- Prior art date
Links
- 238000002360 preparation method Methods 0.000 claims description 33
- 238000001514 detection method Methods 0.000 claims description 26
- 230000005855 radiation Effects 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 12
- 239000000835 fiber Substances 0.000 claims description 11
- 238000010894 electron beam technology Methods 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 3
- 230000003993 interaction Effects 0.000 claims description 3
- 238000004020 luminiscence type Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 6
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BIIBYWQGRFWQKM-JVVROLKMSA-N (2S)-N-[4-(cyclopropylamino)-3,4-dioxo-1-[(3S)-2-oxopyrrolidin-3-yl]butan-2-yl]-2-[[(E)-3-(2,4-dichlorophenyl)prop-2-enoyl]amino]-4,4-dimethylpentanamide Chemical compound CC(C)(C)C[C@@H](C(NC(C[C@H](CCN1)C1=O)C(C(NC1CC1)=O)=O)=O)NC(/C=C/C(C=CC(Cl)=C1)=C1Cl)=O BIIBYWQGRFWQKM-JVVROLKMSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000000700 radioactive tracer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2443—Scintillation detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24475—Scattered electron detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Measurement Of Radiation (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7902963A NL7902963A (nl) | 1979-04-13 | 1979-04-13 | Detektor voor elektronenmikroskoop. |
| EP80200300A EP0018031B1 (en) | 1979-04-13 | 1980-03-31 | Detector for an electron microscope |
| DE8080200300T DE3060403D1 (en) | 1979-04-13 | 1980-03-31 | Detector for an electron microscope |
| CA000349520A CA1139457A (en) | 1979-04-13 | 1980-04-10 | Detector for a electron microscope |
| AU57361/80A AU535802B2 (en) | 1979-04-13 | 1980-04-11 | Detector for an electron microscope |
| JP4751880A JPS55143766A (en) | 1979-04-13 | 1980-04-12 | Electron microscope |
| US06/465,087 US4438332A (en) | 1979-04-13 | 1983-02-09 | Detector for an electron microscope |
| JP1984144374U JPS60102868U (ja) | 1979-04-13 | 1984-09-26 | 電子顕微鏡 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7902963 | 1979-04-13 | ||
| NL7902963A NL7902963A (nl) | 1979-04-13 | 1979-04-13 | Detektor voor elektronenmikroskoop. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7902963A true NL7902963A (nl) | 1980-10-15 |
Family
ID=19832986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7902963A NL7902963A (nl) | 1979-04-13 | 1979-04-13 | Detektor voor elektronenmikroskoop. |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4438332A (cs) |
| EP (1) | EP0018031B1 (cs) |
| JP (2) | JPS55143766A (cs) |
| AU (1) | AU535802B2 (cs) |
| CA (1) | CA1139457A (cs) |
| DE (1) | DE3060403D1 (cs) |
| NL (1) | NL7902963A (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4587425A (en) * | 1982-07-16 | 1986-05-06 | Plows Graham S | Electron beam apparatus and electron collectors therefor |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3500903A1 (de) * | 1985-01-12 | 1986-07-17 | Fa. Carl Zeiss, 7920 Heidenheim | Detektor fuer rueckstreuelektronen |
| DE3602366A1 (de) * | 1986-01-27 | 1987-07-30 | Siemens Ag | Verfahren und anordnung zum nachweis der auf einer probe von einem primaeren korpuskularstrahl ausgeloesten sekundaerkorpuskeln |
| US4785182A (en) * | 1987-05-21 | 1988-11-15 | Electroscan Corporation | Secondary electron detector for use in a gaseous atmosphere |
| JPS6417369A (en) * | 1987-07-10 | 1989-01-20 | Jeol Ltd | Spectrum display unit in x-ray microanalyzer and the like |
| AT392857B (de) * | 1987-07-13 | 1991-06-25 | Ims Ionen Mikrofab Syst | Vorrichtung und verfahren zur inspektion einer maske |
| US4929041A (en) * | 1989-01-09 | 1990-05-29 | Johnston Pump/General Valve, Inc. | Cathodoluminescence system for use in a scanning electron microscope including means for controlling optical fiber aperture |
| JP2683951B2 (ja) * | 1989-11-02 | 1997-12-03 | 三菱電機株式会社 | 断面観察用走査型電子顕微鏡およびそれを用いた断面観察方法 |
| EP0460305B1 (en) * | 1990-06-04 | 1995-12-27 | Nobuo Mikoshiba | Method for observing microscopic surface structure |
| NL9001512A (nl) * | 1990-07-03 | 1992-02-03 | Philips Nv | Elektronenbundelapparaat voor topografische detectie. |
| GB2247345B (en) * | 1990-07-05 | 1995-04-05 | Haroon Ahmed | Integrated circuit structure analysis |
| JP3148353B2 (ja) * | 1991-05-30 | 2001-03-19 | ケーエルエー・インストルメンツ・コーポレーション | 電子ビーム検査方法とそのシステム |
| JP3730263B2 (ja) * | 1992-05-27 | 2005-12-21 | ケーエルエー・インストルメンツ・コーポレーション | 荷電粒子ビームを用いた自動基板検査の装置及び方法 |
| JP3719794B2 (ja) * | 1996-11-11 | 2005-11-24 | 株式会社トプコン | 反射電子検出装置及びそれを有する走査型電子顕微鏡装置 |
| GB9623768D0 (en) * | 1996-11-15 | 1997-01-08 | Leo Electron Microscopy Limite | Scanning electron microscope |
| JP3266814B2 (ja) * | 1996-11-26 | 2002-03-18 | シャープ株式会社 | 微小部分析装置 |
| DE19802848B4 (de) * | 1998-01-26 | 2012-02-02 | Display Products Group,Inc. | Verfahren und Vorrichtung zum Testen eines Substrats |
| JP5143990B2 (ja) * | 2000-07-07 | 2013-02-13 | カール・ツァイス・エヌティーエス・ゲーエムベーハー | 変化する圧力領域のための検出器、およびこのような検出器を備える電子顕微鏡 |
| US7705301B2 (en) * | 2006-07-07 | 2010-04-27 | Hermes Microvision, Inc. | Electron beam apparatus to collect side-view and/or plane-view image with in-lens sectional detector |
| WO2010021012A1 (en) * | 2008-08-20 | 2010-02-25 | Advantest Corporation | Electron detection device and scanning electron microscope |
| JP5352262B2 (ja) | 2009-02-06 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| JP5529573B2 (ja) * | 2009-02-10 | 2014-06-25 | 国立大学法人 東京大学 | 透過型電子顕微鏡 |
| US20130140459A1 (en) * | 2011-12-01 | 2013-06-06 | Gatan, Inc. | System and method for sample analysis by three dimensional cathodoluminescence |
| JP5852474B2 (ja) | 2012-03-01 | 2016-02-03 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| WO2015118605A1 (ja) * | 2014-02-04 | 2015-08-13 | 富士通株式会社 | 材料評価装置及び方法 |
| CN110779941A (zh) * | 2019-11-01 | 2020-02-11 | 中国科学院地质与地球物理研究所 | 电镜样品制作方法及电镜样品制作装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3351755A (en) | 1964-09-25 | 1967-11-07 | Applied Res Lab Inc | Method of and apparatus for spectroscopic analysis having compensating means for uncontrollable variables |
| US3629579A (en) * | 1970-01-16 | 1971-12-21 | Hitachi Ltd | Electron probe specimen stage with a scattered electron detector mounted thereon |
| AT306804B (de) * | 1971-10-05 | 1973-04-25 | Oesterr Studien Atomenergie | Kathodolumineszenzeinrichtung für Rasterelektronenmikroskope |
| NL151034B (nl) * | 1972-04-10 | 1976-10-15 | Haak Rob Van Den | Anker. |
| US3922546A (en) | 1972-04-14 | 1975-11-25 | Radiant Energy Systems | Electron beam pattern generator |
| US3842271A (en) * | 1973-04-24 | 1974-10-15 | American Optical Corp | Scanning electron microscope |
| DE2542355A1 (de) | 1975-09-19 | 1977-03-24 | Siemens Ag | Durchstrahlungs-raster-elektronenmikroskop mit ringscheibenfoermigem detektor |
| JPS5248964A (en) * | 1975-10-17 | 1977-04-19 | Hitachi Ltd | Transmission-type scanning electronic microscope |
| JPS5317381A (en) * | 1976-07-30 | 1978-02-17 | Hitachi Ltd | Scintillation counter |
| US4211924A (en) | 1976-09-03 | 1980-07-08 | Siemens Aktiengesellschaft | Transmission-type scanning charged-particle beam microscope |
-
1979
- 1979-04-13 NL NL7902963A patent/NL7902963A/nl not_active Application Discontinuation
-
1980
- 1980-03-31 DE DE8080200300T patent/DE3060403D1/de not_active Expired
- 1980-03-31 EP EP80200300A patent/EP0018031B1/en not_active Expired
- 1980-04-10 CA CA000349520A patent/CA1139457A/en not_active Expired
- 1980-04-11 AU AU57361/80A patent/AU535802B2/en not_active Ceased
- 1980-04-12 JP JP4751880A patent/JPS55143766A/ja active Pending
-
1983
- 1983-02-09 US US06/465,087 patent/US4438332A/en not_active Expired - Fee Related
-
1984
- 1984-09-26 JP JP1984144374U patent/JPS60102868U/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4587425A (en) * | 1982-07-16 | 1986-05-06 | Plows Graham S | Electron beam apparatus and electron collectors therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0018031A3 (en) | 1980-11-12 |
| JPS60102868U (ja) | 1985-07-13 |
| AU5736180A (en) | 1980-10-16 |
| JPS6327419Y2 (cs) | 1988-07-25 |
| EP0018031B1 (en) | 1982-05-12 |
| AU535802B2 (en) | 1984-04-05 |
| JPS55143766A (en) | 1980-11-10 |
| DE3060403D1 (en) | 1982-07-01 |
| US4438332A (en) | 1984-03-20 |
| CA1139457A (en) | 1983-01-11 |
| EP0018031A2 (en) | 1980-10-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1B | A search report has been drawn up | ||
| BV | The patent application has lapsed |